Abstract:
Semiconductor devices and manufacturing methods are provided for using a Recon interposer that provides a high density interface between the active semiconductor die and the semiconductor substrate and also provides the pitch fan-out. For example, a circuit assembly includes a silicon pad layer including a plurality of metal pads, each metal pad configured to receive a corresponding bump of a plurality of bumps. The circuit assembly further includes an oxide layer disposed on the silicon pad layer and an interposer dielectric layer disposed on the oxide layer. The interposer dielectric layer includes a plurality of routing traces that connect a top surface of the redistribution layer to a bottom surface of the interposer dielectric layer. The circuit assembly further includes an integrated circuit (IC) die attached to the plurality of routing traces at the top surface of the interposer dielectric layer using a plurality of IC bumps and an encapsulating material encapsulating at least a portion of the silicon pad layer, the oxide layer, the interposer dielectric layer, and the IC die to provide structural support for the circuit assembly.
Abstract:
Various examples are provided for interconnection structures for molded IC packages. In one example, among others, an IC package includes a substrate and an interposer. A plurality of conductive elements provide physical and electrical contact between a surface of the substrate and a surface of the interposer. A standoff element disposed between the surfaces of the substrate and interposer provides a minimum spacing between the surfaces of the substrate and interposer. In some implementations, a standoff element is disposed between an IC die disposed on the surface of the substrate and the surface of the interposer. In another example, a method includes coupling conductive elements to a surface of an interposer, attaching a standoff element, coupling the conductive elements to a surface of a substrate, and forming an embedded layer between the interposer and substrate. The standoff element defines a minimum gap between the interposer and the substrate.
Abstract:
Methods and apparatuses are described for integration of integrated circuit die and silicon-based trench capacitors using silicon-level connections to reduce connection lengths, parasitics and necessary capacitance magnitudes and volumes. A trench capacitor can be fabricated on silicon and mounted on or embedded in a chip or one or more sides of a through silicon interposer (TSI) for silicon-level connections to chip circuitry. Aspect ratio dependent, as opposed to trench diameter or trench depth dependent, trench capacitors formed by a dense array of high aspect ratio trenches with thin, high permittivity dielectric increase capacitance per unit area and volume, resulting in thin, high capacitance trench capacitors having thickness equal to or less than chip thickness.
Abstract:
Embodiments of provide an integrated circuit (IC) device. The IC device can include a substrate having first and second opposing surfaces, an IC die electrically coupled to the first surface of the substrate, a plurality of contact members coupled to the first surface of the substrate, and an interposer. The interposer can include a plurality of contact elements located on a first surface thereof, each conductive element being coupled to a respective one of the plurality of contact members, and an antenna formed using a conductive layer of the interposer, the antenna being electrically coupled to the IC die through at least one of the plurality of contact elements and at least one of the plurality of contact members.
Abstract:
A method of manufacturing an integrated circuit (IC) package is provided. The method includes mounting a fast plurality of contact members on a surface of a package member, and coupling a second plurality of contact members located on a first surface of an interposer substrate to corresponding ones of the first plurality of contact members. The interposer substrate is configured such that a circuit member mounted to a second surface of the interposer substrate is electrically coupled to the first plurality of contact members.
Abstract:
In an embodiment, a thermal interface material (TIM) is provided. The TIM includes first and a second layers of a first transition metal, and a third layer including a plurality of carbon nanotubes supported in a flexible polymer matrix and a second transition metal coupled to sidewalls of carbon nanotubes. The first and second metal layers are in contact with first and second ends of carbon nanotube. The TIM further includes fourth and fifth layers of an alloy material coupled to the first and second metal layers, respectively. The carbon nanotube based TIM including the layers with transition metal allow improved heat transfer from an integrated circuit die to a heat spreader.
Abstract:
In embodiments described herein, an integrated circuit (IC) package is provided. The IC package can include a substrate having opposing first and second surfaces, an IC die coupled to the first surface of the substrate, a first plurality of conductive elements coupled to conductive regions on the first surface of the substrate, an interposer having opposing first and second surfaces, and a second plurality of conductive elements coupled to conductive regions on the first surface of the interposer. The second surface of the substrate is configured be coupled to at least one device. Each of the first plurality of conductive elements is electrically coupled to a respective one of the second plurality of conductive elements. The interposer is configured to be attached to a printed circuit board (PCB).
Abstract:
The present application discloses various implementations of a semiconductor package including an organic substrate and one or more interposers having through-semiconductor vias (TSVs). Such a semiconductor package may include a contiguous organic substrate having a lower substrate segment including first and second pluralities of lower interconnect pads, the second plurality of lower interconnect pads being disposed in an opening of the lower substrate segment. The contiguous organic substrate may also include an upper substrate segment having an upper width and including first and second pluralities of upper interconnect pads. In addition, the semiconductor package may include at least one interposer having TSVs for electrically connecting the first and second pluralities of lower interconnect pads to the first and second pluralities of upper interconnect pads. The interposer has an interposer width less than the upper width of the upper substrate segment.
Abstract:
Methods, systems, and apparatuses for integrated circuit packages are provided. An integrated circuit package, such as a quad flat no-lead (QFN) package, includes a plurality of peripherally positioned leads, a heat spreader, an integrated circuit die, and an encapsulating material. The peripherally positioned leads are attached to a first surface of the heat spreader, and the die is attached to the first surface of the heat spreader within a ring formed by the leads. The encapsulating material encapsulates the die on the heat spreader, encapsulates bond wires, and fills a space between the leads. A second surface of the heat spreader is exposed from the package. End portions of the leads have surfaces that are flush with a surface of the package opposite the second surface of the heat spreader, and that are used as lands for the package.
Abstract:
The present application discloses various implementations of a semiconductor package including an organic substrate and one or more interposers having through-semiconductor vias (TSVs). Such a semiconductor package may include a contiguous organic substrate having a lower substrate segment including first and second pluralities of lower interconnect pads, the second plurality of lower interconnect pads being disposed in an opening of the lower substrate segment. The contiguous organic substrate may also include an upper substrate segment having an upper width and including first and second pluralities of upper interconnect pads. In addition, the semiconductor package may include at least one interposer having TSVs for electrically connecting the first and second pluralities of lower interconnect pads to the first and second pluralities of upper interconnect pads. The interposer has an interposer width less than the upper width of the upper substrate segment.