公开(公告)号：US20130270452A1

公开(公告)日：2013-10-17

申请号：US13995606

申请日：2011-12-19

Applicant: Shigemi Sasaki ,  Atsushi Miyamoto

Inventor： Shigemi Sasaki ,  Atsushi Miyamoto

IPC: H01J3/34

CPC classification number: H01J3/34 ,  H05H7/04 ,  H05H7/06 ,  H05H13/04 ,  H05H2007/046

Abstract: A charged particle orbit control device (100) is used in a ring-shaped charged particle accelerator or a charged particle storage ring. The charged particle orbit control device (100) is configured to enable the orbit of a charged particle to return to the original orbit in multiple cycles. The charged particle orbit control device (100) includes multiple bending magnets (1) that bend the charged particle (3). In the charged particle orbit control device (100), the bending angle and relative position of each bending magnet (1) are prescribed such that every time the charged particle (3) passes through, the orbit of the charged particle (3) in each bending magnet (1) alternately switches between two orbits.

Abstract translation: 带电粒子轨道控制装置（100）用于环形带电粒子加速器或带电粒子储存环。 带电粒子轨道控制装置（100）被配置为使带电粒子的轨道能够以多个周期返回原始轨道。 带电粒子轨道控制装置（100）包括使带电粒子（3）弯曲的多个弯曲磁体（1）。 在带电粒子轨道控制装置（100）中，规定每个弯曲磁体（1）的弯曲角度和相对位置，使得每次带电粒子（3）通过时，带电粒子（3）的轨道在每个 弯曲磁体（1）交替地在两个轨道之间切换。

公开(公告)号：US20130032731A1

公开(公告)日：2013-02-07

申请号：US13253988

申请日：2011-10-06

Applicant: Thomas Anthony Tombrello, JR. ,  Eran Nardi

Inventor： Thomas Anthony Tombrello, JR. ,  Eran Nardi

IPC: H01J3/34

CPC classification number: G21K1/00 ,  H05H7/001 ,  H05H2007/007

Abstract: A proton beam guidance apparatus and a method of providing proton beams having sub-micron beam width and MeV energies. The apparatus is a structure having an enclosed channel that can reflect or guide protons by grazing incidence interactions. The enclosed channel is in some embodiments an annular channel. The enclosed channel is shaped to provide a helical path for each proton in the beam. Protons are provided to an input port of the channel, and after multiple grazing incidence interactions with the walls of the channel, are provided as an output beam having dimensions comparable to the cross sectional dimensions of the channel. The channels can have cross sectional dimensions of tens of nanometers or less. No externally applied electromagnetic fields are needed to guide the proton beam. Contemplated applications include use of the exit proton beams to provide medical treatment to patients.

Abstract translation: 质子束引导装置和提供具有亚微米束宽度和MeV能量的质子束的方法。 该装置是具有封闭通道的结构，其可以通过掠入射相互作用反射或引导质子。 在一些实施例中，封闭通道是环形通道。 封闭的通道成形为为梁中的每个质子提供螺旋路径。 质子被提供到通道的输入端口，并且在与通道的壁的多次掠入射相互作用之后被提供为具有与通道的横截面尺寸相当的尺寸的输出光束。 通道的横截面尺寸可以为几十纳米或更小。 不需要外部施加的电磁场来引导质子束。 考虑的应用包括使用出口质子束来为患者提供医疗。

公开(公告)号：US10563304B2

公开(公告)日：2020-02-18

申请号：US15482198

申请日：2017-04-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Xiangjin Xie ,  Adolph Miller Allen ,  Xianmin Tang ,  Goichi Yoshidome

IPC: H01L21/3215 ,  H01L21/768 ,  C23C14/34 ,  H01L21/321 ,  C23C14/54 ,  H01L21/683 ,  H01L21/285 ,  C23C16/455 ,  C23C14/58 ,  C23C14/22 ,  C23C16/02 ,  C23C14/56 ,  C23C16/56 ,  H01J37/32 ,  C23C14/02 ,  H01L23/532 ,  H01J37/34 ,  H01J3/34

Abstract: Atomic layer deposition (ALD) processes are combined with physical vapor deposition (PVD) processes in a low pressure environment to produce a high quality barrier film. The initial barrier film is deposited on a substrate using ALD processes and then moved to a PVD chamber to treat the barrier film to increase the barrier film's density and purity, decreasing the barrier film's resistivity. A dual source of materials is sputtered onto the substrate to provide doping while a gas is simultaneously used to etch the substrate to release nitrogen. At least one source of material is positioned to provide doping at an acute angle to the surface of the substrate while supplied with DC power and RF power at a first RF power frequency. The substrate is biased using RF power at a second RF power frequency.

公开(公告)号：US09779905B2

公开(公告)日：2017-10-03

申请号：US14123896

申请日：2012-05-25

Applicant: Muradin Abubekirovich Kumakhov

Inventor： Muradin Abubekirovich Kumakhov

IPC: H01J3/26 ,  G21K1/087 ,  H05H7/04 ,  G21K1/02 ,  H05H7/06 ,  H01J3/34

CPC classification number: H01J3/26 ,  G21K1/02 ,  G21K1/087 ,  H01J3/34 ,  H05H7/04 ,  H05H7/06 ,  H05H2007/046

Abstract: A method and a device for changing direction of movement of a beam of accelerated charged particles are based on the use of a curved channel which is made from a material that is able to be electrically charged, and formation of the same kind of charge on an inside surface of the channel wall as that of the particles. Maintenance of a condition that relates an energy and a charge of the particles to geometrical parameters of the channel is required, in particular, a radius R of curvature of a longitudinal axis thereof, and to electrical strength of the wall material. The beam can possibly be rotated through large angles without loss of intensity, significantly simplifying a design, and also reducing the mass and dimensions of all devices, particularly by obviating a need for magnets and supply voltage and control voltage sources for such devices.

公开(公告)号：US20120037814A1

公开(公告)日：2012-02-16

申请号：US13132993

申请日：2009-12-03

Applicant: Amit Lal ,  Shi Yue

Inventor： Amit Lal ,  Shi Yue

IPC: H01J3/34 ,  B05D5/12

CPC classification number: G21B1/15 ,  H05H15/00 ,  Y02E30/16

Abstract: A charged particle accelerator having a curvilinear beam trajectory maintained solely by a laterally directed, constant electric field; requiring no magnetic field. A method for controlling the trajectory of a charged particle in an accelerator by applying only a constant electric field for beam trajectory control. Curvilinear steering electrodes held at a constant potential create the beam path. A method for making a chip-scale charged particle accelerator involves integrated circuit-based processes and materials. A particle accelerator that can generate 110 KeV may a footprint less than about 1 cm2.

Abstract translation: 具有仅由横向恒定电场维持的曲线光束轨迹的带电粒子加速器; 不需要磁场。 一种通过仅施加用于光束轨迹控制的恒定电场来控制加速器中的带电粒子的轨迹的方法。 保持恒定电位的曲线转向电极产生光束路径。 制造芯片级带电粒子加速器的方法涉及基于集成电路的工艺和材料。 可以产生110keV的粒子加速器可以具有小于约1cm 2的足迹。

公开(公告)号：US11784033B2

公开(公告)日：2023-10-10

申请号：US17333732

申请日：2021-05-28

Applicant: Applied Materials, Inc.

Inventor： Mengxue Wu ,  Siew Kit Hoi ,  Jay Min Soh ,  Yue Cui ,  Chul Nyoung Lee ,  Palaniappan Chidambaram ,  Jiao Song

IPC: C23C14/35 ,  H01J3/34 ,  H01J37/34 ,  C23C14/54 ,  C23C14/34

CPC classification number: H01J37/3476 ,  C23C14/345 ,  C23C14/3492 ,  C23C14/35 ,  C23C14/54 ,  H01J37/3405 ,  H01J37/3455 ,  C23C14/351

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate comprises applying a DC target voltage to a target disposed within a processing volume of a plasma processing chamber, rotating a magnet disposed above the target at a default speed to direct sputter material from the target toward a substrate support disposed within the processing volume, measuring in-situ DC voltage in the processing volume, the in-situ DC voltage different from the DC target voltage, determining if a measured in-situ DC voltage is greater than a preset value, if the measured in-situ DC voltage is less than or equal to the preset value, maintaining the magnet at the default speed, and if the measured in-situ DC voltage is greater than the preset value, rotating the magnet at a speed less than the default speed to decrease the in-situ DC voltage.

公开(公告)号：US20190254155A1

公开(公告)日：2019-08-15

申请号：US16343797

申请日：2017-08-16

Applicant: PAUL SCHERRER INSTITUT

Inventor： LEONID RIVKIN ,  ANDREAS STREUN ,  ALBIN WRULICH

IPC: H05H7/06 ,  H05H7/04 ,  H05H13/04 ,  H01J3/34

CPC classification number: H05H7/06 ,  H01J3/34 ,  H05G2/00 ,  H05H1/00 ,  H05H7/04 ,  H05H13/04

Abstract: A compact, small foot print, light source based on electron beam acceleration for insertion devices in EUV range metrology and actinic mask inspection using coherent scattering methods includes spiral storage rings providing plane straight sections. A magnet structure generates emittance for brilliance and coherent light content. A booster feeds the storage ring by top-up injection and keeps electron beam intensity stable. A booster level below the storage ring receives the electron beam from a linear accelerator in a central booster area. The source fits into laboratories or maintenance areas. Injection, RF-acceleration, beam manipulating devices and large diagnostics systems are required once. Higher average currents stored in the spiral enhance central cone power. Bunches are limited by ion trapping and a gap clears ions. The current is increased in the spiral. Gain in central cone power increases 5 fold, assuming a gap size of half single storage ring circumference.

公开(公告)号：US4644168A

公开(公告)日：1987-02-17

申请号：US610102

申请日：1984-05-14

Applicant: Roy E. Rand ,  Dan Y. Wang

Inventor： Roy E. Rand ,  Dan Y. Wang

IPC: A61B6/03 ,  H01J35/00 ,  H01J35/14 ,  H01J3/34

CPC classification number: A61B6/032 ,  A61B6/4028 ,  H01J35/00 ,  H01J35/14

Abstract: A deflecting magnet assembly for scanning an incident beam of charged particles in a scanning electron beam computed tomography scanner. The configuration (including angular orientation and coil end connection geometry) of the coils which comprise the magnet is selected to approximate the field of a pure dipole. In addition, a magnetic shield is used which equalizes the effective radii of the constituent coils and thereby simplifies construction of the assembly.

Abstract translation: 用于在扫描电子束计算机断层摄影扫描仪中扫描带电粒子的入射束的偏转磁体组件。 选择包括磁体的线圈的构造（包括角度定向和线圈端连接几何形状）以接近纯偶极子的场。 另外，使用均衡构成线圈的有效半径的磁屏蔽，从而简化了组件的结构。

公开(公告)号：US20120043472A1

公开(公告)日：2012-02-23

申请号：US13290068

申请日：2011-11-05

Applicant: Vladimir Balakin

Inventor： Vladimir Balakin

IPC: H01J3/26 ,  H01J3/34

CPC classification number: H05H13/04 ,  A61N5/10 ,  A61N2005/1074 ,  A61N2005/1087 ,  H05H7/04 ,  H05H7/10

Abstract: The invention comprises a charged particle beam acceleration and/or extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Novel design features of a synchrotron are described. Particularly, turning magnets, edge focusing magnets, and extraction elements are described that minimize the overall size of the synchrotron, provide a tightly controlled proton beam, directly reduce the size of required magnetic fields, directly reduces required operating power, and allow continual acceleration of protons in a synchrotron even during a process of extracting protons from the synchrotron.

Abstract translation: 本发明包括与癌肿瘤的带电粒子束放射治疗结合使用的带电粒子束加速和/或提取方法和装置。 描述了同步加速器的新颖设计特征。 特别地，描述了旋转磁体，边缘聚焦磁体和提取元件，其使得同步加速器的总体尺寸最小化，提供严格控制的质子束，直接减小所需磁场的尺寸，直接减少所需的操作功率，并且允许连续加速 甚至在从同步加速器提取质子的过程中同步加速器中的质子。

公开(公告)号：US20100219352A1

公开(公告)日：2010-09-02

申请号：US12708886

申请日：2010-02-19

Applicant: Holger Kreckel ,  Hjalmar Bruhns ,  Daniel Wolf Savin

Inventor： Holger Kreckel ,  Hjalmar Bruhns ,  Daniel Wolf Savin

IPC: H01J3/34

CPC classification number: H01J37/1472 ,  H01J2237/151 ,  H01J2237/153

Abstract: An ion deflector, for deflecting a beam of charged particles along an arc in a deflection plane, includes a pair of non-spherical deflection electrodes adapted for being charged with different voltages. The pair of deflection electrodes are configured to control, in both the deflection plane and in a direction perpendicular to the deflection plane, a cross sectional spread of charged particles in a deflected beam that exits the ion deflector. In some embodiments, a first electrode has a first height perpendicular to the deflection plane and a second electrode has a different second height.

Abstract translation: 用于沿着偏转平面中的电弧偏转带电粒子束的离子偏转器包括一对适于用不同电压充电的非球面偏转电极。 一对偏转电极被配置为在偏转平面和垂直于偏转平面的方向上控制带电粒子在离开离子偏转器的偏转光束中的横截面扩展。 在一些实施例中，第一电极具有垂直于偏转平面的第一高度，而第二电极具有不同的第二高度。