摘要:
A field-effect semiconductor element implemented with a fewer number of elements and a reduced area and capable of storing data by itself without need for cooling at a cryogenic temperature, and a memory device employing the same. Gate-channel capacitance is set so small that whether or not a trap captures one electron or hole can definitely and distinctively be detected in terms of changes of a current of the semiconductor FET element. By detecting a change in a threshold voltage of the semiconductor element brought about by trapping of electron or hole in the trap, data storage can be realized at a room temperature.
摘要:
A field-effect semiconductor element implemented with a fewer number of elements and a reduced area and capable of storing data by itself without need for cooling at a cryogenic temperature, and a memory device employing the same. Gate-channel capacitance is set so small that whether or not a trap captures one electron or hole can definitely and distinctively be detected in terms of changes of a current of the semiconductor FET element. By detecting a change in a threshold voltage of the semiconductor element brought about by trapping of electron or hole in the trap, data storage can be realized at a room temperature.
摘要:
An EEPROM having an erasing control circuit that performs at least the read out operation one time on the corresponding memory cells after an erasing operation is performed in connection therewith. The erasing operation is automatically performed by the internal erasing control circuit while the EEPROM is electrically isolated from the microprocessor in response to instructions from the microprocessor. The control by the microprocessor requires only a slightly short period of time during which the erasing commencement is instructed while the EEPROM remains in the system during the erasing operation. In one aspect of the disclosure, a Vcc power source is applied to a source region or a drain region of each nonvolatile semiconductor memory cell, and an erasure voltage having a polarity opposite to that of the Vcc power source is applied to a control gate electrode.
摘要:
A field-effect semiconductor element implemented with a reduced number of elements and a reduced area and capable of storing data by itself without need for cooling at a cryogenic temperature, and a memory device employing the same. Gate-channel capacitance is set so small that whether or not a trap captures one electron or hole can definitely and distinctively be detected in terms of changes of a current of the semiconductor FET element. By detecting a change in a threshold voltage of the semiconductor element brought about by trapping of electron or hole in the trap, data storage can be realized at a room temperature. In accordance with one embodiment, a carrier confinement region, isolated from a channel and a gate of the semiconductor FET element, is provided to operate as a storage node for trapping the carrier or carriers.
摘要:
For the relation between the first and second pass-transistor circuits (PT1, PT2), the output signal of the preceding-stage is supplied to the gate of the succeeding-stage, and for the relation between the second and third pass-transistor circuits (PT2, PT3), the output signal of the preceding-stage is supplied to the source-drain path of the succeeding-stage. The first pass-transistor circuit (PT1) receives on its first input node (In1) and second input node (In2) the first input signal and the second input signal that are logically independent from each other. This logic circuit requires a smaller number of transistors and is capable of reducing the power consumption and delay and accomplishing an intricate logic function.
摘要:
Within an EEPROM having a memory array in which the electrically erasable nonvolatile storage elements are arranged in a matrix form, an erasing control circuit is included, which performs at least the read out operation one time on the corresponding memory cells after an erasing operation is performed in connection therewith in accordance with externally supplied erasing operation instructions. The erasing operation is automatically performed by the internal erasing control circuit while the EEPROM is electrically isolated from the microprocessor in response to instructions from the microprocessor. The control by the microprocessor requires only a slightly short period of time during which the erasing commencement is instructed while the EEPROM remains in the system during the erasing operation. In one aspect of the present invention, a Vcc power source is applied to a source region or a drain region of each nonvolatile semiconductor memory cell, and an erasure voltage having a polarity opposite to that of the Vcc power source is applied to a control gate electrode. The erasure voltage is supplied to a voltage conversion circuit provided within the nonvolatile memory device. Accordingly, erasure operation can be realized by the Vcc single power source. Further, substantial terminals of the collective erasure operation are individually controlled for every memory element or every collective memory element in response to the individual erasure speed of each memory element.
摘要:
A sense amplifier for an SRAM providing both a small power consumption and a high speed sensing operation. The sense amplifier includes a first p-channel MOSFET having a source terminal connected to a bit line, a second p-channel MOSFET having a source terminal connected to another bit line, a first n-channel MOSFET having a drain terminal connected to a drain terminal of the first p-channel MOSFET and a gate terminal connected to a drain terminal of the second p-channel MOSFET and to a gate terminal of the first p-channel MOSFET, a second n-channel MOSFET having a drain terminal connected to a drain terminal of the second p-channel MOSFET, a gate terminal connected to a drain terminal of the first p-channel MOSFET and to a gate terminal of the second p-channel MOSFET, and a source terminal connected to a source terminal of the first n-channel MOSFET, a third p-channel MOSFET for controlling the connection/disconnection between a first power source (Vcc) and the drain terminal of the first p-channel MOSFET, a fourth p-channel MOSFET for controlling the connection/disconnection between the first power source Vcc and the drain terminal of the second p-channel MOSFET, and a third n-channel MOSFET for controlling the connection/disconnection between a second power source (ground) and the source terminals of the second n-channel MOSFETs.
摘要翻译:一种用于SRAM的读出放大器,既提供小功率消耗又提供高速感测操作。 读出放大器包括具有连接到位线的源极端子的第一p沟道MOSFET,具有连接到另一个位线的源极端子的第二p沟道MOSFET,具有连接到漏极的漏极端子的第一n沟道MOSFET 第一p沟道MOSFET的端子和连接到第二p沟道MOSFET的漏极端子和栅极端子的栅极端子连接到第一p沟道MOSFET的栅极端子,第二n沟道MOSFET,其漏极端子连接到 第二p沟道MOSFET的漏极端子,连接到第一p沟道MOSFET的漏极端子的栅极端子和与第二p沟道MOSFET的栅极端子连接的栅极端子以及连接到第一p沟道MOSFET的源极端子的源极端子 n沟道MOSFET,用于控制第一电源(Vcc)和第一p沟道MOSFET的漏极端子之间的连接/断开的第三p沟道MOSFET,用于控制第一p沟道MOSFET之间的连接/断开的第四p沟道MOSFET f 第一电源Vcc和第二p沟道MOSFET的漏极端子,以及用于控制第二电源(地)和第二n沟道MOSFET的源极端子之间的连接/断开的第三n沟道MOSFET。
摘要:
Source and drain regions are formed in first regions of low concentration formed on a surface of a semiconductor surface, and a second region with doping concentration higher than that of the first regions is formed around the first regions. Further in the second region, third regions with doping concentration higher than that of the second region are formed separate from each other. By virtue of this, a rise of the threshold voltage attendant on a decrease of the channel length is canceled out by the third regions and the short channel effect is suppressed. Further, since doping concentration of the first region is low, high carrier mobility can be obtained.
摘要:
A semiconductor device such as a solar cell, photodiode and solid state imaging device comprises a semiconductor layer made of amorphous silicon formed on a given substrate, and a transparent conductive layer formed by an interfacial reaction between the amorphous silicon and a metallic film directly formed on the amorphous silicon. This transparent conductive layer is used as a transparent electrode of the device and if necessary the remainder after having partially removed the metallic film for the transparent conductive layer is used as a conductive layer and light shielding film.