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公开(公告)号：US20240352572A1
公开(公告)日：2024-10-24
申请号：US18682945
申请日：2022-08-19
Applicant: MOLDINO TOOL ENGINEERING, LTD.
Inventor： Tomoya Sasaki
CPC classification number: C23C14/0641 , B23B27/148 , C23C14/022 , C23C14/345 , B23B2228/105
Abstract: A coated tool of the present invention includes a substrate and a hard coating on the substrate. The hard coating is a nitride or a carbonitride containing 65 atom % or more and 90 atom % or less of Al and 10 atom % or more and 35 atom % or less of Cr with respect to a total amount of metal elements including metalloid elements, and containing 0.50 atom % or less of argon (Ar), and has a face-centered cubic lattice structure. The hard coating shows a maximum intensity Ia in an α angle range of 80° to 90° in an X-ray intensity distribution on an α-axis in a positive pole figure of a (111) plane of the face-centered cubic lattice structure, and an intensity in an α angle range of 0° to 70° is 35% or less of the maximum intensity Ia.
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公开(公告)号：US20240218498A1
公开(公告)日：2024-07-04
申请号：US18091552
申请日：2022-12-30
Applicant: Applied Materials, Inc.
Inventor： Goichi YOSHIDOME , Xiangjin XIE
CPC classification number: C23C14/35 , C23C14/345 , C23C14/54
Abstract: Methods and apparatus for processing a substrate are provided. In some embodiments, a method for processing a substrate includes: energizing a target disposed at a distance from a plurality of magnets disposed within a processing volume of a processing chamber, and moving the plurality of magnets either away from or closer to the target at a predetermined distance based on an inverse target voltage curve that is determined using a third order polynomial.
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公开(公告)号：US12025195B2
公开(公告)日：2024-07-02
申请号：US18122806
申请日：2023-03-17
Applicant: Tech M3, Inc.
Inventor： Nathan K. Meckel
IPC: F16D65/12 , C23C14/02 , C23C14/06 , C23C14/14 , C23C14/34 , C23C14/50 , F16D55/00 , F16D65/02 , F16D69/00
CPC classification number: F16D65/12 , C23C14/021 , C23C14/028 , C23C14/0641 , C23C14/14 , C23C14/345 , C23C14/505 , F16D65/127 , F16D65/128 , F16D2055/0062 , F16D2065/1332 , F16D2069/004 , F16D2250/003 , F16D2250/0046 , Y10T29/49986
Abstract: A brake disk or drum has at least one working surface which opposes a braking member such as a brake pad or shoe. A plurality of spaced, raised island formations are provided across the working surface, with channels extending between the island formations. Each raised island formation has an outer surface which contacts a brake pad or brake shoe during braking.
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公开(公告)号：US20240207944A1
公开(公告)日：2024-06-27
申请号：US18288297
申请日：2022-04-29
Applicant: WALTER AG
Inventor： Jan Philipp LIEBIG , Wolfgang ENGELHART , Veit SCHIER
CPC classification number: B23B27/148 , C23C14/0641 , C23C14/325 , C23C14/345 , B23B2228/105
Abstract: A coated cutting tool having at least one rake face and at least one flank face and a cutting edge therebetween includes a substrate and a coating. The coating has a (Ti,Al)N layer, the (Ti,Al)N layer having an overall atomic ratio Al/(Ti+Al) of >0.67 and ≤0.85, wherein the (Ti,Al)N layer shows a distribution of 111 misorientation angles, the 111 misorientation angle being the angle between a normal vector to the surface of the (Ti,Al)N layer and the direction that is closest to the normal vector to the surface of the (Ti,Al)N layer. A cumulative frequency distribution of the 111 misorientation angles is such that—≥60% of the 111 misorientation angles is less than 10 degrees.
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公开(公告)号：US11965234B2
公开(公告)日：2024-04-23
申请号：US16607994
申请日：2018-09-05
Applicant: Oerlikon Surface Solutions AG, Pfäffikon
Inventor： Denis Kurapov , Siva Phani Kumar Yalamanchili , Anders Olof Eriksson
CPC classification number: C23C14/0641 , C23C14/0094 , C23C14/345 , C23C14/3485 , C23C14/35 , C23C14/541
Abstract: This invention relates to a coating comprising at least one AlTiN-based film deposited by means of a PVD process, wherein the at least one AlTiN-based film deposited is comprising an Al-content—in relation to the Ti-content—in atomic percentage higher than 75%, and wherein the AlTiN-based film exhibits solely a crystallographic cubic phase and internal compressive stresses and this invention relates to a method involving deposition of an AlTiN-based film.
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公开(公告)号：US11875980B2
公开(公告)日：2024-01-16
申请号：US17139445
申请日：2020-12-31
Applicant: SPTS Technologies Limited
Inventor： Stephen R Burgess , Rhonda Hyndman , Amit Rastogi , Eduardo Paulo Lima , Clive L Widdicks , Paul Rich , Scott Haymore , Daniel Cook
CPC classification number: H01J37/3458 , C23C14/0617 , C23C14/10 , C23C14/345 , C23C14/3485 , C23C14/35 , C23C14/351 , H01J37/32669 , H01J37/32688 , H01J37/345 , H01J37/3411 , H01J37/3426 , H01J37/3461 , H01J37/3467 , H01J37/3408
Abstract: A method is for depositing a dielectric material on to a substrate in a chamber by pulsed DC magnetron sputtering with a pulsed DC magnetron device which produces one or more primary magnetic fields. In the method, a sputtering material is sputtered from a target, wherein the target and the substrate are separated by a gap in the range 2.5 to 10 cm and a secondary magnetic field is produced within the chamber which causes a plasma produced by the pulsed DC magnetron device to expand towards one or more walls of the chamber.
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公开(公告)号：US11823859B2
公开(公告)日：2023-11-21
申请号：US17127527
申请日：2020-12-18
Applicant: IonQuest Corp.
Inventor： Bassam Hanna Abraham
CPC classification number: H01J37/3444 , C23C14/0057 , C23C14/0605 , C23C14/14 , C23C14/345 , C23C14/3485 , C23C14/35 , C23C14/354 , H01J37/321 , H01J37/3405 , H01J37/345 , H01J37/3417 , H01J37/3426 , H01J37/3435 , H01J37/3452 , H01J37/3455 , H01J37/3464 , H01J37/3467
Abstract: A method of sputtering a layer on a substrate using a high-energy density plasma (HEDP) magnetron includes positioning the magnetron in a vacuum with an anode, cathode target, magnet assembly, substrate, and feed gas; applying unipolar negative direct current (DC) voltage pulses from a pulse power supply with a pulse forming network (PFN) to a pulse converting network (PCN); and adjusting an amplitude and frequency associated with the plurality of unipolar negative DC voltage pulses causing a resonance mode associated with the PCN. The PCN converts the unipolar negative DC voltage pulses to an asymmetric alternating current (AC) signal that generates a high-density plasma discharge on the HEDP magnetron. An increase in amplitude or pulse duration of the plurality of unipolar negative DC voltage pulses causes an increase in the amplitude of a negative voltage of the asymmetric AC signal in response to the PCN being in the resonance mode, thereby causing sputtering discharge associated with the HEDP magnetron to form the layer from the cathode target on the substrate. A corresponding apparatus and computer-readable medium are disclosed.
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公开(公告)号：US11821068B2
公开(公告)日：2023-11-21
申请号：US17690107
申请日：2022-03-09
Applicant: IonQuest Corp.
Inventor： Bassam Hanna Abraham , Roman Chistyakov
IPC: H01J37/34 , C23C14/35 , C23C14/34 , C23C16/505 , H01L21/285 , H01L21/768 , H01L23/522 , H01L23/532 , H01J37/32 , C23C14/00 , C23C14/06 , C23C14/14
CPC classification number: C23C14/354 , C23C14/0057 , C23C14/0605 , C23C14/14 , C23C14/345 , C23C14/3485 , C23C14/35 , C23C16/505 , H01J37/321 , H01J37/32825 , H01J37/345 , H01J37/3405 , H01J37/3417 , H01J37/3426 , H01J37/3435 , H01J37/3452 , H01J37/3455 , H01J37/3464 , H01J37/3467 , H01L21/2855 , H01L21/76843 , H01L21/76871 , H01L21/76879 , H01L21/76882 , H01L23/5226 , H01L23/53238
Abstract: A magnetically enhanced plasma apparatus includes a hollow cathode target assembly; an anode positioned on top of the hollow cathode target assembly, thereby forming a gap between the anode and the hollow cathode target assembly; a cathode magnet assembly; a row of magnets that generate a magnetic field in the gap and a magnetic field on a surface of the hollow cathode target assembly with the cathode magnet assembly such that magnetic field lines are substantially perpendicular to a surface of the hollow cathode target assembly; an electrode positioned adjacent to the row of magnets behind the gap; a first radio frequency (RF) power supply coupled to the electrode, wherein the electrode is coupled to ground through an inductor; and a second radio frequency (RF) power supply coupled to the hollow cathode target assembly. The second RF power supply ignites and sustains plasma in the hollow cathode target assembly. A frequency and power of the second RF power supply are selected to increase at least one of a degree of dissociation of feed gas molecules and degree of ionization of feed gas atoms. A frequency and power of the first RF power supply are selected to increase a degree of dissociation of feed gas molecules to form a layer from sputtering hollow cathode target material onto a substrate.
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公开(公告)号：US11753712B2
公开(公告)日：2023-09-12
申请号：US16645261
申请日：2017-09-08
Applicant: Essilor International
Inventor： Francis Blanchard , Bill Baloukas , Ludvik Martinu
IPC: C23C14/34 , G02F1/1524 , C23C14/08 , G02F1/1523
CPC classification number: C23C14/345 , C23C14/08 , G02F1/1524 , G02F1/1525 , G02F2202/36
Abstract: Certain example embodiments of this invention relate to electrochromic devices (100, 1500), assemblies incorporating electrochromic devices, and methods of making the same. Highly-durable electrochromic devices include tungsten oxide (e.g., WO3 or other suitable stoichiometry) films (102, 1510) prepared using high-rate bias-enhanced sputter deposition. The sputtering is performed in a low-pressure (e.g., 1 mTorr) environment, and the biasing is very high (e.g., greater than −400 V, more preferably greater than −500 V), which causes high energy ion bombardment that in turn leads to partial nanocrystallization of the WO3 matrix, while simultaneously generating the porous microstructure desirable for ionic diffusion.
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公开(公告)号：US20190041564A1
公开(公告)日：2019-02-07
申请号：US16150478
申请日：2018-10-03
Applicant: Moxtek, Inc.
Inventor： R. Stewart Nielson , Matthew C. George , Shaun Ogden , Brian Bowers
IPC: G02B5/30 , G02B1/18 , G02B1/14 , C23C14/12 , C23C16/455 , C23C14/08 , C23C16/30 , C23C14/58 , C23C28/04 , C23C14/34
CPC classification number: G02B5/3058 , C23C14/0036 , C23C14/081 , C23C14/12 , C23C14/34 , C23C14/345 , C23C14/5873 , C23C16/30 , C23C16/45525 , C23C28/04 , G02B1/14 , G02B1/18 , G02B5/3025
Abstract: A method for making a wire grid polarizer (WGP) can provide WGPs with high temperature resistance, robust wires, oxidation resistance, and corrosion protection. In one embodiment, the method can comprise: (a) providing an array of wires on a bottom protection layer; (b) applying a top protection layer on the wires, spanning channels between wires; then (c) applying an upper barrier-layer on the top protection layer and into the channels through permeable junctions in the top protection layer. In a variation of this embodiment, the method can further comprise applying a lower barrier-layer before applying the top protection layer. In another variation, the bottom protection layer and the top protection layer can include aluminum oxide. In another embodiment, the method can comprise applying on the WGP an amino phosphonate then a hydrophobic chemical.
