Abstract:
A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.
Abstract:
An image acquisition method and system for use in transmission electron microscopy and capable of providing information about a wide range of frequency range. The method is initiated with setting at least one of the spherical aberration coefficient and chromatic aberration coefficient of the imaging system of the microscope to suppress attenuation of a contrast transfer function due to an envelope function. Then, an image is obtained by the imaging system placed in defocus conditions.
Abstract:
A system uses number of analytical devices such as an electron microscope a Raman microscope, an ion beam column and a scanning probe microscope for sample analysis concurrent, consecutive or with the mutual correlation of the analysis performed by the different devices in the same sample area using the connection of the Raman microscope optical objective lens and objective manipulator, that significantly reduces time needed for analyzing by Raman microscope together with other devices and maintains high quality of the sensed signals comparable to stand alone analytical devices.
Abstract:
A method of inspecting defects of a sample on a movable table includes a first step for, on a basis of position information of the defects which is previously detected by an other inspection system, driving the table so that the defects come into a viewing field of an optical microscope having a focus which is adjusted, a second step for re-detecting the defects to obtain a first detection result, a third step for correcting the position information of defects on a basis of position information of the re-detected defects, and a fourth step for reviewing the defects whose position information is corrected to obtain a second detection result. At the second step, re-detecting is performed using reflection light or scattered light from the sample which passes an optical filter which includes a light shielding portion and a light transmitting portion.
Abstract:
Provided is an inspection apparatus or observation apparatus enabling appropriate inspection or observation of a sample in an easy-to-use manner, using a charged-particle technique and an optical technique. Specifically, provided is an inspection or observation apparatus including: a first casing forming at least part of a first space constituting at least part of a region through which a primary charged-particle beam emitted from a charged-particle irradiation section reaches a sample, the first space capable of being maintained in a vacuum state; a second casing provided on the first casing to form at least part of a second space capable of storing the sample therein; a partition wall section for partitioning the first space and the second space from each other, the partition wall section disposed so as to be coaxial with the charged-particle irradiation section when the sample is irradiated with the primary charged-particle beam from the charged-particle irradiation section; and an optical observation section for casting light onto the sample and detecting light from the sample from the same direction as the charged-particle irradiation section.
Abstract:
Vapor is provided locally at a sample surface to allow fluorescence of the fluorescent markers in a vacuum chamber. For example, a nanocapillary can dispense a liquid near a region of interest, the liquid evaporating to increase the vapor pressure near the fluorescent markers. The increase in vapor pressure at the fluorescent marker is preferably sufficiently great to prevent deactivation or to reactivate the fluorescent marker, while the overall pressure in the vacuum chamber is preferably sufficiently low to permit charged particle beam operation with little or no additional evacuation pumping.
Abstract:
A method and apparatus for aligning a laser beam coincident with a charged particle beam. The invention described provides a method for aligning the laser beam through the center of an objective lens and ultimately targeting the eucentric point of a multi-beam system. The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber of the charged particle system.
Abstract:
A system includes a particle optical system and a photosensitive detector. The particle optical system includes a charged particle beam source and an objective lens. The charged particle beam source is configured to generate a charged particle beam that travels along a particle beam path, and the objective lens is configured to focus the particle beam onto an object plane of the particle optical system. The system is configured such that a light beam path of the system extends from the object plane to the photosensitive detector.
Abstract:
Observation fields of an electron microscope image and an optical magnifying observation image are smoothly switched. A magnifying observation apparatus includes: a pair of end-face plates closes end faces of a body portion; an electron beam imaging device mounted on a first position of a cylindrical shaped outer surface of the body portion; an optical imaging device mounted on a second position being different from the first position in the outer surface; a rotating device that rotates the both imaging devices along the outer surface such that a distance from each of the both imaging devices to a common rotation axis of the both imaging devices is kept constant and optical axes of the both imaging devices are oriented toward the rotation axis; a specimen stage that is disposed in the chamber, and arranged to a position that is substantially the same to a height of the rotation axis.
Abstract:
A detection device and a particle beam device having a detection device ensure a good efficiency in detecting interaction particles and electromagnetic radiation. The detection device has a detector for detecting electromagnetic radiation and/or interaction particles and a filter element through which the electromagnetic radiation is transmitted. The filter element prevents the interaction particles from striking the detector such that the filter element is situated to move between a first position and a second position, the filter element in the first position being situated in relation to the detector in such a way that the filter element prevents the interaction particles from striking the detector. The filter element in the second position is situated in relation to the detector in such a way that the filter element allows the interaction particles to strike the detector. As an alternative, the filter element may be an object holder.