公开(公告)号：US20100308215A1

公开(公告)日：2010-12-09

申请号：US12796215

申请日：2010-06-08

申请人： Bo H. Vanderberg ,  Steven C. Hays ,  Andy Ray

发明人： Bo H. Vanderberg ,  Steven C. Hays ,  Andy Ray

IPC分类号： H01J37/317 ,  H01J3/32 ,  H01J37/147 ,  H01J49/26

CPC分类号： H01J37/317 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3171 ,  H01J49/30 ,  H01J2237/006 ,  H01J2237/182 ,  H01J2237/24542

摘要： A method comprising introducing an injected gas (e.g., Argon, Xenon) into a beam line region comprising a magnetic scanner is provided herein. The injected gas improves beam current by enhancing (e.g., increasing, decreasing) charge neutralization of the magnetic ion beam (e.g., the ion beam at regions where the scanning magnetic field is non-zero) thereby reducing the current loss due to the zero field effect (ZFE). By reducing the current loss in regions having a magnetic field, the magnetic beam current is increased (e.g., the beam current is increased in regions where the magnetic field is non-zero) raising the overall beam current in a uniform manner over an entire scan path and thereby reducing the effect of the ZFE. In other words, the ZFE is removed by effectively minimizing it through an increase in the magnetized beam current.

摘要翻译： 本文提供了将注入的气体（例如，氩，氙）引入到包括磁扫描器的束线区域中的方法。 注入的气体通过增强（例如，增加，减少）磁离子束的电荷中和（例如，扫描磁场不为零的区域处的离子束）来改善束流，从而减少由于零场导致的电流损耗 效果（ZFE）。 通过减小具有磁场的区域中的电流损耗，磁束电流增加（例如，在磁场不为零的区域中，束电流增加）在整个扫描中以均匀的方式提高整个束电流 路径，从而减少ZFE的影响。 换句话说，ZFE通过磁化束电流的增加有效地最小化而被去除。

公开(公告)号：US5483077A

公开(公告)日：1996-01-09

申请号：US383422

申请日：1995-02-03

申请人： Hilton F. Glavish

发明人： Hilton F. Glavish

IPC分类号： C23C14/48 ,  G21K1/093 ,  H01F3/02 ,  H01F7/20 ,  H01J3/32 ,  H01J29/76 ,  H01J37/04 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/317 ,  H01L21/02 ,  H01L21/265 ,  H01L27/12

CPC分类号： H01J37/147 ,  G21K1/093 ,  H01F3/02 ,  H01F7/202 ,  H01J29/76 ,  H01J3/32 ,  H01J37/1475 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/31701

摘要： Deflection apparatus is shown for high perveance ion beams, operating at 20 Hz fundamental and substantially higher order harmonics, having a magnetic structure formed of laminations with thickness in range between 0.2 and 1 millimeter. Additionally, a compensator is shown with similar laminated structures with resonant excitation circuit, operating at 20 Hz or higher, in phase locked relationship with the frequency of the previously deflected beam. Furthermore, features are shown which have broader applicability to producing strong magnetic field in magnetic gap. Among the numerous important features shown are special laminated magnetic structures, including different sets of crosswise laminations in which the field in one lamination of one set is distributed into multiplicity of laminations of the other set of coil-form structures, field detection means and feedback control system, cooling plate attached in thermal contact with number of lamination layers. Surfaces on the entry and exit sides of the compensator magnetic structure have cooperatively selected shapes to increase the length of path exposed to the force field dependently with deflection angle to compensate for contribution to deflection angle caused by higher order components. The entry and exit surfaces of the magnetic scanner and compensator structures cooperating to produce desired beam profile and desired limit on angular deviation of ions within the beam. Also shown is an accelerator comprising a set of accelerator electrodes having slotted apertures, a suppressor electrode at the exit of the electrostatic accelerator, a post-accelerator analyzer magnet having means for adjusting the angle of incidence by laterally moving the post-accelerator analyzer magnet, and a magnet to eliminate aberration created by the post-accelerator analyzer magnet. In the case of use of a spinning substrate carrier for scanning in one dimension, the excitation wave form of the scanner relates changes in scan velocity in inverse dependence with changes in the radial distance of an implant point from the rotation axis. Also an oxygen implantation method is shown with 50 mA ion beam current, the ion beam energy above 100 KeV, and the angular velocity of a rotating carrier above 50 rpm.

公开(公告)号：US4425506A

公开(公告)日：1984-01-10

申请号：US323010

申请日：1981-11-19

申请人： Karl L. Brown ,  William G. Turnbull ,  Phillip T. Jones

发明人： Karl L. Brown ,  William G. Turnbull ,  Phillip T. Jones

IPC分类号： G21K1/093 ,  H05H7/00 ,  G21K1/08 ,  H01J3/32

CPC分类号： G21K1/093

摘要： A first order achromatic magnetic deflection system for use in conjunction with a charged particle accelerator, is realized from a stepped gap manget wherein a charged particle propagated through the system is subject to at least two adjacent homogenous magnetic fields in traversing one-half of a symmetric trajectory through the system.

摘要翻译： 用于与带电粒子加速器结合使用的第一级消色差磁偏转系统由步进式间隙装置实现，其中通过系统传播的带电粒子经受至少两个相邻的均匀磁场，穿过对称的二分之一 通过系统的轨迹。

公开(公告)号：US3483417A

公开(公告)日：1969-12-09

申请号：US3483417D

申请日：1967-07-26

申请人： AIR REDUCTION

发明人： HANKS CHARLES W

IPC分类号： H01J37/305 ,  H01J3/20 ,  H01J3/32 ,  H01J23/10

CPC分类号： H01J37/305

公开(公告)号：US3450922A

公开(公告)日：1969-06-17

申请号：US3450922D

申请日：1966-08-03

申请人： GEN ELECTRIC

发明人： GALLAGHER CHARLES J

IPC分类号： H01T2/02 ,  H01J1/50 ,  H01J3/32 ,  H01J23/10

CPC分类号： H01T2/02

公开(公告)号：US20110186747A1

公开(公告)日：2011-08-04

申请号：US13028188

申请日：2011-02-15

申请人： John Ruffell

发明人： John Ruffell

IPC分类号： H01J3/32 ,  H01J3/30 ,  H01J3/34

CPC分类号： H01L21/68764 ,  H01J37/1474 ,  H01J37/3171 ,  H01J2237/026 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/1503 ,  H01J2237/20207 ,  H01J2237/30472 ,  H01L21/68771

摘要： Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the incident beam axis and deflects the ion beam. At least one wafer holder holds target wafers and the rotation mechanism operates to direct the ion beam at one of the at least one wafer holders which also rotates to maintain a constant implant angle.

摘要翻译： 离子注入装置的系统和方法包括用于沿入射束轴产生离子束的离子源。 离子注入装置包括耦合到旋转机构的光束偏转组件，其使射束偏转组件围绕入射光束轴线旋转并偏转离子束。 至少一个晶片保持器保持目标晶片，并且旋转机构操作以将离子束引导至至少一个晶片保持器中的一个，其也旋转以保持恒定的注入角度。

公开(公告)号：US07560715B2

公开(公告)日：2009-07-14

申请号：US11587832

申请日：2005-02-19

申请人： Eros Pedroni

发明人： Eros Pedroni

IPC分类号： H01J3/32 ,  G21G1/10

CPC分类号： A61N5/10 ,  A61N5/1043 ,  A61N2005/1087 ,  A61N2005/1095 ,  G21K1/093 ,  G21K5/04 ,  H05H7/00

摘要： A process for an intensity-modulated proton therapy of a predetermined volume within an object includes discretising the predetermined volume into a number of iso-energy layers each corresponding to a determined energy of the proton beam. A final target dose distribution is determined for each iso-energy layer. The final target dose distribution or at least a predetermined part of this final target dose distribution is applied by parallel beam scanning by controlling the respective beam sweepers, thereby scanning one iso-energy layer after the other using an intensity-modulated proton beam while scanning a predetermined iso-energy layer.

摘要翻译： 用于物体内预定体积的强度调制质子治疗的方法包括将预定体积离散成多个等能层，每个能级层对应于所确定的质子束能量。 确定每个等能层的最终目标剂量分布。 最终目标剂量分布或最终目标剂量分布的至少预定部分通过平行光束扫描来施加，通过控制相应的光束扫描器，从而使用强度调制的质子束在扫描之后扫描一个等能层 预定的等能层。

公开(公告)号：US20060071584A1

公开(公告)日：2006-04-06

申请号：US11286428

申请日：2005-11-25

申请人： Toshiaki Kurachi ,  Satoshi Kominami

发明人： Toshiaki Kurachi ,  Satoshi Kominami

IPC分类号： H01J1/50 ,  H01J23/10 ,  H01J29/76 ,  H01J3/20 ,  H01J3/32

CPC分类号： H01J65/048

摘要： An electrodeless discharge lamp has a magnetic core 3, an induction coil 5, and a fixation member 7. The fixation member 7 has an elongation portion 7b extending in a direction along an axial line of the magnetic core 3, a holding portion 7c for holding the magnetic core 3 positioned closer to the magnetic core 3 than the elongation portion 7b, and hook portions 7d and 7e to which a winding wire 7 is hooked so as to be inflected. The hook portions 7d and 7e positioned away from a boundary between the holding portion 7c and magnetic core 3 toward the elongation portion 7b by a distance between once and twice of a diameter of the winding wire.

摘要翻译： 无电极放电灯具有磁芯3，感应线圈5和固定部件7。 固定构件7具有沿着磁芯3的轴线方向延伸的延长部分7b，用于保持比延伸部分7b更靠近磁芯3的磁芯3的保持部分7c，以及 钩绕部分7d和7e，绕线7被钩住以便弯曲。 钩部7d和7e从保持部分7c和磁芯3之间的边界向着伸长部分7b定位绕组线直径的一到两倍的距离。

公开(公告)号：US20060055300A1

公开(公告)日：2006-03-16

申请号：US10937947

申请日：2004-09-10

申请人： Alan Janos ,  Malcolm Pack ,  Mohammad Kamarchi ,  Michael Colson

发明人： Alan Janos ,  Malcolm Pack ,  Mohammad Kamarchi ,  Michael Colson

IPC分类号： H01J1/50 ,  H01J23/10 ,  H01J3/20 ,  H01J29/76 ,  H01J3/32

CPC分类号： H01J65/044 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  H01J61/302

摘要： An electrodeless lamp and process for emitting ultraviolet and/or vacuum ultraviolet radiation comprises an envelope formed of an ultra-pure and/or low-defect quartz material and an ultraviolet and/or vacuum ultraviolet emissive material disposed in the interior region of the envelope. The electrodeless lamp formed of the ultra-pure and/or low-defect quartz material minimizes degradation during use.

摘要翻译： 用于发射紫外线和/或真空紫外线辐射的无电极灯和方法包括由超纯和/或低缺陷石英材料形成的外壳和设置在外壳的内部区域中的紫外线和/或真空紫外线发射材料。 由超纯和/或低缺陷石英材料形成的无电极灯在使用过程中使降解最小化。

公开(公告)号：US3602752A

公开(公告)日：1971-08-31

申请号：US3602752D

申请日：1969-09-08

申请人： BENDIX CORP

发明人： SHRINER WILLIAM H

IPC分类号： H01J3/02 ,  H01J27/20 ,  H01J49/14 ,  H01J3/32

CPC分类号： H01J49/14 ,  H01J3/026 ,  H01J27/20

摘要： A cathode assembly and an electrical circuit that includes a conductor physically parallel to and electrically in series with a filament so that when the circuit is energized the magnetic fields produced by the current flowing in the filament and the conductor oppose each other, thereby decreasing the dispersing effect of the filament magnetic field on a portion of the electrons emitted from the filament. The diameter of the conductor is sufficiently larger than the diameter of the filament so that only the filament emits electrons when the circuit is energized.