知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

6 条记录 (耗时 0.017 秒)

    Electron beam lithography methods including time division multiplex loading
    1.
    发明授权
    Electron beam lithography methods including time division multiplex loading 有权
    电子束光刻方法，包括时分复用加载

    公开(公告)号：US09378926B2

    公开(公告)日：2016-06-28

    申请号：US14604488

    申请日：2015-01-23

    申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

    发明人： Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

    IPC分类号： G21K5/04 ,  H01J37/317 ,  H01J37/302

    CPC分类号： H01J37/3175 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/2485 ,  H01J2237/31762

    摘要： An embodiment of a method of lithography includes generating a beam of electrons. A first pixel and a second pixel are each configured to pattern the beam. Using time domain multiplex loading, the first and second pixels are controlled such that the beam is patterned. The patterning includes receiving a first clock signal and using the first clock signal to generate a second clock signal and a third clock signal. The second clock signal is sent to the first pixel and sending the third clock signal is sent to the second pixel.

    摘要翻译： 光刻方法的一个实施例包括产生电子束。 第一像素和第二像素都被配置为对光束进行图案化。 使用时域多路复用加载，控制第一和第二像素使得光束被图案化。 图案化包括接收第一时钟信号并使用第一时钟信号来产生第二时钟信号和第三时钟信号。 第二时钟信号被发送到第一像素，并且发送第三时钟信号被发送到第二像素。

    Charged Particle Lithography System With a Long Shape Illumination Beam
    2.
    发明申请
    Charged Particle Lithography System With a Long Shape Illumination Beam 有权
    带有长形照明光束的带电粒子光刻系统

    公开(公告)号：US20140212815A1

    公开(公告)日：2014-07-31

    申请号：US13756178

    申请日：2013-01-31

    申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

    发明人： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

    IPC分类号： H01J29/60 ,  H01J29/62

    CPC分类号： H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

    摘要： A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the minor array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

    摘要翻译： 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接小阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

    ELECTRON BEAM LITHOGRAPHY METHODS INCLUDING TIME DIVISION MULTIPLEX LOADING
    3.
    发明申请
    ELECTRON BEAM LITHOGRAPHY METHODS INCLUDING TIME DIVISION MULTIPLEX LOADING 有权
    电子束光刻方法，包括时间分段多重加载

    公开(公告)号：US20150131077A1

    公开(公告)日：2015-05-14

    申请号：US14604488

    申请日：2015-01-23

    申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

    发明人： Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

    IPC分类号： H01J37/317

    CPC分类号： H01J37/3175 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/2485 ,  H01J2237/31762

    摘要： An embodiment of a method of lithography includes generating a beam of electrons. A first pixel and a second pixel are each configured to pattern the beam. Using time domain multiplex loading, the first and second pixels are controlled such that the beam is patterned. The patterning includes receiving a first clock signal and using the first clock signal to generate a second clock signal and a third clock signal. The second clock signal is sent to the first pixel and sending the third clock signal is sent to the second pixel.

    摘要翻译： 光刻方法的一个实施例包括产生电子束。 第一像素和第二像素都被配置为对光束进行图案化。 使用时域多路复用加载，控制第一和第二像素使得光束被图案化。 图案化包括接收第一时钟信号并使用第一时钟信号产生第二时钟信号和第三时钟信号。 第二时钟信号被发送到第一像素，并且发送第三时钟信号被发送到第二像素。

    Charged particle lithography system with a long shape illumination beam
    4.
    发明授权
    Charged particle lithography system with a long shape illumination beam 有权
    具有长形照明光束的带电粒子光刻系统

    公开(公告)号：US09202662B2

    公开(公告)日：2015-12-01

    申请号：US13756178

    申请日：2013-01-31

    申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

    发明人： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

    IPC分类号： G21K5/04 ,  H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/30 ,  H01J37/317

    CPC分类号： H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

    摘要： A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the mirror array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

    摘要翻译： 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接镜阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。