Resist composition, method of forming resist pattern, novel compound, and acid generator
    1.
    发明授权
    Resist composition, method of forming resist pattern, novel compound, and acid generator 有权
    抗蚀剂组合物,抗蚀剂图案形成方法,新型化合物和酸发生剂

    公开(公告)号:US09012129B2

    公开(公告)日:2015-04-21

    申请号:US14147832

    申请日:2014-01-06

    摘要: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).

    摘要翻译: 一种抗蚀剂组合物,其包含在酸性作用下在碱性显影液中具有改变的溶解性的碱成分(A)和包含(b1-1)表示的化合物的酸产生剂成分(B),由(b1- 1')和/或(b1-1“)表示的化合物(R1”-R3“表示芳基或烷基,条件是R1”-R3“中的至少一个表示被 由(b1-1-0)表示的基团和R1“-R3”中的两个可以相互键合形成与硫原子的环; X表示C3-C30烃基; Q1表示含羰基的二价 连接基团; X10表示C1-C30烃基; Q3表示单键或二价连接基团; Y10表示-C(= O) - 或-SO2-; Y11表示C1-C10烷基或氟化烷基 :Q2表示单键或亚烷基; W表示C2-C10亚烷基)。