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    Micro-Electron Column Having An Electron Emitter Improving The Density Of An Electron Beam Emitted From A Nano Structure Tip
    146.
    发明申请
    Micro-Electron Column Having An Electron Emitter Improving The Density Of An Electron Beam Emitted From A Nano Structure Tip 有权
    具有电子发射体的微电子柱改善了纳米结构尖端发射的电子束的密度

    公开(公告)号：US20160247658A1

    公开(公告)日：2016-08-25

    申请号：US15048650

    申请日：2016-02-19

    Applicant: Industry-University Cooperation Foundation Sunmoon

    Inventor： Ho Seob KIM ,  Tae Sik OH ,  Dae Wook KIM ,  Hyung Woo KIM ,  Seung Jun AHN

    IPC: H01J37/141 ,  H01J37/065

    CPC classification number: H01J37/065 ,  H01J37/073 ,  H01J2237/04924 ,  H01J2237/063 ,  H01J2237/06341 ,  H01J2237/0635 ,  H01J2237/083 ,  H01J2237/1205

    Abstract: Disclosed is a micro-electron column including nanostructure tips each of which has a tubular, columnar, or blocky structure ranging in size from several nanometers to dozens of nanometers. In the micro-electron column, the nanostructure tips can easily emit electrons because a high electric field is generated at the end of the nanostructure tips when a voltage is applied to the nanostructure tips, and an induction electrode is disposed between the electron emitter and a source lens so as to help electrons emitted from the electron emitter to enter an aperture of a first lens electrode layer of the source lens, thereby realizing improved performance of the micro-electron column. In the micro-electron column, the size of the nanostructure tips may be larger than that of the aperture of a source lens.

    Abstract translation: 公开了一种包括纳米结构尖端的微电子柱，每个微结构尖端具有尺寸从几纳米到几十纳米的管状，柱状或块状结构。 在微电子柱中，纳米结构尖端容易发射电子，因为当纳米结构尖端施加电压时，在纳米结构尖端的末端产生高电场，并且感应电极设置在电子发射体和 源透镜，以帮助从电子发射器发射的电子进入源透镜的第一透镜电极层的孔径，从而实现微电子柱的改进的性能。 在微电子柱中，纳米结构尖端的尺寸可以大于源透镜的孔径。

    Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements
    147.
    发明申请
    Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements 有权
    这种系统和布置的粒子 - 光学系统和布置和粒子 - 光学部件

    公开(公告)号：US20160155603A1

    公开(公告)日：2016-06-02

    申请号：US15016743

    申请日：2016-02-05

    Applicant: Applied Materials Israel Ltd. ,  Carl Zeiss Microscopy GMBH

    Inventor： Dirk Zeidler ,  Thomas KEMEN ,  Anger Pascal ,  Antonio Casares ,  Christof Riedesel

    IPC: H01J37/09 ,  H01J37/21

    CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

    Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a easier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

    Abstract translation: 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 更容易（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

    Pillar-supported array of micro electron lenses
    148.
    发明授权
    Pillar-supported array of micro electron lenses 有权
    支柱支撑的微电子透镜阵列

    公开(公告)号：US09214344B1

    公开(公告)日：2015-12-15

    申请号：US14296960

    申请日：2014-06-05

    Applicant: KLA-Tencor Corporation

    Inventor： Alan D. Brodie ,  Yehiel Gotkis ,  Allen Carroll ,  Leonid Baranov

    IPC: H01L21/20

    CPC classification number: H01L21/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/1205 ,  Y10T156/10

    Abstract: One embodiment relates to a pillar-supported array of micro electron lenses. The micro-lens array includes a base layer on a substrate, the base layer including an array of base electrode pads and an insulating border surrounding the base electrode pads so as to electrically isolate the base electrode pads from each other. The micro-lens array further includes an array of lens holes aligned with the array of base electrode pads and one or more stacked electrode layers having openings aligned with the array of lens holes. The micro-lens array further includes one or more layers of insulating pillars, each layer of insulating pillars supporting a stacked electrode layer. Another embodiment relates to a method of fabricating a pillar-supported array of micro electron lenses. Other embodiments, aspects and features are also disclosed.

    Abstract translation: 一个实施例涉及一种立柱支撑的微电子透镜阵列。 微透镜阵列包括在基板上的基底层，基底层包括基极电极焊盘的阵列和围绕基极电极焊盘的绝缘边界，以将基极电极彼此电隔离。 微透镜阵列还包括与基极阵列阵列对准的透镜孔阵列和一个或多个具有与透镜孔阵列对准的开口的堆叠电极层。 微透镜阵列还包括一层或多层绝缘柱，每层绝缘柱支撑堆叠的电极层。 另一实施例涉及一种制造支柱支撑的微电子透镜阵列的方法。 还公开了其它实施例，方面和特征。

    Charged particle lithography system with a long shape illumination beam
    149.
    发明授权
    Charged particle lithography system with a long shape illumination beam 有权
    具有长形照明光束的带电粒子光刻系统

    公开(公告)号：US09202662B2

    公开(公告)日：2015-12-01

    申请号：US13756178

    申请日：2013-01-31

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

    IPC: G21K5/04 ,  H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/30 ,  H01J37/317

    CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

    Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the mirror array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

    Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接镜阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

    High-voltage energy-dispersive spectroscopy using a low-voltage scanning electron microscope
    150.
    发明授权
    High-voltage energy-dispersive spectroscopy using a low-voltage scanning electron microscope 有权
    使用低压扫描电子显微镜的高压能量色散光谱

    公开(公告)号：US09099276B1

    公开(公告)日：2015-08-04

    申请号：US14162802

    申请日：2014-01-24

    Applicant: Keysight Technologies, Inc.

    Inventor： Lawrence P. Muray ,  Scott W. Indermuehle ,  James P. Spallas ,  Ying Wu ,  Dimitri Klyachko

    IPC: H01J37/04 ,  H01J37/05 ,  H01J37/28 ,  G01T1/36

    CPC classification number: H01J37/04 ,  H01J37/05 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04735 ,  H01J2237/1205 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/2442 ,  H01J2237/2445

    Abstract: A scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) apparatus that includes a scanning electron microscope, an x-ray detector, and an auxiliary acceleration voltage source. The scanning electron microscope includes a sample holder, and a layered electron beam column arranged to output an electron beam towards the sample holder at an initial beam energy. The auxiliary acceleration voltage source is to apply an auxiliary acceleration voltage between the sample holder and the layered electron beam column to accelerate the electron beam to a final beam energy. At the final beam energy, the electron beam is capable of generating x-rays at multiple wavelengths from a larger range of atomic species than the electron beam at the initial beam energy.

    Abstract translation: 包括扫描电子显微镜，X射线检测器和辅助加速电压源的扫描电子显微镜（SEM）和能量色散光谱（EDS）装置。 扫描电子显微镜包括样品保持器和分层电子束柱，其被布置成以初始光束能量朝向样品保持器输出电子束。 辅助加速电压源是在样品架和分层电子束柱之间施加辅助加速电压，以将电子束加速到最终的束能。 在最终光束能量下，电子束能够在起始光束能量下从原子物质的范围比电子束产生多个波长的x射线。

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