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公开(公告)号：US11822240B2
公开(公告)日：2023-11-21
申请号：US17121130
申请日：2020-12-14
发明人： Yasuhiro Yoshii , Yosuke Suzuki , Yoichi Hori , Takahiro Kojima , Mari Murata
CPC分类号： G03F7/0045 , G03F7/0382 , G03F7/0397
摘要： A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid, the resist composition containing a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (e1) in which Rd01 represents a monovalent organic group and Rd02 represents a single bond or a divalent linking group
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公开(公告)号：US11693313B2
公开(公告)日：2023-07-04
申请号：US17094636
申请日：2020-11-10
发明人： Masahito Yahagi , Takahiro Kojima
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C08F220/18 , C08F212/14 , C07C65/05
CPC分类号： G03F7/0045 , C07C65/05 , C08F212/24 , C08F220/1806 , C08F220/1807 , C08F220/1808 , C08F220/1811 , C08F220/1818 , G03F7/038 , G03F7/039
摘要： A resist composition including a compound (D0) represented by general formula (d0) and a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below (in formula (d0), n represents an integer of 2 or more; in formula (a0-1), W1 represents a polymerizable group-containing group; Ct represents a tertiary carbon atom, and the α-position of Ct is a carbon atom which constitutes a carbon-carbon unsaturated bond; R11 represents an aromatic hydrocarbon group which may have a substituent, or a chain hydrocarbon group; R12 and R13 each independently represents a chain hydrocarbon group, or R12 and R13 are mutually bonded to form a cyclic group
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公开(公告)号：US11187981B2
公开(公告)日：2021-11-30
申请号：US16220852
申请日：2018-12-14
摘要： A resist composition including a resin component whose solubility in a developing solution is changed due to an action of an acid, in which the resin composition has a constitutional unit derived from a compound containing a chain-like aliphatic acid dissociable group or a monocyclic aliphatic acid dissociable group and a constitutional unit derived from a compound containing an aromatic hydrocarbon group-containing acid dissociable group.
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公开(公告)号：US11275306B2
公开(公告)日：2022-03-15
申请号：US16686712
申请日：2019-11-18
发明人： Takahiro Kojima , Yasuhiro Yoshii , Masahito Yahagi , Yoichi Hori
摘要： A resist composition including a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), and a resin component (A1) which has a constitutional unit (a0) obtained from a compound represented by Formula (a0-1), in which a polymerizable group at a W portion is converted into a main chain, and a constitutional unit (a1) containing an acid decomposable group whose polarity is increased due to an action of an acid. In Formula (d0), Rd0 represents a substituent and n represents an integer of 2 or greater. In Formula (a0-1), Wax0 represents an (nax0+1)-valent aromatic hydrocarbon group which may have a substituent.
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公开(公告)号：US11099479B2
公开(公告)日：2021-08-24
申请号：US16334302
申请日：2017-10-04
发明人： Takashi Nagamine , Hideto Nito , Masafumi Fujisaki , Tatsuya Fujii , Yuki Fukumura , Takahiro Kojima , Issei Suzuki , Takuya Ikeda , KhanhTin Nguyen
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).
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公开(公告)号：US11586111B2
公开(公告)日：2023-02-21
申请号：US16700881
申请日：2019-12-02
发明人： Yasuhiro Yoshii , Masahito Yahagi , Yoichi Hori , Takahiro Kojima
摘要： A resist composition including a compound (D0) represented by general formula (d0) and a resin component (A1) has a structural unit (a0) in which a compound represented by general formula (a0-1) has a polymerizable group within the W1 portion converted into a main chain (in formula (d0), Rd01 represents a fluorine atom or a fluorinated alkyl group; In formula (a0-1), W1 represents a polymerizable group-containing group; Ct represents a tertiary carbon atom, and the α-position of Ct is a carbon atom which constitutes a carbon-carbon unsaturated bond; R11 represents an aromatic hydrocarbon group; or a chain hydrocarbon group; R12 and R13 each independently represents a chain hydrocarbon group, or R12 and R13 are mutually bonded to form a cyclic group).
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