公开(公告)号：US4785176A

公开(公告)日：1988-11-15

申请号：US30964

申请日：1987-03-27

Applicant: Juergen Frosien ,  Erich Plies

Inventor： Juergen Frosien ,  Erich Plies

IPC: H01J37/12 ,  G01Q30/02 ,  H01J37/10 ,  H01J37/141 ,  H01J37/145 ,  H01J49/06

CPC classification number: H01J37/10 ,  H01J37/145

Abstract: An electrostatic-magnetic lens is provided having either a symmetrical or asymmetrical magnetic lens which is overlaid with an electrostatic immersion lens. One electrode of the immersion lens is formed as a hollow cylinder, which is within an upper pole piece of the magnetic lens concentrically relative to the axis of symmetry thereof and extending into the region of the pole piece gap. The lower pole piece of the magnetic lens is preferably at a ground potential and clad with the beam guiding tube for protection against contamination and forming the lower electrode of the electrostatic immersion lens.

Abstract translation: 提供具有与静电浸没透镜重叠的对称或非对称磁性透镜的静电磁透镜。 浸没透镜的一个电极形成为中空圆柱体，其位于磁性透镜的上极片内，相对于其对称轴线同心并延伸到极片间隙的区域中。 磁透镜的下极片优选为接地电位，并与光束引导管一起包围以防止污染并形成静电浸没透镜的下电极。

公开(公告)号：US20240347316A1

公开(公告)日：2024-10-17

申请号：US18753972

申请日：2024-06-25

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Hans Fritz ,  Ingo Mueller

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/26 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/263 ,  H01J37/3023 ,  H01J2237/0453 ,  H01J2237/04926

Abstract: A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.

公开(公告)号：US11942303B2

公开(公告)日：2024-03-26

申请号：US17359365

申请日：2019-12-06

Applicant: ASML Netherlands B.V.

Inventor： Yan Ren ,  Albertus Victor Gerardus Mangnus

IPC: H01J37/147 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/1478 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/145 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/28 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/507 ,  H01J2237/0455 ,  H01J2237/04926 ,  H01J2237/103 ,  H01J2237/151 ,  H01J2237/226 ,  H01J2237/2611

Abstract: Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.

公开(公告)号：USRE49784E1

公开(公告)日：2024-01-02

申请号：US17005212

申请日：2020-08-27

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen

IPC: H01J37/06 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  G01N23/2251 ,  H01J37/145 ,  H01J37/05 ,  H01J37/244

CPC classification number: H01J37/06 ,  G01N23/2251 ,  H01J37/05 ,  H01J37/145 ,  H01J37/1474 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  G01N2223/418 ,  G01N2223/6116 ,  H01J2237/057 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.

公开(公告)号：US11764036B2

公开(公告)日：2023-09-19

申请号：US16720037

申请日：2019-12-19

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schmaunz

IPC: H01J37/32 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304

CPC classification number: H01J37/32449 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/006 ,  H01J2237/2065

Abstract: A gas feed device is operated, including displaying a functional parameter of the gas feed device. A gas feed device may carry out the operation, and a particle beam apparatus may include the gas feed device. A method may include predetermining and/or measuring a current temperature of a precursor reservoir of the gas feed device using a temperature measuring unit, where the precursor reservoir contains a precursor to be fed onto an object, loading a flow rate of the precursor through an outlet of the precursor reservoir from a database into a control unit, said flow rate being associated with the current temperature of the precursor reservoir, and (i) displaying the flow rate on the display unit and/or (ii) determining the functional parameter of the precursor reservoir depending on the flow rate using the control unit and informing a user of the gas feed device about the determined functional parameter.

公开(公告)号：US11721518B2

公开(公告)日：2023-08-08

申请号：US17160679

申请日：2021-01-28

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schertel ,  Andreas Schmaunz ,  Endre Majorovits ,  Bernd Stenke ,  Stephan Hiller ,  Matthias Karl

IPC: H01J37/16 ,  H01J37/20 ,  H01J37/145 ,  H01J37/147 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/16 ,  H01J37/145 ,  H01J37/1475 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J2237/2007

Abstract: An object receiving container may receive an object which is examinable, analyzable and/or processable at cryo-temperatures. An object holding system may comprise an object receiving container. A beam apparatus or an apparatus for processing an object may comprise an object receiving container or an object holding system. An object may be examined, analyzed and/or processed using an object receiving container or an object holding system. The object receiving container may comprise a first container unit, a cavity for receiving the object, a second container unit, which is able to be brought into a first position and/or into a second position relative to the first container unit, and at least one fastening device which is arranged at the first container unit or at the second container unit for arranging the object receiving container at a holding device.

公开(公告)号：US20230245852A1

公开(公告)日：2023-08-03

申请号：US18185324

申请日：2023-03-16

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Thomas Schmid ,  Ingo Mueller ,  Walter Pauls ,  Stefan Schubert

IPC: H01J37/28 ,  H01J37/21 ,  H01J37/153 ,  H01J37/147 ,  H01J37/145 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/21 ,  H01J37/153 ,  H01J37/1474 ,  H01J37/145 ,  H01J37/265 ,  H01J2237/216 ,  H01J2237/1534

Abstract: A multiple particle beam microscope and an associated method can provide a fast autofocus around an adjustable working distance. A system can have one or more fast autofocus correction lenses for adapting, in high-frequency fashion, the focusing, the position, the landing angle and the rotation of individual particle beams upon incidence on a wafer surface during the wafer inspection. Fast autofocusing in the secondary path of the particle beam system can be implemented in analogous fashion. An additional increase in precision can be attained via fast aberration correction mechanism in the form of deflectors and/or stigmators.

公开(公告)号：US11670479B2

公开(公告)日：2023-06-06

申请号：US17338353

申请日：2021-06-03

Applicant: Hitachi High-Tech Corporation

Inventor： Takeyoshi Ohashi ,  Hyejin Kim ,  Yusuke Abe ,  Kenji Tanimoto

IPC: H01J37/28 ,  H01J37/21 ,  G06T1/00 ,  G06T7/73 ,  H01J37/145 ,  H01J37/22

CPC classification number: H01J37/21 ,  G06T1/0007 ,  G06T7/73 ,  H01J37/145 ,  H01J37/222 ,  G06T2200/24 ,  G06T2207/10056 ,  G06T2207/30148

Abstract: When focus adjustment is performed according to the height of the surface of a sample at each inspection point in order to continuously inspect a plurality of inspection points on a wafer by using an electron microscope, even when the focus adjustment by an electrostatic lens in which a variation of heights of inspection points is greater than a predetermined range, and that can perform adjustment at a high speed and adjustment by an electromagnetic lens with a low speed are required to be used together, a flow of focus adjustment in which the number of times of the adjustment by the electromagnetic lens is reduced by using a relation of changes of heights at inspection points, an inspection order, and a range in which an electrostatic focus can be performed is realized, so that inspection with high throughput is made possible.

公开(公告)号：US20180337017A1

公开(公告)日：2018-11-22

申请号：US15596850

申请日：2017-05-16

Applicant: International Business Machines Corporation

Inventor： Rudolf M. Tromp

IPC: H01J37/153 ,  H01J37/29 ,  H01J37/145 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/145 ,  H01J37/1472 ,  H01J37/29 ,  H01J2237/1508 ,  H01J2237/1534 ,  H01J2237/2602

Abstract: An electron microscope system and a method of measuring an aberration of the electron microscope system are disclosed. An aperture filters an electron beam at a diffraction plane of the electron microscope to pass through electrons having a selected energy and momentum. A displacement of an image of the passed electrons is measured at a detector in an image plane of the electron microscope. An aberration coefficient of the electron microscope is determined from the measured displacement and at least one of the energy and momentum of the passed electrons. The measured aberration can be used to alter a parameter of the electron microscope or an optical element of the electron microscope to thereby control the overall aberration of the electron microscope.

公开(公告)号：US10014152B2

公开(公告)日：2018-07-03

申请号：US15386740

申请日：2016-12-21

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/00 ,  H01J37/141 ,  H01J37/12 ,  H01J37/145

CPC classification number: H01J37/141 ,  H01J37/12 ,  H01J37/145 ,  H01J37/1471 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/2802

Abstract: There are disclosed an aberration correction method and a charged particle beam system capable of correcting off-axis first order aberrations. The aberration correction method is for use in the charged particle beam system (100) equipped with an aberration corrector (30) which has plural stages of multipole elements (32a, 32b) and a transfer lens system (34) disposed between the multipole elements (32a, 32b). The method includes varying the excitation of the transfer lens system (34) and correcting off-axis first order aberrations.