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110 条记录 (耗时 0.028 秒)

    System and method for imaging a sample with an electron beam with a filtered energy spread
    62.
    发明授权
    System and method for imaging a sample with an electron beam with a filtered energy spread 有权

    公开(公告)号：US09905391B2

    公开(公告)日：2018-02-27

    申请号：US14826007

    申请日：2015-08-13

    申请人： KLA-Tencor Corporation

    发明人： Xinrong Jiang

    IPC分类号： H01J1/50 ,  H01J37/05

    CPC分类号： H01J37/05 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

    摘要： A selectively configurable system for directing an electron beam with a limited energy spread to a sample includes an electron source to generate an electron beam having an energy spread including one or more energies, an aperture having an on-axis opening and an off-axis opening, a first assembly of one or more electron lenses with selectively configurable focal powers positioned to collect the beam from the source and direct the beam to the aperture, a second assembly of one or more selectively configurable electron lenses positioned to collect the beam, a sample stage, and an electron inspection sub-system including electron optics positioned to direct the beam onto one or more samples. The first assembly includes an off-axis electron lens for interacting with the beam at an off-axis position and introducing spatial dispersion to the beam when configured with a nonzero focal power, thus filtering the energy spread.

    Electron beam equipment
    64.
    发明授权
    Electron beam equipment 有权
    电子束设备

    公开(公告)号：US09543053B2

    公开(公告)日：2017-01-10

    申请号：US14445056

    申请日：2014-07-29

    申请人： Hitachi High-Technologies Corporation

    发明人： Yasunari Sohda ,  Takeyoshi Ohashi ,  Takafumi Miwa ,  Hajime Kawano

    IPC分类号： H01J37/14 ,  G21K1/093 ,  H01J37/28

    CPC分类号： G21K1/093 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1534

    摘要： To improve the efficiency of generation of chromatic aberrations of an energy filter for reducing energy distribution. Mounted are an energy filter for primary electrons, the energy filter having a beam slit and a pair of a magnetic deflector and an electrostatic deflector that are superimposed with each other. An electron lens is arranged between the beam slit and the pair of the magnetic deflector and the electrostatic deflector.

    摘要翻译： 提高能量过滤器的色差产生效率，以减少能量分布。 安装有用于一次电子的能量过滤器，能量过滤器具有光束狭缝和彼此重叠的一对磁偏转器和静电偏转器。 电子透镜设置在光束狭缝和一对磁偏转器和静电偏转器之间。

    Ion implanter and ion implantation method
    65.
    发明授权
    Ion implanter and ion implantation method 有权
    离子注入机和离子注入法

    公开(公告)号：US09384944B2

    公开(公告)日：2016-07-05

    申请号：US14693323

    申请日：2015-04-22

    申请人： Sumitomo Heavy Industries Ion Technology Co., Ltd.

    发明人： Mitsuaki Kabasawa ,  Masaki Ishikawa ,  Yusuke Ueno

    IPC分类号： H01J37/00 ,  H01J37/317 ,  H01J37/244 ,  H01J37/141 ,  H01J37/147

    CPC分类号： H01J37/3171 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/3045 ,  H01J2237/14 ,  H01J2237/15 ,  H01J2237/31701

    摘要： A beamline unit of an ion implanter includes a steering electromagnet, a beam scanner, and a beam collimator. The beamline unit contains a reference trajectory of an ion beam. The steering electromagnet deflects the ion beam in an x direction perpendicular to a z direction. The beam scanner deflects the ion beam in the x direction in a reciprocating manner to scan the ion beam. The beam collimator includes a collimating lens that collimates the scanned ion beam in the z direction along the reference trajectory, and the collimating lens has a focus at a scan origin of the beam scanner. A controller corrects a deflection angle in the x direction in the steering electromagnet so that an actual trajectory of the deflected ion beam intersects with the reference trajectory at the scan origin on an xz plane.

    摘要翻译： 离子注入机的光束单元包括转向电磁体，光束扫描器和光束准直器。 束线单元包含离子束的参考轨迹。 转向电磁铁使垂直于z方向的x方向偏转离子束。 光束扫描器以往复方式沿x方向偏转离子束以扫描离子束。 光束准直仪包括准直透镜，其沿着参考轨迹沿z方向校准扫描的离子束，并且准直透镜在光束扫描器的扫描原点处具有焦点。 控制器校正转向电磁铁中的x方向上的偏转角，使得偏转的离子束的实际轨迹与xz平面上的扫描原点处的参考轨迹相交。

    High-energy ion implanter
    66.
    发明授权
    High-energy ion implanter 有权
    高能离子注入机

    公开(公告)号：US09368327B2

    公开(公告)日：2016-06-14

    申请号：US14302901

    申请日：2014-06-12

    申请人： Sumitomo Heavy Industries Ion Technology Co., Ltd.

    发明人： Mitsuaki Kabasawa ,  Tatsuo Nishihara ,  Kazuhiro Watanabe ,  Yuuji Takahashi ,  Tatsuya Yamada

    IPC分类号： H01J37/317 ,  H01J37/30

    CPC分类号： H01J37/3171 ,  H01J37/3007 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

    摘要： A high-energy ion implanter includes: a beam generation unit that includes an ion source and a mass analyzer; a high-energy multi-stage linear acceleration unit that accelerates an ion beam so as to generate a high-energy ion beam; a high-energy beam deflection unit that changes the direction of the high-energy ion beam toward the wafer; and a beam transportation unit that transports the deflected high-energy ion beam to the wafer. The deflection unit is configured by a plurality of deflection electromagnets, and at least a horizontal focusing element is inserted between the plurality of deflection electromagnets.

    摘要翻译： 高能离子注入机包括：束生成单元，其包括离子源和质量分析器; 高能量多级线性加速单元，其加速离子束以产生高能离子束; 高能量束偏转单元，其将高能离子束的朝向晶片的方向改变; 以及将偏转的高能离子束输送到晶片的光束传送单元。 偏转单元由多个偏转电磁体构成，并且在多个偏转电磁体之间插入至少一个水平聚焦元件。

    Energy Filter for Charged Particle Beam Apparatus
    67.
    发明申请
    Energy Filter for Charged Particle Beam Apparatus 有权
    带电粒子束能量滤波器

    公开(公告)号：US20160035533A1

    公开(公告)日：2016-02-04

    申请号：US14800098

    申请日：2015-07-15

    申请人： Hermes Microvision Inc.

    发明人： Weiming Ren ,  Joe Wang ,  Shuai Li ,  Zhongwei Chen

    IPC分类号： H01J37/05 ,  H01J37/28 ,  H01J37/10

    CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/12 ,  H01J37/244 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

    摘要： This invention provides two methods for improving performance of an energy-discrimination detection device with an energy filter of reflective type for a charged particle beam. The first method employs a beam-adjusting means to improve the energy-discrimination power, and the second method uses an electron-multiplication means to enhance the image signal without noise raise. A LVSEM with such an improved energy-discrimination detection device can provide variant high-contrast images of interested features on a specimen surface for multiple application purposes.

    摘要翻译： 本发明提供了两种用于利用带电粒子束的反射型能量滤波器来改善能量鉴别检测装置的性能的方法。 第一种方法采用光束调节装置来提高能量鉴别能力，第二种方法使用电子倍增装置来增强图像信号而没有噪声提高。 具有这种改进的能量鉴别检测装置的LVSEM可以在样本表面上提供用于多种应用目的的感兴趣特征的变体高对比度图像。

    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
    68.
    发明申请
    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
    充电颗粒光束写字装置和充电颗粒光束写字方法

    公开(公告)号：US20160020063A1

    公开(公告)日：2016-01-21

    申请号：US14798797

    申请日：2015-07-14

    申请人： NuFlare Technology, Inc.

    发明人： Taku Yamada ,  Kaoru Tsuruta ,  Yasuyuki Taneda ,  Kenji Ohtoshi

    IPC分类号： H01J37/147 ,  H01J37/04 ,  H01J37/141

    CPC分类号： H01J37/1472 ,  H01J37/045 ,  H01J37/141 ,  H01J37/3174 ,  H01J2237/022 ,  H01J2237/121 ,  H01J2237/14 ,  H01J2237/1516 ,  H01J2237/152 ,  H01J2237/31776

    摘要： A charged particle beam writing apparatus includes a stage configured to mount a sample placed thereon; an electron optical column including a charged particle gun and deflector, wherein the charged particle gun is configured to emit a charged particle beam, and the deflector includes a plurality of deflecting electrodes configured to control a path of the charged particle beam; an ozone introducing mechanism configured to introduce ozone into the electron optical column; a first voltage supply unit configured to apply a deflection voltage to the plurality of deflecting electrodes to deflect the charged particle beam; and a second voltage supply unit configured to apply an identical negative DC voltage to the plurality of deflecting electrodes, wherein a negative voltage in which the deflection voltage and the negative DC voltage are added is applied to the plurality of deflecting electrodes while the sample is irradiated by the charged particle beam.

    摘要翻译： 一种带电粒子束写入装置，包括：被配置为安装其上放置的样品的台; 包括带电粒子枪和偏转器的电子光学柱，其中所述带电粒子枪被配置为发射带电粒子束，并且所述偏转器包括被配置为控制所述带电粒子束的路径的多个偏转电极; 臭氧引入机构，被配置为将臭氧引入到电子光学柱中; 第一电压供给单元，被配置为向所述多个偏转电极施加偏转电压以使所述带电粒子束偏转; 以及第二电压供给单元，被配置为向所述多个偏转电极施加相同的负DC电压，其中，在所述多个偏转电极被照射时，将所述偏转电压和所述负的DC电压相加的负电压施加到所述多个偏转电极 通过带电粒子束。

    METHOD OF INVESTIGATING THE WAVEFRONT OF A CHARGED-PARTICLE BEAM
    69.
    发明申请
    METHOD OF INVESTIGATING THE WAVEFRONT OF A CHARGED-PARTICLE BEAM 有权
    调查充电粒子波束的方法

    公开(公告)号：US20150170876A1

    公开(公告)日：2015-06-18

    申请号：US14574179

    申请日：2014-12-17

    申请人： FEI Company

    发明人： Bart Jozef Janssen ,  Gijs van Duinen ,  Uwe Luecken ,  Ross Savage ,  Stephanus H.L. van den Boom ,  Ivan Lazic

    IPC分类号： H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26

    CPC分类号： H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J37/265 ,  H01J37/295 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/226 ,  H01J2237/24507 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2806

    摘要： A method of investigating a wavefront of a charged-particle beam that is directed from a source through an illuminator so as to traverse a sample plane and land upon a detector, an output of the detector being used in combination with a mathematical reconstruction technique so as to calculate at least one of phase information and amplitude information for the wavefront at a pre-defined location along its path to the detector, in which method: Said beam is caused to traverse a particle-optical lens system disposed between said sample plane and said detector; At a selected location in the path from said source to said detector, a modulator is used to locally produce a given modulation of the wavefront; In a series of measurement sessions, different such modulations are employed, and the associated detector outputs are collectively used in said mathematical reconstruction.

    摘要翻译： 一种调查带电粒子束的波前的方法，该波前从源通过照明器引导以遍历采样平面并落在检测器上，检测器的输出与数学重建技术结合使用，以便 沿着其到达检测器的路径的预定位置处计算波前的相位信息和幅度信息中的至少一个，其中：所述光束被穿过设置在所述样品平面和所述检测器之间的粒子 - 光学透镜系统 探测器; 在从所述源到所述检测器的路径中的选定位置处，使用调制器来本地产生波前的给定调制; 在一系列测量会话中，使用不同的这种调制，并且相关联的检测器输出在所述数学重建中被统一使用。