Combined Electrostatic Lens System for Ion Implantation
    143.
    发明申请
    Combined Electrostatic Lens System for Ion Implantation 有权
    用于离子植入的组合静电透镜系统

    公开(公告)号:US20160189912A1

    公开(公告)日:2016-06-30

    申请号:US14978089

    申请日:2015-12-22

    Abstract: A system and method are provided for implanting ions at low energies into a workpiece. An ion source configured to generate an ion beam is provided, wherein a mass resolving magnet is configured to mass resolve the ion beam. The ion beam may be a ribbon beam or a scanned spot ion beam. A mass resolving aperture positioned downstream of the mass resolving magnet filters undesirable species from the ion beam. A combined electrostatic lens system is positioned downstream of the mass analyzer, wherein a path of the ion beam is deflected and contaminants are generally filtered out of the ion beam, while concurrently decelerating and parallelizing the ion beam. A workpiece scanning system is further positioned downstream of the combined electrostatic lens system, and is configured to selectively translate a workpiece in one or more directions through the ion beam, therein implanting ions into the workpiece.

    Abstract translation: 提供了一种用于将低能量离子注入工件的系统和方法。 提供了一种被配置为产生离子束的离子源,其中质量分辨磁体构造成质量分辨离子束。 离子束可以是带状束或扫描的点离子束。 位于质量分辨磁体下游的质量分辨孔径从离子束过滤不期望的物质。 组合的静电透镜系统位于质量分析器的下游,其中离子束的路径被偏转并且污染物通常从离子束过滤掉,同时使离子束同时减速和平行化。 工件扫描系统还位于组合的静电透镜系统的下游,并且被配置为在一个或多个方向上选择性地平移通过离子束的工件,其中将离子注入到工件中。

    CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE
    144.
    发明申请
    CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE 有权
    带特殊孔板的充电颗粒显微镜

    公开(公告)号:US20160111247A1

    公开(公告)日:2016-04-21

    申请号:US14884520

    申请日:2015-10-15

    Applicant: FEI Company

    Abstract: A Charged Particle Microscope, comprising: includes A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; and A detector, for detecting a flux of radiation emanating from the specimen in response to said irradiation. The illuminator includes: An aperture plate comprising an aperture region in a path of said beam, for defining a geometry of the beam prior to its impingement upon said specimen. The aperture region includes a distribution of multiple holes, each of which is smaller than a diameter of the beam incident on the aperture plate.

    Abstract translation: 带电粒子显微镜,包括:包括用于保持样本的样本保持器; 用于生产带电粒子束的源头; 用于引导所述光束以照射所述样本的照明器; 和A检测器,用于响应于所述照射来检测从样品发出的辐射通量。 照明器包括:孔板,其包括在所述梁的路径中的孔区域,用于在其撞击到所述样本之前限定所述梁的几何形状。 开口区域包括多个孔的分布,每个孔小于入射在孔板上的束的直径。

    Scanning electron microscope
    146.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US09305745B2

    公开(公告)日:2016-04-05

    申请号:US14379733

    申请日:2013-02-15

    Abstract: The purpose of the present invention is to provide a scanning electron microscope that achieves an increase in both resolution and pattern recognition capability. In order to achieve the purpose, the present invention proposes a scanning electron microscope provided with a monochromator that makes an electron beam monochromatic, the monochromator including a magnetic field generator that deflects the electron beam, and an energy selection aperture that passes a part of the electron beam deflected by the magnetic field generator. An aperture that passes some of electrons emitted from the sample and a detector that detects the electrons that have passed through the aperture are disposed on a trajectory to which the electrons emitted from the sample are deflected by a magnetic field generated by the magnetic field generator.

    Abstract translation: 本发明的目的是提供一种扫描电子显微镜,其实现分辨率和图案识别能力的增加。 为了实现该目的,本发明提出了一种具有单色仪的扫描电子显微镜,其使电子束单色,单色器包括使电子束偏转的磁场发生器,以及通过一部分能量选择孔 由磁场发生器偏转的电子束。 通过从样品发射的一些电子的孔和检测已经通过孔的电子的检测器设置在由样品发射的电子被磁场发生器产生的磁场偏转的轨迹上。

    Electron Microscope and Method of Adjusting Same
    147.
    发明申请
    Electron Microscope and Method of Adjusting Same 有权
    电子显微镜及其调整方法

    公开(公告)号:US20160071683A1

    公开(公告)日:2016-03-10

    申请号:US14823222

    申请日:2015-08-11

    Applicant: JEOL Ltd.

    Inventor: Masaki Mukai

    CPC classification number: H01J37/05 H01J37/265 H01J2237/057

    Abstract: An electron microscope is offered which can adjust an energy-selecting slit in a short time by smoothly moving the slit. The electron microscope (100) includes an electron beam source (10) emitting an electron beam (EB), an energy filter (22) producing a deflecting field in the path of the electron beam (EB) to disperse the beam (EB) according to energy, a slit plate (24) disposed on an energy dispersive plane and provided with at least one energy-selecting slit (25), a current measuring section (50) for measuring the electrical current of the beam (EB) absorbed into the slit plate (24), and an energy filter controller (60) for controlling the intensity of the deflecting field of the energy filter (22) on the basis of results of measurements made by the current measuring section (50).

    Abstract translation: 提供一种电子显微镜,其可以通过平滑地移动狭缝来在短时间内调节能量选择缝。 电子显微镜(100)包括发射电子束(EB)的电子束源(10),在电子束(EB)的路径中产生偏转场的能量过滤器(22),以使光束(EB)分散 设置在能量分散平面上并且设置有至少一个能量选择狭缝(25)的狭缝板(24),用于测量吸收到所述光束中的所述光束(EB)的电流的电流测量部分(50) 狭缝板(24)和能量过滤器控制器(60),用于根据由电流测量部件(50)进行的测量结果控制能量过滤器(22)的偏转场强度。

    Energy Filter for Charged Particle Beam Apparatus
    148.
    发明申请
    Energy Filter for Charged Particle Beam Apparatus 有权
    带电粒子束能量滤波器

    公开(公告)号:US20160035533A1

    公开(公告)日:2016-02-04

    申请号:US14800098

    申请日:2015-07-15

    Abstract: This invention provides two methods for improving performance of an energy-discrimination detection device with an energy filter of reflective type for a charged particle beam. The first method employs a beam-adjusting means to improve the energy-discrimination power, and the second method uses an electron-multiplication means to enhance the image signal without noise raise. A LVSEM with such an improved energy-discrimination detection device can provide variant high-contrast images of interested features on a specimen surface for multiple application purposes.

    Abstract translation: 本发明提供了两种用于利用带电粒子束的反射型能量滤波器来改善能量鉴别检测装置的性能的方法。 第一种方法采用光束调节装置来提高能量鉴别能力,第二种方法使用电子倍增装置来增强图像信号而没有噪声提高。 具有这种改进的能量鉴别检测装置的LVSEM可以在样本表面上提供用于多种应用目的的感兴趣特征的变体高对比度图像。

    Broadband ion beam analyzer
    150.
    发明授权
    Broadband ion beam analyzer 有权
    宽带离子束分析仪

    公开(公告)号:US09123522B2

    公开(公告)日:2015-09-01

    申请号:US14357139

    申请日:2012-11-02

    Abstract: A broadband ion beam analyzer, used for isolating required ions from a broadband ion beam, comprises an upper magnetic pole (1), a lower magnetic pole (2), an upper excitation coil (3), a lower excitation coil (4), an analysis grating (7), and a magnetic yoke (5 and 6). The upper magnetic pole (1) and the lower magnetic pole (2) are both provided with a camber-shaped incident-end boundary (101) and a camber-shaped emergence side boundary (102). The camber radii (Rb) of the incident-end boundary (101) and of the emergence-end boundary (102) are equal to the deflection radius (R) of the required ions in the magnetic field. The required ions in the broadband ion beam are allowed to focus ideally at the mid-section of the magnetic field, to acquire an ideal focal spot having a size that equals to zero. This allows for acquisition of the optimal resolution by selecting an appropriate width for a minimal analysis gap (701), thus implementing complete isolation of the required ions from other ions in the broadband ion beam.

    Abstract translation: 用于从宽带离子束分离所需离子的宽带离子束分析仪包括上磁极(1),下磁极(2),上激励线圈(3),下激励线圈(4) 分析光栅(7)和磁轭(5和6)。 上磁极(1)和下磁极(2)均设有弧形入射端边界(101)和弧形出射边界(102)。 入射端边界(101)和出射端边界(102)的弧度半径(Rb)等于磁场中所需离子的偏转半径(R)。 允许宽带离子束中所需的离子理想地聚焦在磁场的中间部分,以获得具有等于零的大小的理想焦斑。 这允许通过为最小分析间隙选择适当的宽度来获取最佳分辨率(701),从而实现所需离子与宽带离子束中的其它离子的完全隔离。

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