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公开(公告)号：US11187981B2
公开(公告)日：2021-11-30
申请号：US16220852
申请日：2018-12-14
摘要： A resist composition including a resin component whose solubility in a developing solution is changed due to an action of an acid, in which the resin composition has a constitutional unit derived from a compound containing a chain-like aliphatic acid dissociable group or a monocyclic aliphatic acid dissociable group and a constitutional unit derived from a compound containing an aromatic hydrocarbon group-containing acid dissociable group.
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公开(公告)号：US09816003B2
公开(公告)日：2017-11-14
申请号：US14520966
申请日：2014-10-22
发明人： Tsuyoshi Kurosawa , Daiju Shiono , Ken Miyagi , Tasuku Matsumiya , Hitoshi Yamano , Taku Hirayama , Katsumi Ohmori
IPC分类号： B05D1/30 , C09D153/00 , G03F7/00 , C08L33/26 , B82Y30/00
CPC分类号： C09D153/00 , B82Y30/00 , C08L33/26 , G03F7/0002
摘要： A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.
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公开(公告)号：US09828519B2
公开(公告)日：2017-11-28
申请号：US15047520
申请日：2016-02-18
发明人： Akiya Kawaue , Takehiro Seshimo , Takaya Maehashi , Tasuku Matsumiya , Ken Miyagi , Hitoshi Yamano , Xuanxuan Chen , Paul Franklin Nealey
IPC分类号： C08K5/34 , C08K5/3435 , C09D153/00 , C09D5/00 , C09D7/12 , B05D1/00 , B05D3/10
CPC分类号： C09D153/00 , B05D1/005 , B05D3/107 , C08K5/43 , C09D5/00 , C09D7/63 , G03F7/0002
摘要： A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X″ represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y″ and Z″ each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R″ represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.
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公开(公告)号：US10995234B2
公开(公告)日：2021-05-04
申请号：US16335129
申请日：2017-09-26
发明人： Takahiro Dazai , Hitoshi Yamano , Akiya Kawaue , Ken Miyagi
IPC分类号： C09D135/00 , C09D153/00 , C08J7/00 , B05D3/00 , B82Y40/00 , B05D5/00
摘要： A method of producing a structure containing a phase-separated structure, including: a step of using a resin composition for forming a phase-separated structure including a block copolymer and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety to form a BCP layer (3) containing a block copolymer on a substrate (1); and a step of vaporizing at least a part of the compound (IL), and phase-separating the BCP layer (3) to obtain a structure (3′) containing a phase-separated structure.
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公开(公告)号：US10100221B2
公开(公告)日：2018-10-16
申请号：US15149515
申请日：2016-05-09
发明人： Hitoshi Yamano , Tasuku Matsumiya , Tsuyoshi Kurosawa , Taku Hirayama , Ken Miyagi , Katsumi Ohmori
IPC分类号： H01L21/027 , C09D153/00 , G03F7/00
摘要： A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer composition including an organic solvent component (S) and a block copolymer in which a block of polystyrene or a polystyrene derivative is bonded to at least one kind of block to a substrate to form a layer containing the block copolymer; and phase-separating the layer containing the block. The value of an interaction distance RaPS(MPa1/2) between the Hansen solubility parameter of the organic solvent component (S) and the Hansen solubility parameter of polystyrene or the polystyrene derivative satisfying the following formula (1). 4.1≤RaPS≤9 (1)
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公开(公告)号：US09821338B2
公开(公告)日：2017-11-21
申请号：US14957994
申请日：2015-12-03
IPC分类号： C09D133/00 , C09D151/00 , B05D1/36 , C09D125/14 , G03F7/00 , C09D153/00 , B82Y40/00
CPC分类号： B05D1/36 , B82Y40/00 , C09D125/14 , C09D153/00 , G03F7/0002 , C08F212/08 , C08F220/14 , C08F2220/281
摘要： A brush composition used for phase-separation of a layer containing a block copolymer on a substrate, the brush composition including a resin component (N), the resin component (N) containing a hydrophobic structural unit (Nx) and a hydrophilic structural unit (Ny), the amount of the structural unit (Ny) within the resin component (N) being 5 mol % or less.
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公开(公告)号：US20150118397A1
公开(公告)日：2015-04-30
申请号：US14520966
申请日：2014-10-22
发明人： Tsuyoshi Kurosawa , Daiju Shiono , Ken Miyagi , Tasuku Matsumiya , Hitoshi Yamano , Taku Hirayama , Katsumi Ohmori
IPC分类号： C09D153/00 , C09D143/04 , B05D3/10 , B05D3/00 , B05D1/36
CPC分类号： C09D153/00 , B82Y30/00 , C08L33/26 , G03F7/0002
摘要： A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.
摘要翻译： 一种形成含有相分离结构的结构的方法，所述方法包括将嵌段共聚物溶液施加到基材上以形成含有嵌段共聚物的层，并且膜厚小于100nm; 并且分离含有嵌段共聚物的层，所述嵌段共聚物溶液的溶剂包含对嵌段共聚物的嵌段之一的均聚物A表现出差的溶解性的不良溶剂。
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公开(公告)号：US10179866B2
公开(公告)日：2019-01-15
申请号：US15047468
申请日：2016-02-18
发明人： Akiya Kawaue , Takehiro Seshimo , Takaya Maehashi , Tasuku Matsumiya , Ken Miyagi , Hitoshi Yamano , Xuanxuan Chen , Paul Franklin Nealey
IPC分类号： C08K5/34 , C08K5/3435 , C09D153/00 , G03F7/00 , B82Y40/00
摘要： A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.
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公开(公告)号：US10066096B2
公开(公告)日：2018-09-04
申请号：US15076097
申请日：2016-03-21
发明人： Tsuyoshi Kurosawa , Tasuku Matsumiya , Masahito Yahagi , Hitoshi Yamano , Ken Miyagi , Daiju Shiono , Taku Hirayama , Katsumi Ohmori
IPC分类号： G03F7/00 , B32B3/18 , C09D125/04 , C09D153/00 , C08L53/00 , C08L33/12 , C09D133/12 , B82Y40/00
摘要： A method of producing a structure containing a phase-separated structure, which includes mixing a block copolymer which includes a hydrophobic polymer block and a hydrophilic polymer block and is incapable of forming a phase-separated structure, with a homopolymer compatible with the hydrophilic polymer block or a homopolymer compatible with the hydrophobic polymer block.
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公开(公告)号：US09914847B2
公开(公告)日：2018-03-13
申请号：US15185899
申请日：2016-06-17
发明人： Akiya Kawaue , Takehiro Seshimo , Takaya Maehashi , Tasuku Matsumiya , Ken Miyagi , Hitoshi Yamano , Xuanxuan Chen , Paul Franklin Nealey
CPC分类号： C09D153/00 , B05D3/107 , C08K5/17 , C08K5/3415 , C08K5/3435 , C09D5/00 , C09D7/63 , G03F3/00 , G03F7/00
摘要： A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being −4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.
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