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    Resist composition and resist pattern forming method
    2.
    发明授权
    Resist composition and resist pattern forming method 有权
    抗蚀剂组成和抗蚀剂图案形成方法

    公开(公告)号：US09052592B2

    公开(公告)日：2015-06-09

    申请号：US14218249

    申请日：2014-03-18

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Tsuyoshi Nakamura ,  Kazuishi Tanno ,  Akiya Kawaue ,  Takayoshi Mori

    IPC分类号： G03F7/004 ,  C08F28/00 ,  G03F7/038 ,  C08F220/24 ,  C08F220/56 ,  C08F20/52 ,  C07C381/12

    CPC分类号： G03F7/038 ,  C07C381/12 ,  C08F20/52 ,  C08F220/24 ,  C08F220/56 ,  G03F7/0045 ,  G03F7/0397

    摘要： A resist composition contains a high-molecular weight compound which has a partial structure represented by a general formula (a0-r-1) and has a constituent unit represented by a general formula (a0-1). In the formula (a0-r-1), Y1 represents a divalent linking group; each of R2 and R3 represents a group having 0 to 20 carbon atoms, which is not a fluorine atom, and either R2 or R3 may form a ring with Y1; m represents an integer of 1 or more; and Mm+ represents an m-valent organic cation. In the formula (a0-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, chain alkyl group or chain alkenyl group.

    摘要翻译： 抗蚀剂组合物含有具有由通式（a0-r-1）表示的部分结构并具有由通式（a0-1）表示的结构单元的高分子量化合物。 在式（a0-r-1）中，Y1表示二价连接基团; R 2和R 3各自表示碳原子数为0〜20的不是氟原子的基团，R 2或R 3可以与Y 1成环; m表示1以上的整数， Mm +表示m价有机阳离子。 在式（a0-1）中，R表示氢原子，烷基或卤代烷基; Ya01表示单键或二价连接基团; X01表示硫原子或氧原子; 且Ra01表示任意取代的环状基团，链状烷基或链烯基。

    Method for manufacturing polymer compound
    4.
    发明授权
    Method for manufacturing polymer compound 有权

    公开(公告)号：US10100134B2

    公开(公告)日：2018-10-16

    申请号：US15369471

    申请日：2016-12-05

    申请人： TOKYO OHKA KOGYO CO., LTD.

    发明人： Masatoshi Arai ,  Yoshitaka Komuro ,  Akiya Kawaue

    IPC分类号： C08F8/00 ,  C08F220/18 ,  C08F228/00 ,  C08F224/00 ,  C08F230/08

    摘要： A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).

    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND POLYMERIC COMPOUND
    7.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND POLYMERIC COMPOUND 审中-公开
    耐蚀组合物，形成耐火图案，化合物和聚合物的方法

    公开(公告)号：US20150111155A1

    公开(公告)日：2015-04-23

    申请号：US14581209

    申请日：2014-12-23

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Akiya Kawaue ,  Yoshiyuki Utsumi ,  Jiro Yokoya

    IPC分类号： G03F7/038 ,  G03F7/38 ,  G03F7/027 ,  G03F7/30

    CPC分类号： G03F7/0388 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/38

    摘要： A resist composition including a polymeric compound containing a structural unit derived from a compound represented by general formula (a0-m), and a method of forming a resist pattern using the resist composition. R1 represents a polymerizable group; Y1 represents a hydrocarbon group of 1 to 30 carbon atoms; L1 represents a single bond or a carbonyl group; Y2 represents a divalent linking group, and R2 represents a hydrogen atom or a hydrocarbon group, provided that Y2 and R2 may be mutually bonded to form a ring with the nitrogen atom having Y2 and R2 bonded thereto; R3 represents a hydrogen atom or a hydrocarbon group; Y3 represents a group which forms an aromatic ring together with the two carbon atoms having Y3 bonded thereto, provided that the aromatic ring may have a nitro group or a substituent other than the nitro group bonded to the aromatic ring.

    摘要翻译： 包含含有由通式（a0-m）表示的化合物衍生的结构单元的聚合物的抗蚀剂组合物，以及使用该抗蚀剂组合物形成抗蚀剂图案的方法。 R1表示可聚合基团; Y1表示1〜30个碳原子的烃基; L1表示单键或羰基; Y2表示二价连接基团，R2表示氢原子或烃基，条件是Y2和R2可以相互键合形成具有与其键合的具有Y2和R2的氮原子的环; R3表示氢原子或烃基; Y 3表示与键合有Y 3的两个碳原子一起形成芳环的基团，条件是所述芳环可具有硝基或与所述芳环接合的硝基以外的取代基。

    Resist composition, method of forming resist pattern, novel compound, and acid generator
    10.
    发明授权
    Resist composition, method of forming resist pattern, novel compound, and acid generator 有权
    抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂

    公开(公告)号：US09012129B2

    公开(公告)日：2015-04-21

    申请号：US14147832

    申请日：2014-01-06

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Hideo Hada ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/30 ,  C07C309/12 ,  C07C311/46 ,  C07C311/48 ,  G03F7/027

    CPC分类号： G03F7/027 ,  C07C309/12 ,  C07C311/46 ,  C07C311/48 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/30 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

    摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).

    摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中具有改变的溶解性的碱成分（A）和包含（b1-1）表示的化合物的酸产生剂成分（B），由（b1- 1'）和/或（b1-1“）表示的化合物（R1”-R3“表示芳基或烷基，条件是R1”-R3“中的至少一个表示被 由（b1-1-0）表示的基团和R1“-R3”中的两个可以相互键合形成与硫原子的环; X表示C3-C30烃基; Q1表示含羰基的二价 连接基团; X10表示C1-C30烃基; Q3表示单键或二价连接基团; Y10表示-C（= O） - 或-SO2-; Y11表示C1-C10烷基或氟化烷基 ：Q2表示单键或亚烷基; W表示C2-C10亚烷基）。