公开(公告)号：US20180114672A1

公开(公告)日：2018-04-26

申请号：US15527119

申请日：2016-03-24

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Takashi OGAWA ,  Ju Hwang KIM ,  In Yong PARK

IPC: H01J37/30 ,  H01J37/305

CPC classification number: H01J37/3007 ,  H01J29/62 ,  H01J29/70 ,  H01J31/24 ,  H01J37/05 ,  H01J37/3005 ,  H01J37/3053 ,  H01J2237/03 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/103 ,  H01J2237/12 ,  H01J2237/2802

Abstract: The present invention relates to a charged particle beam apparatus enabling a selection of a charged particle beam in a specified energy range by symmetrically arranging cylindrical electrostatic lenses deflecting a path of the charged particle beam and disposing an energy selection aperture between the cylindrical electrostatic lenses. Since an integral structure in which a central electrode and a plurality of electrodes that are arranged at a front portion and a rear portion in relation to the central electrode of a monochromator are fixed to each other through insulator, is applied, a mechanism for adjusting an offset with respect to an optical axis is simplified as compared to the case of separately providing the lenses at the front portion and the rear portion, respectively, and a secondary aberration is canceled in an exit plane due to symmetry of an optical system.

公开(公告)号：US09874524B2

公开(公告)日：2018-01-23

申请号：US15061769

申请日：2016-03-04

Applicant: Applied Materials, Inc.

Inventor： Tae Seung Cho ,  Junghoon Kim ,  Soonwook Jung ,  Soonam Park ,  Dmitry Lubomirsky

IPC: G01J3/44 ,  G01N21/68 ,  H01J37/10 ,  H01J37/32

CPC classification number: G01N21/68 ,  G01J3/0208 ,  G01J3/0229 ,  G01J3/0237 ,  G01J3/0289 ,  G01J3/06 ,  G01J3/443 ,  G01N21/73 ,  G01N2201/0638 ,  G01N2201/068 ,  H01J37/10 ,  H01J37/32458 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/32972 ,  H01J2237/103 ,  H01J2237/3341

Abstract: Implementations of the present disclosure relate to a plasma chamber having an optical device for measuring emission intensity of plasma species. In one implementation, the plasma chamber includes a chamber body defining a substrate processing region therein, the chamber body having a sidewall, a viewing window disposed in the sidewall, and a plasma monitoring device coupled to the viewing window. The plasma monitoring device includes an objective lens and an aperture member having a pinhole, wherein the aperture member is movable relative to the objective lens by an actuator to adjust the focal point in the plasma using principles of optics, allowing only the light rays from the focal point in the plasma to reach the pinhole. The plasma monitoring device therefore enables an existing OES (coupled to the plasma monitoring device through an optical fiber) to monitor emission intensity of the species at any specific locations of the plasma.

公开(公告)号：US20160225581A1

公开(公告)日：2016-08-04

申请号：US15022436

申请日：2014-10-31

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takashi KUBO ,  Hiroyuki KOBAYASHI

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/26

CPC classification number: H01J37/222 ,  H01J37/10 ,  H01J37/22 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/045 ,  H01J2237/103 ,  H01J2237/221 ,  H01J2237/248 ,  H01J2237/2602

Abstract: To improve the workability of the task of adjusting the position of a limit field diaphragm. An electron microscope provided with an image-capturing means for capturing an image of an observation visual field prior to insertion of a limit field diaphragm as a map image, a recording means for recording the map image, an extraction means for capturing an image of the observation visual field after insertion of the limit field diaphragm and extracting the outline of the diaphragm, a drawing means for drawing the outline on the map image, and a display means for displaying the image drawn by the drawing means.

Abstract translation: 提高调节极限场隔膜位置任务的可操作性。 一种具有图像捕获装置的电子显微镜，其用于在作为地图图像的极限场光阑插入之前捕获观察视野的图像，用于记录地图图像的记录装置，用于拍摄图像的图像的提取装置 插入极限视场光阑并提取光阑的轮廓之后的观察视野，用于在地图图像上绘制轮廓的绘图装置，以及显示由绘图装置绘制的图像的显示装置。

公开(公告)号：US08847172B2

公开(公告)日：2014-09-30

申请号：US13297628

申请日：2011-11-16

Applicant: Hidetaka Sawada ,  Takeo Sasaki

Inventor： Hidetaka Sawada ,  Takeo Sasaki

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/103 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/262

Abstract: A method for axial alignment of a charged particle beam relative to at least three stages of multipole elements and a charged particle beam system capable of making the axial alignment. Some parts of the orbit of the beam or the distributions of three astigmatic fields, or both, are simultaneously translated in a direction perpendicular to the optical axis such that astigmatisms of the same order and same type due to axial deviations between successive ones of the astigmatic fields cancel.

Abstract translation: 一种用于相对于多极元件的至少三级的带电粒子束和能够进行轴向对准的带电粒子束系统的轴向对准的方法。 光束轨道的一些部分或三个散光场或两者的分布在垂直于光轴的方向上同时平移，使得由于像散的连续散射之间的轴向偏差而具有相同阶数和相同类型的像散 字段取消。

公开(公告)号：US20120119107A1

公开(公告)日：2012-05-17

申请号：US13297628

申请日：2011-11-16

Applicant: Hidetaka Sawada ,  Takeo Sasaki

Inventor： Hidetaka Sawada ,  Takeo Sasaki

IPC: H01J1/50

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/103 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/262

Abstract: A method for axial alignment of a charged particle beam relative to at least three stages of multipole elements and a charged particle beam system capable of making the axial alignment. Some parts of the orbit of the beam or the distributions of three astigmatic fields, or both, are simultaneously translated in a direction perpendicular to the optical axis such that astigmatisms of the same order and same type due to axial deviations between successive ones of the astigmatic fields cancel.

Abstract translation: 一种用于相对于多极元件的至少三级的带电粒子束和能够进行轴向对准的带电粒子束系统的轴向对准的方法。 光束轨道的一些部分或三个散光场或两者的分布在垂直于光轴的方向上同时平移，使得由于像散的连续散射之间的轴向偏差而具有相同阶数和相同类型的散光 字段取消。

公开(公告)号：US20090108200A1

公开(公告)日：2009-04-30

申请号：US11926791

申请日：2007-10-29

Applicant: Shixin Wang

Inventor： Shixin Wang

IPC: H01J37/28 ,  H01J3/22

CPC classification number: H01J37/14 ,  H01J29/64 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/045 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1534

Abstract: A method and electron microscope system of performing three-dimensional imaging using an electron microscope. At least some of the illustrative embodiments are methods comprising generating an electron beam, and creating a hollow-cone electron beam (by passing the electron beam through an annular aperture), focusing the hollow-cone electron beam to form a probe, scanning a specimen using the probe; and performing three-dimensional imaging based on the scanning.

Abstract translation: 使用电子显微镜进行三维成像的方法和电子显微镜系统。 至少一些说明性实施例是包括产生电子束并产生中空锥形电子束（通过使电子束通过环形孔）的方法，聚焦中空锥形电子束以形成探针，扫描样品 使用探针; 并基于扫描进行三维成像。

公开(公告)号：US06802986B2

公开(公告)日：2004-10-12

申请号：US10197309

申请日：2002-07-16

Applicant: Katsushi Nakano

Inventor： Katsushi Nakano

IPC: H01B1300

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01F5/003 ,  H01F7/20 ,  H01F7/202 ,  H01F2041/0711 ,  H01J37/147 ,  H01J37/1475 ,  H01J37/3174 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1526 ,  H01J2237/1534 ,  Y10T29/4902

Abstract: Deflectors are disclosed that are suitable for use in various charged-particle-beam (CPB) optical systems as used, for example, in CPB microlithography systems. The deflectors produce a strong magnetic beam-deflecting field when energized with a relatively small electrical current. The beam-deflecting field thus produced is stable with respect to temperature changes, is little affected by eddy currents, and exhibits low aberration caused by manufacturing tolerances of the coil and core. In an exemplary method for manufacturing such a deflector, a magnetic-tape laminate is used as the core. Also, high-precision positioning of the coil and the magnetic-tape laminate is performed using photolithography and electrocasting. Positioning of the magnetic-tape laminate can be performed using a resist pattern formed by photolithography.

Abstract translation: 公开了适用于例如在CPB微光刻系统中使用的各种带电粒子束（CPB）光学系统的偏转器。 当相对较小的电流通电时，偏转器产生强磁场偏转场。 由此产生的光束偏转场相对于温度变化是稳定的，几乎不受涡流的影响，并且表现出由线圈和芯的制造公差引起的低像差。 在制造这种偏转器的示例性方法中，使用磁带层压体作为核心。 此外，使用光刻和电铸来进行线圈和磁带层压体的高精度定位。 可以使用通过光刻形成的抗蚀剂图案来进行磁带层压体的定位。

公开(公告)号：US20230411108A1

公开(公告)日：2023-12-21

申请号：US18319554

申请日：2023-05-18

Applicant: Hitachi High-Tech Corporation

Inventor： Hideyuki Kotsuji ,  Toshiyuki Yokosuka ,  Hajime Kawano

IPC: H01J37/02 ,  H01J37/28

CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J2237/103 ,  H01J2237/2007

Abstract: A charged particle beam device includes: a plasma generation device attached to a sample chamber through a connecting member; a guide including a hollow portion configured to guide a plasma generated by the plasma generation device in a direction toward a stage; a first voltage source configured to apply a voltage to the stage; and a second voltage source configured to adjust the plasma generation device and the guide to a predetermined potential, in which the guide is disposed to avoid an opening of an objective lens through which a charged particle beam passes and to position a tip of the guide between the objective lens and the stage.

公开(公告)号：US20230395349A1

公开(公告)日：2023-12-07

申请号：US17830244

申请日：2022-06-01

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/073 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  H01J37/12 ,  H01J37/14

CPC classification number: H01J37/073 ,  H01J37/28 ,  H01J37/1472 ,  H01J37/22 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/103 ,  H01J2237/2448 ,  H01J2237/0492 ,  H01J2237/06333

Abstract: An electron-beam device includes a laser and a photocathode film. The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser. The electron-beam device also includes electrodes to extract the plurality of electron beamlets from the front side of the photocathode film and to control shapes of the plurality of electron beamlets.

公开(公告)号：US20160343535A1

公开(公告)日：2016-11-24

申请号：US15070679

申请日：2016-03-15

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Hideki MATSUI

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/1472 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/103 ,  H01J2237/1504 ,  H01J2237/2485 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31766

Abstract: In one embodiment, a charged particle beam drawing apparatus deflects a charged particle beam with a deflector to draw a pattern. The apparatus includes a storage unit that stores an approximate formula indicating a correspondence relationship between a settling time for a DAC amplifier that controls the deflector, and a position shift amount, from a design position, of a drawn position of each evaluation pattern drawn on a first substrate while the settling time and an amount of deflection by the deflector are changed, a shot position correction unit that creates a correction formula indicating a relationship between an amount of deflection and a shot position shift amount at the settling time, from the approximate formula and the settling time for the DAC amplifier based on an amount of deflection of a shot, obtains a position correction amount by using the amount of deflection of the shot and the correction formula, and corrects a shot position defined by the shot data based on the position correction amount, and a drawing unit that performs drawing by using the shot data with a corrected shot position.

Abstract translation: 在一个实施例中，带电粒子束描绘装置使带电粒子束偏转导流板以绘制图案。 该装置包括：存储单元，存储表示在控制偏转器的DAC放大器的建立时间之间的对应关系的近似式，以及从设计位置到绘制在每个评估图案的绘制位置的位置偏移量 第一基板，同时改变了偏转器的稳定时间和偏转量;拍摄位置校正单元，从近似公式产生指示偏转量与拍摄位置偏移量之间的关系的校正公式， 并且基于射击偏转量的DAC放大器的建立时间，通过使用镜头的偏转量和校正公式来获得位置校正量，并且基于镜头数据来校正由镜头数据定义的镜头位置 位置校正量，以及通过使用具有校正的拍摄位置的拍摄数据进行绘制的绘图单元。