公开(公告)号：US09538582B2

公开(公告)日：2017-01-03

申请号：US13559318

申请日：2012-07-26

Applicant: Ming-Da Cheng ,  Hsiu-Jen Lin ,  Cheng-Ting Chen ,  Wei-Yu Chen ,  Chien-Wei Lee ,  Chung-Shi Liu

Inventor： Ming-Da Cheng ,  Hsiu-Jen Lin ,  Cheng-Ting Chen ,  Wei-Yu Chen ,  Chien-Wei Lee ,  Chung-Shi Liu

IPC: B23K31/02 ,  H01L21/00 ,  H05B3/02 ,  H01L21/677 ,  H01L21/683 ,  H01L23/00

CPC classification number: H05B3/02 ,  B23K3/087 ,  B23K2101/40 ,  H01L21/67721 ,  H01L21/6838 ,  H01L24/75 ,  H01L24/81 ,  H01L2224/131 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/75744 ,  H01L2224/7598 ,  H01L2224/81191 ,  H01L2224/81815 ,  H01L2224/97 ,  H01L2924/3511 ,  H01L2924/37001 ,  Y10T29/41 ,  H01L2924/00014 ,  H01L2224/81 ,  H01L2924/014

Abstract: A method includes placing a first package component over a vacuum boat, wherein the vacuum boat comprises a hole, and wherein the first package component covers the hole. A second package component is placed over the first package component, wherein solder regions are disposed between the first and the second package components. The hole is vacuumed, wherein the first package component is pressed by a pressure against the vacuum boat, and wherein the pressure is generated by a vacuum in the hole. When the vacuum in the hole is maintained, the solder regions are reflowed to bond the second package component to the first package component.

Abstract translation: 一种方法包括将第一包装部件放置在真空舟皿上，其中真空舟皿包括孔，并且其中第一包装部件覆盖该孔。 第二包装部件放置在第一包装部件上，其中焊料区域设置在第一和第二包装部件之间。 该孔被抽真空，其中第一包装部件被压靠在真空舟皿上的压力，并且其中压力由孔中的真空产生。 当保持孔中的真空时，回流焊接区域以将第二包装部件结合到第一包装部件。

公开(公告)号：US08927391B2

公开(公告)日：2015-01-06

申请号：US13118108

申请日：2011-05-27

Applicant: Meng-Tse Chen ,  Wei-Hung Lin ,  Sheng-Yu Wu ,  Chun-Cheng Lin ,  Kuei-Wei Huang ,  Yu-Peng Tsai ,  Chih-Wei Lin ,  Wen-Hsiung Lu ,  Hsiu-Jen Lin ,  Bor-Ping Jang ,  Ming-Da Cheng ,  Chung-Shi Liu

Inventor： Meng-Tse Chen ,  Wei-Hung Lin ,  Sheng-Yu Wu ,  Chun-Cheng Lin ,  Kuei-Wei Huang ,  Yu-Peng Tsai ,  Chih-Wei Lin ,  Wen-Hsiung Lu ,  Hsiu-Jen Lin ,  Bor-Ping Jang ,  Ming-Da Cheng ,  Chung-Shi Liu

IPC: H01L21/30 ,  H01L21/56 ,  H01L25/00 ,  H01L25/10 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498

CPC classification number: H01L24/17 ,  H01L21/565 ,  H01L21/566 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/49827 ,  H01L24/16 ,  H01L24/81 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/131 ,  H01L2224/16055 ,  H01L2224/16113 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/12042 ,  H01L2924/1304 ,  H01L2924/14 ,  H01L2924/1432 ,  H01L2924/1434 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/15321 ,  H01L2924/181 ,  H01L2924/00

Abstract: A method of packaging includes placing a package component over a release film, wherein solder balls on a surface of the package component are in physical contact with the release film. Next, A molding compound filled between the release film and the package component is cured, wherein during the step of curing, the solder balls remain in physical contact with the release film.

Abstract translation: 包装方法包括将包装部件放置在脱模膜上，其中包装部件表面上的焊球与剥离膜物理接触。 接下来，填充在剥离膜和包装部件之间的模塑料固化，其中在固化步骤期间，焊球与剥离膜保持物理接触。

公开(公告)号：US08735273B2

公开(公告)日：2014-05-27

申请号：US13179299

申请日：2011-07-08

Applicant: Wen-Hsiung Lu ,  Ming-Da Cheng ,  Chih-Wei Lin ,  Yi-Wen Wu ,  Hsiu-Jen Lin ,  Chung-Shi Liu ,  Mirng-Ji Lii ,  Chen-Hua Yu

Inventor： Wen-Hsiung Lu ,  Ming-Da Cheng ,  Chih-Wei Lin ,  Yi-Wen Wu ,  Hsiu-Jen Lin ,  Chung-Shi Liu ,  Mirng-Ji Lii ,  Chen-Hua Yu

IPC: H01L21/44

CPC classification number: H01L24/03 ,  H01L21/566 ,  H01L21/76885 ,  H01L23/3114 ,  H01L23/3157 ,  H01L23/525 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/02311 ,  H01L2224/02331 ,  H01L2224/0235 ,  H01L2224/02375 ,  H01L2224/0346 ,  H01L2224/0347 ,  H01L2224/03903 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/05008 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05186 ,  H01L2224/05552 ,  H01L2224/05567 ,  H01L2224/05655 ,  H01L2224/05664 ,  H01L2224/11334 ,  H01L2224/11849 ,  H01L2224/1191 ,  H01L2224/13022 ,  H01L2224/13083 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00012 ,  H01L2924/01047 ,  H01L2924/01029 ,  H01L2924/00

Abstract: A method includes forming a passivation layer over a metal pad, which is overlying a semiconductor substrate. A first opening is formed in the passivation layer, with a portion of the metal pad exposed through the first opening. A seed layer is formed over the passivation layer and to electrically coupled to the metal pad. The seed layer further includes a portion over the passivation layer. A first mask is formed over the seed layer, wherein the first mask has a second opening directly over at least a portion of the metal pad. A PPI is formed over the seed layer and in the second opening. A second mask is formed over the first mask, with a third opening formed in the second mask. A portion of a metal bump is formed in the third opening. After the step of forming the portion of the metal bump, the first and the second masks are removed.

Abstract translation: 一种方法包括在覆盖半导体衬底的金属焊盘上形成钝化层。 在钝化层中形成第一开口，金属垫的一部分通过第一开口暴露。 种子层形成在钝化层之上并且电耦合到金属焊盘。 种子层还包括钝化层上的部分。 在种子层上形成第一掩模，其中第一掩模具有直接在金属焊盘的至少一部分上的第二开口。 在种子层和第二开口中形成PPI。 在第一掩模上形成第二掩模，第二掩模形成在第二掩模中。 金属凸块的一部分形成在第三开口中。 在形成金属凸块的部分的步骤之后，去除第一和第二掩模。

公开(公告)号：US08674496B2

公开(公告)日：2014-03-18

申请号：US13399437

申请日：2012-02-17

Applicant: Cheng-Chung Lin ,  Hsiu-Jen Lin ,  Cheng-Ting Chen ,  Chun-Cheng Lin ,  Ming-Da Cheng ,  Chung-Shi Liu

Inventor： Cheng-Chung Lin ,  Hsiu-Jen Lin ,  Cheng-Ting Chen ,  Chun-Cheng Lin ,  Ming-Da Cheng ,  Chung-Shi Liu

IPC: H01L25/07

CPC classification number: H01L24/14 ,  H01L23/49816 ,  H01L23/5389 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/16225 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/01322 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/15787 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/00

Abstract: A fine pitch package-on-package (PoP), and a method of forming, are provided. The PoP may be formed by placing connections, e.g., solder balls, on a first substrate having a semiconductor die attached thereto. A first reflow process is performed to elongate the solder balls. Thereafter, a second substrate having another semiconductor die attached thereto is connected to the solder balls. A second reflow process is performed to form an hourglass connection.

Abstract translation: 提供了一种精细节距封装（PoP）和一种形成方法。 PoP可以通过将连接例如焊球放置在具有附接到其上的半导体管芯的第一基板上而形成。 执行第一回流处理以延长焊球。 此后，具有安装有另一个半导体管芯的第二基板连接到焊球。 执行第二回流处理以形成沙漏连接。

公开(公告)号：US20130214401A1

公开(公告)日：2013-08-22

申请号：US13399437

申请日：2012-02-17

Applicant: Cheng-Chung Lin ,  Hsiu-Jen Lin ,  Cheng-Ting Chen ,  Chun-Cheng Lin ,  Ming-Da Cheng ,  Chung-Shi Liu

Inventor： Cheng-Chung Lin ,  Hsiu-Jen Lin ,  Cheng-Ting Chen ,  Chun-Cheng Lin ,  Ming-Da Cheng ,  Chung-Shi Liu

IPC: H01L25/07 ,  H01L21/50

CPC classification number: H01L24/14 ,  H01L23/49816 ,  H01L23/5389 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/16225 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/01322 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/15787 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/00

Abstract: A fine pitch package-on-package (PoP), and a method of forming, are provided. The PoP may be formed by placing connections, e.g., solder balls, on a first substrate having a semiconductor die attached thereto. A first reflow process is performed to elongate the solder balls. Thereafter, a second substrate having another semiconductor die attached thereto is connected to the solder balls. A second reflow process is performed to form an hourglass connection.

Abstract translation: 提供了一种精细节距封装（PoP）和一种形成方法。 PoP可以通过将连接例如焊球放置在具有附接到其上的半导体管芯的第一基板上而形成。 执行第一回流处理以延长焊球。 此后，具有安装有另一个半导体管芯的第二基板连接到焊球。 执行第二回流处理以形成沙漏连接。

公开(公告)号：US08501615B2

公开(公告)日：2013-08-06

申请号：US13161303

申请日：2011-06-15

Applicant: Ming-Da Cheng ,  Chih-Wei Lin ,  Hsiu-Jen Lin ,  Tzong-Hann Yang ,  Wen-Hsiung Lu ,  Zheng-Yi Lim ,  Yi-Wen Wu ,  Chung-Shi Liu

Inventor： Ming-Da Cheng ,  Chih-Wei Lin ,  Hsiu-Jen Lin ,  Tzong-Hann Yang ,  Wen-Hsiung Lu ,  Zheng-Yi Lim ,  Yi-Wen Wu ,  Chung-Shi Liu

IPC: H01L21/44

CPC classification number: H01L24/11 ,  H01L21/6836 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L2221/68327 ,  H01L2224/11003 ,  H01L2224/111 ,  H01L2224/1133 ,  H01L2224/11462 ,  H01L2224/1147 ,  H01L2224/11825 ,  H01L2224/11849 ,  H01L2224/119 ,  H01L2224/13022 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1357 ,  H01L2224/13655 ,  H01L2224/13671 ,  H01L2224/13672 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/81193 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/00012 ,  H01L2924/01029 ,  H01L2924/01083 ,  H01L2924/0103 ,  H01L2924/01047 ,  H01L2924/01082 ,  H01L2224/11

Abstract: A system and method for forming metal bumps is provided. An embodiment comprises attaching conductive material to a carrier medium and then contacting the conductive material to conductive regions of a substrate. Portions of the conductive material are then bonded to the conductive regions using a bonding process to form conductive caps on the conductive regions, and residual conductive material and the carrier medium are removed. A reflow process is used to reflow the conductive caps into conductive bumps.

Abstract translation: 提供一种用于形成金属凸块的系统和方法。 一个实施例包括将导电材料附着到载体介质上，然后将导电材料接触到基底的导电区域。 然后使用接合工艺将导电材料的部分结合到导电区域，以在导电区域上形成导电盖，并且去除残留的导电材料和载体介质。 回流工艺用于将导电盖重新流到导电凸块中。

公开(公告)号：US20130143364A1

公开(公告)日：2013-06-06

申请号：US13312395

申请日：2011-12-06

Applicant: Hsiu-Jen LIN ,  Chung-Shi LIU ,  Ming-Da CHENG ,  Chun-Cheng LIN ,  Yu-Peng TSAI ,  Cheng-Ting CHEN

Inventor： Hsiu-Jen LIN ,  Chung-Shi LIU ,  Ming-Da CHENG ,  Chun-Cheng LIN ,  Yu-Peng TSAI ,  Cheng-Ting CHEN

IPC: H01L21/58

Abstract: A method includes vacuum annealing on a substrate having at least one solder bump to reduce voids at an interface of the at least one solder bump. A die is mounted over the substrate.

Abstract translation: 一种方法包括在具有至少一个焊料凸块的衬底上进行真空退火以减少在至少一个焊料凸块的界面处的空隙。 模具安装在基板上。

公开(公告)号：US20130009307A1

公开(公告)日：2013-01-10

申请号：US13179299

申请日：2011-07-08

Applicant: Wen-Hsiung Lu ,  Ming-Da Cheng ,  Chih-Wei Lin ,  Yi-Wen Wu ,  Hsiu-Jen Lin ,  Chung-Shi Liu ,  Mirng-Ji Lii ,  Chen-Hua Yu

Inventor： Wen-Hsiung Lu ,  Ming-Da Cheng ,  Chih-Wei Lin ,  Yi-Wen Wu ,  Hsiu-Jen Lin ,  Chung-Shi Liu ,  Mirng-Ji Lii ,  Chen-Hua Yu

IPC: H01L23/498 ,  H01L21/60

CPC classification number: H01L24/03 ,  H01L21/566 ,  H01L21/76885 ,  H01L23/3114 ,  H01L23/3157 ,  H01L23/525 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/02311 ,  H01L2224/02331 ,  H01L2224/0235 ,  H01L2224/02375 ,  H01L2224/0346 ,  H01L2224/0347 ,  H01L2224/03903 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/05008 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05186 ,  H01L2224/05552 ,  H01L2224/05567 ,  H01L2224/05655 ,  H01L2224/05664 ,  H01L2224/11334 ,  H01L2224/11849 ,  H01L2224/1191 ,  H01L2224/13022 ,  H01L2224/13083 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00012 ,  H01L2924/01047 ,  H01L2924/01029 ,  H01L2924/00

Abstract: A method includes forming a passivation layer over a metal pad, which is overlying a semiconductor substrate. A first opening is formed in the passivation layer, with a portion of the metal pad exposed through the first opening. A seed layer is formed over the passivation layer and to electrically coupled to the metal pad. The seed layer further includes a portion over the passivation layer. A first mask is formed over the seed layer, wherein the first mask has a second opening directly over at least a portion of the metal pad. A PPI is formed over the seed layer and in the second opening. A second mask is formed over the first mask, with a third opening formed in the second mask. A portion of a metal bump is formed in the third opening. After the step of forming the portion of the metal bump, the first and the second masks are removed.

Abstract translation: 一种方法包括在覆盖在半导体衬底上的金属焊盘上形成钝化层。 在钝化层中形成第一开口，金属垫的一部分通过第一开口暴露。 种子层形成在钝化层之上并且电耦合到金属焊盘。 种子层还包括钝化层上的部分。 在种子层上形成第一掩模，其中第一掩模具有直接在金属焊盘的至少一部分上的第二开口。 在种子层和第二开口中形成PPI。 在第一掩模上形成第二掩模，第二掩模形成在第二掩模中。 金属凸块的一部分形成在第三开口中。 在形成金属凸块的部分的步骤之后，去除第一和第二掩模。

公开(公告)号：US20120178251A1

公开(公告)日：2012-07-12

申请号：US13004376

申请日：2011-01-11

Applicant: Zheng-Yi LIM ,  Yi-Wen WU ,  Wen-Hsiung LU ,  Chih-Wei LIN ,  Tzong-Huann YANG ,  Hsiu-Jen LIN ,  Ming-Da CHENG ,  Chung-Shi LIU

Inventor： Zheng-Yi LIM ,  Yi-Wen WU ,  Wen-Hsiung LU ,  Chih-Wei LIN ,  Tzong-Huann YANG ,  Hsiu-Jen LIN ,  Ming-Da CHENG ,  Chung-Shi LIU

IPC: H01L21/768

CPC classification number: H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L2224/0345 ,  H01L2224/0361 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/05027 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05186 ,  H01L2224/05572 ,  H01L2224/05647 ,  H01L2224/1145 ,  H01L2224/11452 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/1181 ,  H01L2224/11824 ,  H01L2224/11827 ,  H01L2224/11849 ,  H01L2224/1308 ,  H01L2224/13083 ,  H01L2224/13109 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13565 ,  H01L2224/1357 ,  H01L2224/13583 ,  H01L2224/13693 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/81191 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/12044 ,  H01L2924/1305 ,  H01L2924/1306 ,  H01L2924/14 ,  H01L2924/01047 ,  H01L2924/01024 ,  H01L2924/01028 ,  H01L2924/0105 ,  H01L2924/01079 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/01073 ,  H01L2924/01049 ,  H01L2924/0103 ,  H01L2924/01025 ,  H01L2924/01022 ,  H01L2924/01032 ,  H01L2924/01078 ,  H01L2924/01012 ,  H01L2924/01013 ,  H01L2924/0104 ,  H01L2924/01046 ,  H01L2924/01082 ,  H01L2924/01029 ,  H01L2924/01083 ,  H01L2924/01051 ,  H01L2224/03 ,  H01L2224/11 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/05552

Abstract: The disclosure relates to fabrication of to a metal pillar. An exemplary method of fabricating a semiconductor device comprises the steps of providing a substrate having a contact pad; forming a passivation layer extending over the substrate having an opening over the contact pad; forming a metal pillar over the contact pad and a portion of the passivation layer; forming a solder layer over the metal pillar; and causing sidewalls of the metal pillar to react with an organic compound to form a self-assembled monolayer or self-assembled multi-layers of the organic compound on the sidewalls of the metal pillar.

Abstract translation: 本公开涉及制造金属柱。 制造半导体器件的示例性方法包括以下步骤：提供具有接触焊盘的衬底; 形成在衬底上延伸的钝化层，该钝化层在接触焊盘上具有开口; 在所述接触焊盘和所述钝化层的一部分上形成金属柱; 在金属柱上形成焊料层; 并且使金属柱的侧壁与有机化合物反应，以在金属柱的侧壁上形成自组装单层或有机化合物的自组装多层。