公开(公告)号：US10457866B2

公开(公告)日：2019-10-29

申请号：US15560332

申请日：2016-03-04

Applicant: Central Glass Company, Limited

Inventor： Yosuke Nakamura ,  Masaki Fujiwara ,  Hiroyuki Oomori ,  Akifumi Yao

IPC: C07C17/383 ,  C07C21/18 ,  C09K13/08 ,  C23F1/10 ,  C23F1/12 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/3213

Abstract: What is disclosed is a dry etching gas containing 1,3,3,3-tetrafluoropropene, wherein 1,3,3,3-tetrafluoropropene has purity of 99.5 mass % or more, and a total of concentration of each mixed metal component of Fe, Ni, Cr, Al, and Mo is 500 mass ppb or less. Furthermore, regarding to the dry etching gas, it is preferable that a content of nitrogen is 0.5 volume % or less, and that a content of water is 0.05 mass % or less. In a dry etching with a plasma gas obtained by making a dry etching gas into plasma, the dry etching gas of the present invention can improve etching selectivity of silicon-based material with respect to a mask.

公开(公告)号：US10065912B2

公开(公告)日：2018-09-04

申请号：US15473940

申请日：2017-03-30

Applicant: CENTRAL GLASS COMPANY, LIMITED

Inventor： Takaaki Yoshimura ,  Toshihiko Oono ,  Shinya Akiba ,  Masaki Fujiwara

IPC: C07C43/00 ,  C07C41/42 ,  C07C41/22

CPC classification number: C07C41/42 ,  C07C41/22 ,  C07C41/44 ,  C07C43/123

Abstract: An object of the present invention is to remove a compound A from “sevoflurane containing fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether (compound A)” so as to collect high-purity sevoflurane. The present invention concerns a method for producing sevoflurane containing substantially no compound A, comprising the following steps of: bringing a composition containing hydrogen fluoride (HF) and water at a mass ratio of 1:1 to 1:30 into contact with a 1st organic liquid containing sevoflurane and a compound A, thereby obtaining a 2nd organic liquid containing the compound A in an amount that is lower than that in the 1st organic liquid (step 1a); and distilling the 2nd organic liquid under the presence of a degradation inhibitor, thereby obtaining sevoflurane containing substantially no compound A as a main distillation fraction (step 2).

公开(公告)号：US09488914B2

公开(公告)日：2016-11-08

申请号：US14374010

申请日：2013-01-17

Applicant: Central Glass Company, Limited

Inventor： Kazunori Mori ,  Satoru Narizuka ,  Yuji Hagiwara ,  Fumihiro Amemiya ,  Masaki Fujiwara

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  G03F7/20 ,  G03F7/30 ,  C08F220/38 ,  C07C381/12 ,  C07C309/10 ,  C07C303/22 ,  C07D307/93 ,  C07D327/04 ,  C07D307/20 ,  G03F7/38 ,  C08F222/18 ,  C08F222/14

CPC classification number: G03F7/0397 ,  C07C303/22 ,  C07C309/10 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07D307/20 ,  C07D307/93 ,  C07D327/04 ,  C08F220/38 ,  C08F222/14 ,  C08F222/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/38

Abstract: Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R01 represents a hydrogen atom or a monovalent organic group, and M+ represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

公开(公告)号：US09637435B1

公开(公告)日：2017-05-02

申请号：US15363749

申请日：2016-11-29

Applicant: Central Glass Company, Limited

Inventor： Yuzuru Morino ,  Shigeru Fujii ,  Toshihiro Nakamichi ,  Shinya Akiba ,  Masaaki Takeda ,  Masaki Fujiwara

IPC: C07C41/09 ,  C07C45/82 ,  B01J23/44 ,  B01J21/04 ,  C07C29/145 ,  B01J23/46 ,  G01N30/68 ,  C07C43/12 ,  G01N30/02

CPC classification number: C07C41/09 ,  B01J21/04 ,  B01J23/44 ,  B01J23/462 ,  C07C29/145 ,  C07C29/60 ,  C07C41/01 ,  C07C45/82 ,  C07C45/85 ,  G01N30/68 ,  G01N2030/025 ,  Y02P20/582 ,  C07C31/38 ,  C07C49/167 ,  C07C43/123

Abstract: Disclosed is a method for producing a hexafluoroisopropanol, including the steps of (a) purifying a mixture containing hexafluoroacetone and at least 1,1,1-trifluoro-2,2-dichloroethane as an impurity, thereby obtaining a purified hexafluoroacetone containing 120 ppm or lower of the 1,1,1-trifluoro-2,2-dichloroethane; and (b) bringing hydrogen (H2) into contact with the purified hexafluoroacetone in the presence of a catalyst, thereby hydrogenating the hexafluoroacetone into the hexafluoroisopropanol. It is possible by this method to produce the hexafluoroisopropanol with a short reaction time and a high conversion. Therefore, it is possible to particularly advantageously produce fluoromethyl hexafluoroisopropyl ether (sevoflurane) by using the hexafluoroisopropanol produced by the method.

公开(公告)号：US09152045B2

公开(公告)日：2015-10-06

申请号：US14300546

申请日：2014-06-10

Applicant: Central Glass Company, Limited

Inventor： Kazunori Mori ,  Satoru Narizuka ,  Fumihiro Amemiya ,  Masaki Fujiwara

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  G03F7/20 ,  C08F28/04 ,  C08F220/38 ,  C08F220/24 ,  C08F220/28 ,  C07C309/10 ,  C08F228/04 ,  C08F222/14 ,  C08F222/18

CPC classification number: G03F7/0045 ,  C07C309/10 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/18 ,  C07C2603/74 ,  C08F28/04 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  C08F222/14 ,  C08F222/18 ,  C08F228/04 ,  C08F2220/382 ,  G03F7/004 ,  G03F7/0041 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2039 ,  G03F7/2041 ,  G03F7/30

Abstract: According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.

Abstract translation: 根据本发明，提供具有下述通式（3）的重复单元的含氟磺酸酯树脂。 为了防止图案形成或图案形成失败后的粗糙度等缺陷，含氟磺酸酯树脂中含有光致酸产生功能，作为抗蚀剂树脂，其中“能够通过作用 酸“和”具有光酸产生功能的部分“被规则排列。

公开(公告)号：US20150198879A1

公开(公告)日：2015-07-16

申请号：US14374010

申请日：2013-01-17

Applicant: Central Glass Company, Limited

Inventor： Kazunori Mori ,  Satoru Narizuka ,  Yuji Hagiwara ,  Fumihiro Amemiya ,  Masaki Fujiwara

IPC: G03F7/038 ,  C07C309/10 ,  G03F7/20 ,  C07C303/22 ,  C07D327/04 ,  C07D307/20 ,  C07D307/93

CPC classification number: G03F7/0397 ,  C07C303/22 ,  C07C309/10 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07D307/20 ,  C07D307/93 ,  C07D327/04 ,  C08F220/38 ,  C08F222/14 ,  C08F222/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/38

Abstract: Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R01 represents a hydrogen atom or a monovalent organic group, and M+ represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

Abstract translation: 公开了具有下述通式（3）表示的重复单元的含氟磺酸盐树脂。 式中，A独立地表示氢原子，氟原子或三氟甲基，n表示1〜10的整数。 W表示二价连接基团，R 01表示氢原子或一价有机基团，M +表示一价阳离子。 含有这种树脂的抗蚀剂组合物的灵敏度，分辨率和掩模图案的再现性进一步优异，并且能够形成具有低LER的图案。

公开(公告)号：US08748672B2

公开(公告)日：2014-06-10

申请号：US13935647

申请日：2013-07-05

Applicant: Central Glass Company, Limited

Inventor： Yuji Hagiwara ,  Masashi Nagamori ,  Masaki Fujiwara ,  Jonathan Joachim Jodry ,  Satoru Narizuka

IPC: C07C31/34

CPC classification number: C07C309/17 ,  C07C29/147 ,  C07C67/08 ,  C07C67/14 ,  C07C303/32 ,  C07C309/08 ,  C07C309/12 ,  C07C313/04 ,  C07C381/12 ,  C07C2602/42 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  C07C31/34 ,  C07C69/653 ,  C07C69/63 ,  C07C69/753

Abstract: By using an organic base when a carboxylic acid bromodifluoroethyl ester is sulfinated by using a sulfinating agent, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt. By oxidizing the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt. By using the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt as a raw material and exchanging it into an onium salt directly or through saponification/esterification, there can be obtained a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid onium salt.

Abstract translation: 通过使用硫酸化剂将羧酸溴二氟乙酯磺化时，通过使用有机碱，得到2-（烷基羰氧基）-1,1-二氟乙烷亚磺酸铵盐。 通过氧化2-（烷基羰基氧基）-1,1-二氟乙烷亚磺酸铵盐，得到2-（烷基羰氧基）-1,1-二氟乙磺酸铵盐。 通过使用2-（烷基羰氧基）-1,1-二氟乙磺酸铵盐作为原料，直接或通过皂化/酯化将其交换为鎓盐，可以得到2-烷基羰基氧基-1,1-二氟乙磺酸 盐盐