Invention Application
- Patent Title: CHARGED PARTICLE BEAM APPARATUS
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Application No.: US18519810Application Date: 2023-11-27
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Publication No.: US20250046564A1Publication Date: 2025-02-06
- Inventor: Takashi OGAWA , In Yong PARK , Jeong Woong LEE
- Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- Applicant Address: KR Daejeon
- Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- Current Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- Current Assignee Address: KR Daejeon
- Priority: KR10-2023-0102422 20230804
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/08 ; H01J37/20 ; H01J37/22 ; H01J37/24 ; H01J37/244 ; H01J37/28

Abstract:
A charged particle beam apparatus includes: a stage on which a sample is placed; a first charged particle beam unit comprising a charged particle source, a detector, and a first objective lens configured to irradiate a sample with a charged particle beam of charged particles generated by the charged particle source and induce secondary electrons generated from the sample to the detector; and a second charged particle beam unit comprising a second objective lens. An incoming electric field is generated between the first objective lens and the sample to pull the secondary electrons into the first objective lens. An induced electric field is generated between the second objective lens and the sample to guide the secondary electrons to travel to the detector.
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