公开(公告)号：US12136697B2

公开(公告)日：2024-11-05

申请号：US17281882

申请日：2020-03-27

Applicant: NINGDE AMEPEREX TECHNOLOGY LIMITED

Inventor： Junfei Liu ,  Jianming Zheng ,  Chao Tang ,  Lilan Zhang

IPC: H01M10/0567 ,  C07D327/04 ,  H01M4/02 ,  H01M4/04 ,  H01M4/525 ,  H01M10/0525 ,  H01M10/0568 ,  H01M10/0569

Abstract: An electrochemical apparatus, including a positive electrode, a negative electrode, an separator, and an electrolyte, wherein the positive electrode comprises a current collector and a positive active material layer, and the positive active material layer comprises a positive active material; and the electrolyte comprises a compound of Formula I: wherein R11, R12, R13, R14, R15 and R16 are each independently selected from: H, halogen, and the following substituted or unsubstituted groups: a C1-8 alkyl group, a C2-8 alkenyl group, a C2-8 alkynyl group, or a C6-12 aryl group; and an amount of the compound of Formula I required per 1 g of the positive active material is about 0.001 g to about 0.064 g. The present application can effectively improve high-temperature storage and high-temperature cycle performance of an electrochemical apparatus.

公开(公告)号：US20240152048A1

公开(公告)日：2024-05-09

申请号：US18277113

申请日：2021-12-20

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/004 ,  C07C25/18 ,  C07C309/10 ,  C07C309/39 ,  C07C381/12 ,  C07D327/04 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C309/10 ,  C07C309/39 ,  C07C381/12 ,  C07D327/04 ,  C08F220/1807 ,  C08F220/1812 ,  C08F220/283 ,  C08F220/382 ,  G03F7/038 ,  G03F7/039

Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit represented by formula (1); at least one onium salt each including an organic acid anion moiety and an onium cation moiety; and a solvent. At least part of the organic acid anion moiety in the at least one onium salt includes an iodine-substituted aromatic ring structure. R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Y1 is a divalent linking group, and X1 is an acid-dissociable group, and n is 0 or 1. When n is 0, X1 is represented by formula (s1) or (s2).

公开(公告)号：US20230280651A1

公开(公告)日：2023-09-07

申请号：US18197244

申请日：2023-05-15

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Teppei ADACHI ,  Shinya YAMASHITA ,  Masaki OHASHI ,  Tomohiro KOBAYASHI ,  Kenichi OIKAWA ,  Takayuki FUJIWARA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/11 ,  C07D307/93 ,  C07D493/18 ,  C07D327/04 ,  C08F220/18 ,  C07C381/12

CPC classification number: G03F7/0045 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/11 ,  C07D307/93 ,  C07D493/18 ,  C07D327/04 ,  C08F220/1807 ,  C08F220/1808 ,  C07C381/12 ,  G03F7/2006

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.

公开(公告)号：US11429024B2

公开(公告)日：2022-08-30

申请号：US16893460

申请日：2020-06-05

Applicant: JSR CORPORATION

Inventor： Ryuichi Nemoto ,  Tsuyoshi Furukawa

IPC: G03F7/004 ,  C07C69/712 ,  G03F7/038 ,  G03F7/039 ,  C08F220/28 ,  C08F220/38 ,  C08F220/18 ,  C07D327/04 ,  C07D309/12 ,  C07D319/20 ,  C07C65/21 ,  C07C323/12 ,  C07C25/02 ,  C07C381/12 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

Abstract: The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar1; and RG represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.

公开(公告)号：US11359162B2

公开(公告)日：2022-06-14

申请号：US16964874

申请日：2019-01-23

Applicant: V. MANE FILS

Inventor： Agnès Muratore ,  Fabien Grasset

IPC: C11B9/00 ,  A61K8/49 ,  A61Q5/02 ,  A61Q13/00 ,  C07D327/04

Abstract: The present invention concerns new fragrant and aromatic compounds presenting peach, fruity and/or exotic fruit notes, but with no lactonic and fat aspects. More specifically, new spirooxathiolanone-type compounds responding to the following general formula (I) are disclosed: as well as a method for synthesising said compounds and their uses.

公开(公告)号：US20220107559A1

公开(公告)日：2022-04-07

申请号：US17484343

申请日：2021-09-24

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Jun Hatakeyama ,  Takeshi Nagata ,  Chuanwen Lin ,  Shun Kikuchi

IPC: G03F7/004 ,  G03F7/039 ,  C07C381/12 ,  C07C309/12 ,  C07D307/00 ,  C07D333/76 ,  C07D327/08 ,  C07J31/00 ,  C07D327/04

Abstract: A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.

公开(公告)号：US20220091507A1

公开(公告)日：2022-03-24

申请号：US17543789

申请日：2021-12-07

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI

IPC: G03F7/039 ,  C08F220/18 ,  C07D327/04 ,  G03F7/038 ,  C07C309/12 ,  C07C309/06 ,  C07C381/12 ,  C07D317/72 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2), R1 represents a hydrogen atom, or the like; R2 represents a hydrogen atom or the like; and R3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.

公开(公告)号：US11281099B2

公开(公告)日：2022-03-22

申请号：US16420956

申请日：2019-05-23

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Hiroto Yamazaki ,  Masatoshi Arai ,  Yoshitaka Komuro

IPC: G03F7/004 ,  C07C381/12 ,  G03F7/039 ,  C07C309/12 ,  C07C303/22 ,  C07D339/08 ,  C07D333/54 ,  C07D327/04 ,  G03F7/038 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

Abstract: A resist composition including a compound represented by formula (b1) in which Rb1 represents an aryl group which may have a substituent; Rb2 and Rb3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by Rb1 and the aryl group or the alkyl group represented by Rb2 or Rb3 has a substituent containing a halogen atom, and at least one of the aryl group represented by Rb1 and the aryl group or the alkyl group represented by Rb2 or Rb3 has a substituent containing a sulfonyl group; and X− represents a counteranion.

公开(公告)号：US20220073492A1

公开(公告)日：2022-03-10

申请号：US17423518

申请日：2020-01-17

Applicant: BASF SE

Inventor： Peter Rudolf ,  Indre Thiel ,  Thomas Maximilian Wurm ,  Joaquim Henrique Teles ,  Jan-Dirk Arndt

IPC: C07D327/04

Abstract: Provided is a process for the preparation of a compound with at least one five-membered cyclic monothiocarbonate group. A compound C1 with at least one halohydrin group is used as starting material. Compound C1 is reacted with phosgene or an alkyl chloroformate to give an adduct C2. The adduct C2 is reacted with a compound that includes anionic sulfur to obtain the compound with at least one five-membered cyclic monothiocarbonate group.

公开(公告)号：US11247979B2

公开(公告)日：2022-02-15

申请号：US16634230

申请日：2018-08-07

Applicant: BASF SE

Inventor： Peter Rudolf ,  Indre Thiel ,  Markus Jegelka ,  Jan-Dirk Arndt ,  Joaquim Henrique Teles

IPC: C07D327/04 ,  C07D411/12

Abstract: Process for the preparation of a compound with at least one five-membered cyclic monothiocarbonate group wherein a) a compound with at least one epoxy group is used as starting material b) the compound is reacted with phosgene or an alkyl chloroformate thus giving an adduct and c) the adduct is reacted with a compound comprising anionic sulfurthus obtaining the compound with at least one five-membered cyclic monothiocarbonate group.