摘要:
This disclosure relates to an electrolyte for a rechargeable lithium battery and a rechargeable lithium battery including the same. Some embodiments provide an electrolyte additive for a rechargeable lithium battery including a non-aqueous organic solvent; a lithium salt; a first additive including at least one selected from an additive represented by Chemical Formula 1 and an additive represented by Chemical Formula 2; and a second additive represented by Chemical Formula 3:
摘要:
The present application disclosed a compound of formula (I) and a salt and a stereoisomer thereof, wherein each variable is as defined in the specification. The present application also disclosed a nanoparticle composition comprising the compound or a salt or a stereoisomer thereof, and the use of the nanoparticle composition for delivering active agents.
摘要:
An electrochemical device includes a negative electrode and an electrolyte solution. The negative electrode includes a negative current collector and a negative electrode mixture layer. The negative electrode mixture layer includes a first section, a second section, and a third section arranged sequentially in a thickness direction. The first section, the second section, and the third section are of an identical thickness. A ratio of a porosity P1 of the first section to a porosity P2 of the third section is P. The electrolyte solution includes an additive A, which is at least one selected from a compound of Formula I or a compound of Formula II:
Based on a total mass of the electrolyte solution, a mass percent of the additive A is w %, satisfying 1≤w≤60, P=P1/P2, and P/(w %+1)≥50%.
摘要:
A rechargeable lithium battery including an electrolyte including a non-aqueous organic solvent, a lithium salt, and an additive; positive electrode including a positive electrode active material; and a negative electrode including a negative electrode active material, wherein the non-aqueous organic solvent includes less than about 5 wt % of ethylene carbonate based on the total weight of the non-aqueous organic solvent, the positive electrode active material includes a lithium nickel manganese-based oxide, and the additive includes a compound represented by Chemical Formula 1.
摘要:
The present invention relates to a compound having a cyclic sulfur oxide structure, and a non-aqueous electrolyte solution additive, a non-aqueous electrolyte solution, and a lithium secondary battery which include the same, wherein the lithium secondary battery of the present invention may achieve improved effects in terms of high-temperature stability and gas generation while being able to achieve stable performance for a long time.
摘要:
Process for the manufacturing of a polymer with urethane groups, wherein in a first alternative a compound A) with at least two five-membered cyclic monothiocarbonate groups and a compound B) with at least two amino groups, selected from primary or secondary amino groups and optionally a compound C) with at least one functional group that reacts with a group —SH are reacted or wherein in a second alternative a compound A) with at least two five-membered cyclic monothiocarbonate groups or a mixture of a compound A) with a compound A1) with one five-membered cyclic monothiocarbonate group and a compound B) with at least two amino groups, selected from primary or secondary amino groups or a compound B1) with one amino group selected from primary or secondary amino groups or mixtures of compounds B) and B1) and a compound C) with at least two functional groups that react with a group —SH or in case of a carbon-carbon triple bond as functional group that react with a group —SH, a compound C) with at least one carbon-carbon triple bond. are reacted.
摘要:
A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
摘要:
A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R1, R2, R3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NRa—. Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A− represents —SO3− or —CO2−. M+ represents a monovalent onium cation.
摘要:
A photoresist composition comprisinga resin having an acid-labile group;a salt represented by the formula (I); anda salt represented by the formula (B1).
摘要:
Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R01 represents a hydrogen atom or a monovalent organic group, and M+ represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.