COMPOUND, METHOD FOR PRODUCING SAME, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
    79.
    发明申请
    COMPOUND, METHOD FOR PRODUCING SAME, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 失效
    化合物,其生产方法,阳性组合物和形成耐药性图案的方法

    公开(公告)号:US20100183974A1

    公开(公告)日:2010-07-22

    申请号:US12067255

    申请日:2006-09-13

    摘要: A compound of the present invention is a compound represented by a general formula (A-1) [wherein, R′ represents a hydrogen atom or an acid-dissociable, dissolution-inhibiting group, provided that at least one R′ group is an acid-dissociable, dissolution-inhibiting group, R11 to R17 each represent an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, which may include a hetero atom within the structure; g and j each represent an integer of 1 or greater, and k and q each represent an integer of 0 or greater, provided that g+j+k+q is not greater than 5; a represents an integer from 1 to 3; b represents an integer of 1 or greater, and l and m each represent an integer of 0 or greater, provided that b+l+m is not greater than 4; c represents an integer of 1 or greater, and n and o each represent an integer of 0 or greater, provided that c+n+o is not greater than 4; and A represents a group represented by a general formula (Ia) shown below, a group represented by a general formula (Ib) shown below, or an aliphatic cyclic group].

    摘要翻译: 本发明化合物是由通式(A-1)表示的化合物[其中,R'表示氢原子或酸解离的溶解抑制基团,条件是至少一个R'基团为酸 可溶解抑制基团,R 11至R 17各自表示1-10个碳原子的烷基或芳族烃基,其可以包括结构内的杂原子; g和j分别表示1以上的整数,k和q各自表示0以上的整数,条件是g + j + k + q不大于5; a表示1〜3的整数, b表示1或更大的整数,并且l和m各自表示0或更大的整数,条件是b + 1 + m不大于4; c表示1或更大的整数,n和o各自表示0或更大的整数,条件是c + n + o不大于4; A表示由下述通式(Ia)表示的基团,由下述通式(Ib)表示的基团或脂族环基]表示。