公开(公告)号：US09228962B2

公开(公告)日：2016-01-05

申请号：US14540220

申请日：2014-11-13

Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  UNIVERSITE PARIS SUD 11

Inventor： Mathieu Kociak ,  Luiz Fernando Zagonel ,  Marcel Tence ,  Stefano Mazzucco

IPC: G01N21/64 ,  G01N23/225 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/26

CPC classification number: G01N23/2254 ,  G01N2201/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/063 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2602 ,  H01J2237/2802 ,  H01J2237/2808

Abstract: A cathodoluminescence detection system is provided, including a source of charged particles arranged to illuminate a sample with a charged particle beam, and an optical path having at least two optical components capable of collecting and conveying light radiation coming from the illuminated sample to an analysis device; each optical component of the optical path is selected so that: the maximum output angle of the optical component is less than or equal to 120% of the maximum acceptance angle of the next optical component; and the diameter of the radiation coming from the optical component in the input plane of the next optical component is less than or equal to 120% of the useful input diameter of the next optical component.

Abstract translation: 提供了一种阴极发光检测系统，其包括用带电粒子束照射样品的带电粒子源，以及具有至少两个光学部件的光路，所述至少两个光学部件能够将来自被照射样品的光辐射收集并传送到分析装置 ; 选择光路的每个光学部件，使得：光学部件的最大输出角度小于或等于下一个光学部件的最大接收角度的120％; 并且来自下一个光学部件的输入平面中的光学部件的辐射的直径小于或等于下一个光学部件的有用输入直径的120％。

公开(公告)号：US09218938B2

公开(公告)日：2015-12-22

申请号：US14317650

申请日：2014-06-27

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Nai-Han Cheng

IPC: H01J37/244 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24405 ,  H01J2237/24528 ,  H01J2237/24542

Abstract: A beam monitoring device, method, and system is disclosed. An exemplary beam monitoring device includes a one dimensional (1D) profiler. The 1D profiler includes a Faraday having an insulation material and a conductive material. The beam monitoring device further includes a two dimensional (2D) profiler. The 2D profiler includes a plurality of Faraday having an insulation material and a conductive material. The plurality of Faraday of the 2D profiler are arranged in a pattern that is offset in a direction. The 1D profiler is coupled to a first end of the 2D profiler and extends beyond two adjacent outer edges of the 2D profiler. The beam monitoring device further includes a control arm. The control arm is operable to facilitate movement of the beam monitoring device in the direction.

Abstract translation: 公开了一种光束监测装置，方法和系统。 示例性束监测装置包括一维（1D）轮廓仪。 1D轮廓仪包括具有绝缘材料和导电材料的法拉第。 光束监测装置还包括二维（2D）轮廓仪。 2D轮廓仪包括具有绝缘材料和导电材料的多个法拉第。 2D轮廓仪的多个法拉第以一个方向偏移的图案排列。 1D轮廓仪耦合到2D轮廓仪的第一端并延伸超过2D轮廓仪的两个相邻的外边缘。 光束监视装置还包括控制臂。 控制臂可操作以便于沿着该方向的光束监视装置的移动。

公开(公告)号：US09196498B1

公开(公告)日：2015-11-24

申请号：US14458021

申请日：2014-08-12

Applicant: Roy C. Nangoy

Inventor： Roy C. Nangoy

IPC: H01L21/306 ,  H01L21/3065 ,  H01J37/32 ,  H01L21/78 ,  H01L23/544 ,  H01L21/67 ,  H01L21/683 ,  H01L21/673

CPC classification number: H01L21/6836 ,  H01J37/32522 ,  H01J37/32568 ,  H01J37/32642 ,  H01J37/32651 ,  H01J37/32724 ,  H01J2237/002 ,  H01J2237/024 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/31105 ,  H01L21/31127 ,  H01L21/32131 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/67207 ,  H01L21/673 ,  H01L21/6831 ,  H01L21/78 ,  H01L23/544 ,  H01L2221/68327 ,  H01L2221/68377 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Methods of and apparatuses for dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. In an example, a plasma processing apparatus includes a processing chamber having a chamber wall. The plasma processing apparatus also includes a plasma source in an upper portion of the processing chamber. A sample support is included for situating a sample below the plasma source. An actively-cooled shadow ring having a cooling channel therein for cooling fluid transport is fixedly attached to the chamber wall of the processing chamber, between the plasma source and the sample support.

Abstract translation: 对具有多个集成电路的各晶片的切割半导体晶片的方法和装置进行说明。 在一个示例中，等离子体处理设备包括具有室壁的处理室。 等离子体处理装置还包括在处理室的上部的等离子体源。 包括样品支架，用于将样品置于等离子体源下方。 其中具有用于冷却流体输送的冷却通道的主动冷却的阴影环在等离子体源和样品支架之间固定地附接到处理室的室壁。

公开(公告)号：US20150228454A1

公开(公告)日：2015-08-13

申请号：US14618630

申请日：2015-02-10

Applicant: SEN Corporation

Inventor： Kouji Kato ,  Yoshitaka Amano

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/15 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/3171 ,  H01J37/12 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/121 ,  H01J2237/16

Abstract: A beam collimator includes a plurality of lens units that are arranged along a reference trajectory so that a beam collimated to the reference trajectory comes out from an exit of the beam collimator. Each of the plurality of lens units forms a bow-shaped curved gap and is formed such that an angle of a beam traveling direction with respect to the reference trajectory is changed by an electric field generated in the bow-shaped curved gap. A vacant space is provided between one lens unit of the plurality of lens units and a lens unit that is adjacent to the lens unit. The vacant space is directed in a transverse direction of the collimated beam in a cross section that is perpendicular to the reference trajectory. An inner field containing the reference trajectory is connected to an outer field of the plurality of lens units through the vacant space.

Abstract translation: 光束准直仪包括沿着参考轨迹布置的多个透镜单元，使得准直到参考轨迹的光束从光束准直仪的出口出来。 多个透镜单元中的每一个形成弓形弯曲间隙，并且形成为使得相对于基准轨迹的光束移动方向的角度由弓形弯曲间隙中产生的电场改变。 在多个透镜单元的一个透镜单元和与透镜单元相邻的透镜单元之间设置有空白空间。 在垂直于参考轨迹的横截面中，空白空间被引导在准直光束的横向方向上。 包含参考轨迹的内部场通过空置空间连接到多个透镜单元的外部场。

公开(公告)号：US08766207B2

公开(公告)日：2014-07-01

申请号：US13241392

申请日：2011-09-23

Applicant: Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

Inventor： Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

IPC: H01J37/244

CPC classification number: H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24405 ,  H01J2237/24528 ,  H01J2237/24542

Abstract: A beam monitoring device, method, and system is disclosed. An exemplary beam monitoring device includes a one dimensional (1D) profiler. The 1D profiler includes a Faraday having an insulation material and a conductive material. The beam monitoring device further includes a two dimensional (2D) profiler. The 2D profiler includes a plurality of Faraday having an insulation material and a conductive material. The beam monitoring device further includes a control arm. The control arm is operable to facilitate movement of the beam monitoring device in a longitudinal direction and to facilitate rotation of the beam monitoring device about an axis.

Abstract translation: 公开了一种光束监测装置，方法和系统。 示例性束监测装置包括一维（1D）轮廓仪。 1D轮廓仪包括具有绝缘材料和导电材料的法拉第。 光束监测装置还包括二维（2D）轮廓仪。 2D轮廓仪包括具有绝缘材料和导电材料的多个法拉第。 光束监视装置还包括控制臂。 控制臂可操作以便于在纵向方向上使光束监视装置的移动，并且便于光束监视装置围绕轴的旋转。

公开(公告)号：US08502161B2

公开(公告)日：2013-08-06

申请号：US12776636

申请日：2010-05-10

Applicant: Sami K. Hahto ,  Richard Goldberg ,  Edward McIntyre ,  Thomas N. Horsky

Inventor： Sami K. Hahto ,  Richard Goldberg ,  Edward McIntyre ,  Thomas N. Horsky

IPC: H01J27/08

CPC classification number: H01J37/08 ,  H01J27/205 ,  H01J2237/024 ,  H01J2237/082 ,  H01J2237/0835 ,  H01J2237/31701

Abstract: An ion source is disclosed for use in fabrication of semiconductors. The ion source includes an electron emitter that includes a cathode mounted external to the ionization chamber for use in fabrication of semiconductors. In accordance with an important aspect of the invention, the electron emitter is employed without a corresponding anode or electron optics. As such, the distance between the cathode and the ionization chamber can be shortened to enable the ion source to be operated in an arc discharge mode or generate a plasma. Alternatively, the ion source can be operated in a dual mode with a single electron emitter by selectively varying the distance between the cathode and the ionization chamber.

Abstract translation: 公开了用于半导体制造的离子源。 离子源包括电子发射器，其包括安装在用于制造半导体的电离室外部的阴极。 根据本发明的重要方面，使用电子发射器而没有相应的阳极或电子光学器件。 因此，可以缩短阴极和电离室之间的距离，使得离子源能够以电弧放电模式操作或产生等离子体。 或者，离子源可以通过选择性地改变阴极和电离室之间的距离，以单电子发射器在双重模式下操作。

公开(公告)号：US08425741B2

公开(公告)日：2013-04-23

申请号：US12309464

申请日：2007-07-06

Applicant: Gary Proudfoot ,  Christopher David George ,  Paulo Edurado Lima ,  Gordon Robert Green ,  Robert Kenneth Trowell

Inventor： Gary Proudfoot ,  Christopher David George ,  Paulo Edurado Lima ,  Gordon Robert Green ,  Robert Kenneth Trowell

IPC: C25B9/00 ,  C25B13/00 ,  B05B5/025

CPC classification number: C23C14/46 ,  H01J27/18 ,  H01J37/20 ,  H01J37/3178 ,  H01J2237/024 ,  H01J2237/3146

Abstract: This invention relates to a broad beam ion deposition apparatus (100) including an ion source (101), a target (102), a tillable substrate table (103) and an auxiliary port (104). The target (102) is in the form of a carousel which carries a number of targets and the ion source (101) is configured to produce a substantially rectangular section beam (105).

Abstract translation: 本发明涉及一种包括离子源（101），靶（102），可耕化基板台（103）和辅助端口（104）的宽束离子沉积装置（100）。 目标（102）是携带多个目标的转盘的形式，并且离子源（101）被配置为产生基本上矩形的截面梁（105）。

公开(公告)号：US20130068966A1

公开(公告)日：2013-03-21

申请号：US13699981

申请日：2011-04-29

Applicant: Mathieu Kociak ,  Luiz Fernando Zagonel ,  Marcel Tence ,  Stefano Mazzucco

Inventor： Mathieu Kociak ,  Luiz Fernando Zagonel ,  Marcel Tence ,  Stefano Mazzucco

IPC: G01N23/22

CPC classification number: G01N23/2254 ,  G01N2201/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/063 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2602 ,  H01J2237/2802 ,  H01J2237/2808

Abstract: Cathodoluminescence detection system comprising a collecting optic (112), for collecting light radiation coming from a specimen illuminated by a beam of charged particles and reflecting said light radiation onto analysis means, characterized in that it comprises means (606,614-618) for positioning said collecting optic (112) along at least one dimension.

Abstract translation: 阴极发光检测系统，包括收集光学器件（112），用于收集来自由带电粒子束照射的样本的光辐射并将所述光辐射反射到分析装置上，其特征在于，其包括用于定位所述收集物的装置（606,614-618） 沿着至少一个维度的光学元件（112）。

公开(公告)号：US20120241640A1

公开(公告)日：2012-09-27

申请号：US12999731

申请日：2008-06-20

Applicant: Billy W. Ward ,  Colin A. Sanford ,  John Notte, VI ,  Alexander Groholski ,  Mark D. DiManna

Inventor： Billy W. Ward ,  Colin A. Sanford ,  John Notte, VI ,  Alexander Groholski ,  Mark D. DiManna

IPC: H01J27/02 ,  H01J3/26 ,  G21K5/04

CPC classification number: H01J27/26 ,  F25D19/006 ,  H01J37/067 ,  H01J37/08 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/061 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/244 ,  H01J2237/2487 ,  H01J2237/2826

Abstract: Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like).

Abstract translation: 公开了离子源，系统和方法。 在一些实施例中，离子源，系统和方法可以表现出相对较少的不期望的振动和/或可以充分地抑制不需要的振动。 这可以提高性能（例如，增加可靠性，稳定性等）。

公开(公告)号：US20120231616A1

公开(公告)日：2012-09-13

申请号：US13471932

申请日：2012-05-15

Applicant: Sarko Cherekdjian

Inventor： Sarko Cherekdjian

IPC: H01L21/265

CPC classification number: H01J37/32366 ,  C23C14/48 ,  C23C14/54 ,  C23C14/56 ,  H01J37/08 ,  H01J37/317 ,  H01J37/3171 ,  H01J37/32412 ,  H01J2237/024 ,  H01J2237/0827 ,  H01J2237/31701 ,  H01L21/2236 ,  H01L21/76254

Abstract: Methods and apparatus provide for: a first source of plasma, wherein the plasma includes a first species of ions; a second source of plasma, wherein the plasma includes a second species of ions; selection of the plasma from the first and second sources; and acceleration the first species of ions or the second species of ions toward a semiconductor wafer.