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    Resist composition, method of forming resist pattern, polymeric compound and compound
    2.
    发明授权
    Resist composition, method of forming resist pattern, polymeric compound and compound 有权

    公开(公告)号：US09606433B2

    公开(公告)日：2017-03-28

    申请号：US13895087

    申请日：2013-05-15

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Yoshiyuki Utsumi ,  Masatoshi Arai ,  Takahiro Dazai ,  Yoshitaka Komuro

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

    摘要： There is provided a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, including a base component (A) which exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0) shown below. In the formula, A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; R1 represents a lactone-containing cyclic group, an —SO2— containing cyclic group or a carbonate-containing cyclic group; and W2 represents a group which is formed by polymerization reaction of a group containing a polymerizable group.

    Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
    3.
    发明授权
    Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern 有权
    含有相分离结构的结构的制造方法，形成图案的方法和形成精细图案的方法

    公开(公告)号：US09206307B2

    公开(公告)日：2015-12-08

    申请号：US14447376

    申请日：2014-07-30

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Tasuku Matsumiya ,  Takehiro Seshimo ,  Ken Miyagi ,  Takaya Maehashi ,  Takahiro Dazai ,  Yoshiyuki Utsumi

    IPC分类号： B05D3/10 ,  B44C1/22 ,  C08L53/00 ,  B82B3/00 ,  C09D153/00 ,  B05D1/18

    CPC分类号： C08L53/00 ,  B05D1/185 ,  B81C1/00031 ,  B81C2201/0149 ,  B82B3/00 ,  C09D153/00

    摘要： A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the PA block and PB block being mutually bonded in the block copolymer, and the PB block including a structural unit other than a structural unit constituting the PA block; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the PA block, a surface free energy of the PB block and a surface free energy of the neutralization film are represented by a coordinate point A of the PA block, a coordinate point B of the PB block and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.

    摘要翻译： 一种制造包含相分离结构的结构的方法，包括：在基板上形成包含中和膜的层; 在包含中和膜的层上形成包含嵌段共聚物的层，PA嵌段和PB嵌段相互结合在嵌段共聚物中，PB组分包括构成PA嵌段的结构单元以外的结构单元; 并使含有嵌段共聚物的层进行退火处理，使得在PA嵌段的表面自由能，PB嵌段的表面自由能和中和膜的表面自由能由 PA块的坐标点A，PB块的坐标点B和中和膜的坐标点N分别在坐标平面中，中和膜的坐标点N在预定范围内。

    METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE AND METHOD OF FORMING TOP COAT FILM
    4.
    发明申请
    METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE AND METHOD OF FORMING TOP COAT FILM 有权
    生产包含相分离结构的结构的方法和形成顶层薄膜的方法

    公开(公告)号：US20150291832A1

    公开(公告)日：2015-10-15

    申请号：US14674515

    申请日：2015-03-31

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Takehiro Seshimo ,  Takaya Maehashi ,  Takahiro Dazai ,  Yoshiyuki Utsumi

    IPC分类号： C09D153/00

    CPC分类号： C09D153/00 ,  B82Y40/00 ,  C09D183/00 ,  G03F7/0002 ,  G03F7/11

    摘要： A method of producing a structure containing a phase-separated structure, including forming a layer containing a block copolymer on a substrate; applying a top coat material to the layer containing the block copolymer to form a top coat film; and subjecting the layer including the block copolymer having the top coat film formed thereon to annealing treatment so as to conduct a phase separation of the layer, the top coat material including an organic solvent component and a polymeric compound containing a structural unit having either a dicarboxylic acid or a salt of a dicarboxylic acid, and the organic solvent component containing water and an alcohol having 3 or more carbon atoms.

    摘要翻译： 一种制备包含相分离结构的结构的方法，包括在基材上形成含有嵌段共聚物的层; 将面漆材料涂布在含有嵌段共聚物的层上以形成顶涂膜; 对包含形成在其上的顶涂层的嵌段共聚物层进行退火处理，以使层的相分离，包括有机溶剂组分的顶涂层材料和含有具有二羧酸的结构单元的高分子化合物 酸或二羧酸的盐，以及含有水和具有3个或更多个碳原子的醇的有机溶剂组分。

    RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND
    6.
    发明申请
    RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND 有权
    耐蚀组合物，形成耐火图案的方法和化合物

    公开(公告)号：US20130302736A1

    公开(公告)日：2013-11-14

    申请号：US13874197

    申请日：2013-04-30

    申请人： TOKYO OHKA KOGYO CO., LTD.

    发明人： Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Tomoyuki Hirano

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/20

    摘要： A resist composition including a base material component whose solubility in a developing solution changes by the action of an acid and an acid generator component which generates an acid upon exposure. The acid generator component includes an acid generator that includes a compound containing nitrogen atoms having proton acceptor properties and sites capable of generating an acid upon exposure in the same molecule, the number of the sites being larger than the number of the nitrogen atoms.

    摘要翻译： 一种抗蚀剂组合物，其包含其在显影液中的溶解度随着酸和酸产生剂组分的作用而变化的基材组分，其在曝光时产生酸。 酸产生剂组分包括酸产生剂，其包含具有质子受体性质的氮原子的化合物和在相同分子中暴露时能产生酸的位点，该位点的数目大于氮原子数。