Semiconductor device and nonvolatile memory device including crack detection structure

    公开(公告)号:US11342234B2

    公开(公告)日:2022-05-24

    申请号:US16846724

    申请日:2020-04-13

    Abstract: A semiconductor device includes a semiconductor die, a semiconductor integrated circuit, an outer crack detection structure, a plurality of inner crack detection structures and a plurality of path selection circuits. The semiconductor die includes a central region and an edge region surrounding the central region. The semiconductor integrated circuit is in a plurality of sub regions of the central region. The outer crack detection structure is in the edge region. The plurality of inner crack detection structures are respectively in the plurality of sub regions, respectively. The path selection circuits are configured to control an electrical connection between the outer crack detection structure and the plurality of inner crack detection structures. A crack in the central region in addition to a crack in the edge region may be detected efficiently through selective electrical connection of the outer crack detection structure and the inner crack detection structures.

    INTEGRATED CIRCUIT DEVICE
    5.
    发明申请

    公开(公告)号:US20210091105A1

    公开(公告)日:2021-03-25

    申请号:US16923636

    申请日:2020-07-08

    Abstract: An integrated circuit (IC) device includes a peripheral circuit structure, a memory stack including a plurality of gate lines overlapping the peripheral circuit structure in a vertical direction on the peripheral circuit structure, an upper substrate between the peripheral circuit structure and the memory stack, the upper substrate including a through hole positioned below a memory cell region of the memory stack, a word line cut region extending lengthwise in a first lateral direction across the memory stack and the through hole, and a common source line located in the word line cut region, the common source line including a first portion extending lengthwise in the first lateral direction on the upper substrate and a second portion integrally connected to the first portion, the second portion penetrating the upper substrate through the through hole from an upper portion of the upper substrate and extending into the peripheral circuit structure.

    Memory devices with three-dimensional structure

    公开(公告)号:US10797066B2

    公开(公告)日:2020-10-06

    申请号:US16030170

    申请日:2018-07-09

    Abstract: A memory device includes a substrate, a first memory structure including a plurality of first word lines stacked on the substrate in a direction perpendicular to a top surface of the substrate, an inter-metal layer on the first memory structure and including a plurality of intermediate pads connected with separate, respective first word lines of the plurality of first word lines, a second memory structure including a plurality of second word lines stacked on the inter-metal layer in the direction perpendicular to the top surface of the substrate, and an upper metal layer on the second memory structure and including a plurality of upper pads connected with separate, respective second word lines of the plurality of second word lines.

    Integrated circuit device
    7.
    发明授权

    公开(公告)号:US12211830B2

    公开(公告)日:2025-01-28

    申请号:US18179056

    申请日:2023-03-06

    Abstract: An integrated circuit device includes a memory including a memory cell insulation surrounding a memory stack and a memory cell interconnection unit, a peripheral circuit including a peripheral circuit region formed on a peripheral circuit board, and a peripheral circuit interconnection between the peripheral circuit region and the memory structure, a plurality of conductive bonding structures on a boundary between the memory cell interconnection and the peripheral circuit interconnection in a first region, the first region overlapping the memory stack in a vertical direction, and a through electrode penetrating one of the memory cell insulation and the peripheral circuit board and extended to a lower conductive pattern included in the peripheral circuit interconnection in a second region, the second region overlapping the memory cell insulation in the vertical direction.

    Memory device, memory system and autonomous driving apparatus

    公开(公告)号:US11513730B2

    公开(公告)日:2022-11-29

    申请号:US16892574

    申请日:2020-06-04

    Abstract: A memory device includes a first memory area including a first memory cell array having a plurality of first memory cells each for storing N-bit data according to an M-bit data access scheme, where N is a natural number, and a first peripheral circuit for controlling the first memory cells and disposed below the first memory cell array, a second memory area including a second memory cell array having a plurality of second memory cells each for storing M-bit data according to an M-bit data access scheme, where M is a natural number greater than N, and a second peripheral circuit for controlling the second memory cells and disposed below the second memory cell array, the first memory area and the second memory area are included in a single semiconductor chip and share an input and output interface, and a controller configured to generate calculation data by applying a weight stored in the first memory area to sensing data in response to receiving the sensing data obtained by an external sensor, and store the calculation data in one of the first memory area or the second memory area according to the weight.

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