Abstract:
Disclosed herein are a monochromator and a charged particle beam apparatus including the same. The monochromator may include a first electrostatic lens configured to have a charged particle beam discharged by an emitter incident on the first electrostatic lens, refract a ray of the charged particle beam, and include a plurality of electrodes and a second electrostatic lens spaced apart from the first electrostatic lens at a specific interval and configured to have a central axis disposed identically with a central axis of the first electrostatic lens, have the charged particle beam output by the first electrostatic lens incident on the second electrostatic lens, refract the ray of the charged particle beam, and comprise a plurality of electrodes. Accordingly, there is an advantage in that a charged particle beam can have an excellent profile even after passing through the monochromator.
Abstract:
An objective lens for a charged particle beam apparatus that provides a charged particle beam to a sample, includes: a first electrode exposed to face a sample; a second electrode configured to focus a charged particle beam to the sample; a third electrode comprising a conical tip and a body extending from the tip; and a fourth electrode located in the body of the third electrode. Each of the first electrode, the second electrode, the third electrode, and the fourth electrode has a through-hole, and the charged particle beam is provided to the sample through the through-hole in response to a voltage applied.
Abstract:
The present invention relates to an electron beam apparatus including a monochromator in which cylindrical electrostatic lenses for deflecting a path of an electron beam in the lenses are arranged symmetrically and an aperture including a plurality of selectable slits is disposed therebetween to be able to select an electron beam having a specified energy range. The electron beam apparatus has a monochromator having high resolution and excellent stability and maintainability by disposing slits and circular openings in one aperture part in parallel arrangement, thereby improving spatial resolution and energy resolution.
Abstract:
A charged particle beam apparatus includes: a stage on which a sample is placed; a first charged particle beam unit comprising a charged particle source, a detector, and a first objective lens configured to irradiate a sample with a charged particle beam of charged particles generated by the charged particle source and induce secondary electrons generated from the sample to the detector; and a second charged particle beam unit comprising a second objective lens. An incoming electric field is generated between the first objective lens and the sample to pull the secondary electrons into the first objective lens. An induced electric field is generated between the second objective lens and the sample to guide the secondary electrons to travel to the detector.
Abstract:
The present invention relates to a charged particle beam apparatus enabling a selection of a charged particle beam in a specified energy range by symmetrically arranging cylindrical electrostatic lenses deflecting a path of the charged particle beam and disposing an energy selection aperture between the cylindrical electrostatic lenses. Since an integral structure in which a central electrode and a plurality of electrodes that are arranged at a front portion and a rear portion in relation to the central electrode of a monochromator are fixed to each other through insulator, is applied, a mechanism for adjusting an offset with respect to an optical axis is simplified as compared to the case of separately providing the lenses at the front portion and the rear portion, respectively, and a secondary aberration is canceled in an exit plane due to symmetry of an optical system.