SCANNING ELECTRON MICROSCOPE CAPABLE OF CONTROLLING BEAM SPOT AND MEASUREMENT METHOD USING THE SAME
    11.
    发明申请
    SCANNING ELECTRON MICROSCOPE CAPABLE OF CONTROLLING BEAM SPOT AND MEASUREMENT METHOD USING THE SAME 审中-公开
    用于控制光束的扫描电子显微镜和使用其的测量方法

    公开(公告)号:US20160268098A1

    公开(公告)日:2016-09-15

    申请号:US14404442

    申请日:2014-06-12

    Abstract: A scanning electron microscope capable of controlling the spot of an electron beam and a measurement method using the same. The scanning electron microscope includes electron magnets disposed in a path in which an electron beam irradiated to a sample moves from the electron beam source of the scanning electron microscope to a sample and configured to control and irradiate the spot of the electron beam in a linear electron beam having a different horizontal to vertical ratio. A control unit controls a ratio and direction of the spot of the electron beam by controlling a supply voltage of the electron magnets.

    Abstract translation: 能够控制电子束点的扫描型电子显微镜及使用其的测定方法。 扫描电子显微镜包括设置在照射到样品的电子束从扫描电子显微镜的电子束源移动到样品的路径中的电子磁体,并且被配置为控制和照射电子束的点在线性电子 横梁具有不同的水平与垂直比。 控制单元通过控制电子磁体的电源电压来控制电子束点的比率和方向。

    Method of operating a charged particle microscope and charged particle microscope operating according to such method
    12.
    发明授权
    Method of operating a charged particle microscope and charged particle microscope operating according to such method 有权
    根据这种方法操作带电粒子显微镜和带电粒子显微镜的方法

    公开(公告)号:US09437394B1

    公开(公告)日:2016-09-06

    申请号:US14228391

    申请日:2014-03-28

    Abstract: A method of operating a charged particle microscope comprises: providing settings of a focus, an x-stigmator and an y-stigmator of the charged particle microscope; and then repeatedly performing adjusting the charged particle microscope to the settings, recording an image of an object using the settings, determining a sharpness measure from the recorded image, and changing at least one of the settings of the focus, the x-stigmator and the y-stigmator based on the sharpness measure until a stop criterion is fulfilled. Herein, the determining of the sharpness measure comprises: determining an orientation of an intensity gradient at each of a plurality of locations within one of the recorded image and a processed image generated by processing the recorded image, and determining the sharpness measure based on the plurality of determined orientations.

    Abstract translation: 操作带电粒子显微镜的方法包括:提供带电粒子显微镜的焦点,x-标示器和y-标示符的设置; 然后重复执行调整带电粒子显微镜的设置,使用设置记录对象的图像,从所记录的图像确定锐度度量,并且改变焦点的设置中的至少一个,x标记符和 基于锐度测量的y-stigmator直到达到停止标准。 这里,清晰度测量的确定包括:确定记录图像之一内的多个位置中的每个位置处的强度梯度的方向和通过处理记录图像而生成的处理图像,以及基于多个 确定的方向。

    Method for image outlier removal for transmission electron microscope cameras
    13.
    发明授权
    Method for image outlier removal for transmission electron microscope cameras 有权
    用于透射电子显微镜相机的图像异常去除方法

    公开(公告)号:US09415095B2

    公开(公告)日:2016-08-16

    申请号:US14814435

    申请日:2015-07-30

    Applicant: Paul Mooney

    Inventor: Paul Mooney

    Abstract: Methods are disclosed for removal of outlier pixels from a transmission electron microscopy camera image. One exemplary method includes establishing a desired exposure of n electrons per pixel; exposing the camera to a series of sub-frame exposures to produce a series of sub-frame images; calculating an average image signal of all sub-frame exposures in said series; establishing a threshold selected to achieve a desired number of false positives; evaluating each of said sub-frame exposures for pixels further away from said average than said threshold; and replacing pixels in each of said sub-frame images that exceed said threshold with said average to form corrected sub-frame images.

    Abstract translation: 公开了用于从透射电子显微镜相机图像中去除异常值像素的方法。 一个示例性方法包括建立每个像素n个电子的期望曝光; 将相机曝光到一系列子帧曝光以产生一系列子帧图像; 计算所述系列中所有子帧曝光的平均图像信号; 建立一个选择的阈值以达到所需数量的假阳性; 针对比所述阈值更远离所述平均值的像素评估所述子帧曝光中的每一个; 以及用所述平均值替换超过所述阈值的每个所述子帧图像中的像素,以形成校正的子帧图像。

    Electron Microscope
    14.
    发明申请
    Electron Microscope 有权
    电子显微镜

    公开(公告)号:US20160225581A1

    公开(公告)日:2016-08-04

    申请号:US15022436

    申请日:2014-10-31

    Abstract: To improve the workability of the task of adjusting the position of a limit field diaphragm. An electron microscope provided with an image-capturing means for capturing an image of an observation visual field prior to insertion of a limit field diaphragm as a map image, a recording means for recording the map image, an extraction means for capturing an image of the observation visual field after insertion of the limit field diaphragm and extracting the outline of the diaphragm, a drawing means for drawing the outline on the map image, and a display means for displaying the image drawn by the drawing means.

    Abstract translation: 提高调节极限场隔膜位置任务的可操作性。 一种具有图像捕获装置的电子显微镜,其用于在作为地图图像的极限场光阑插入之前捕获观察视野的图像,用于记录地图图像的记录装置,用于拍摄图像的图像的提取装置 插入极限视场光阑并提取光阑的轮廓之后的观察视野,用于在地图图像上绘制轮廓的绘图装置,以及显示由绘图装置绘制的图像的显示装置。

    DETERMINATION OF SPATIAL DISTRIBUTION OF CHARGED PARTICLE BEAMS
    15.
    发明申请
    DETERMINATION OF SPATIAL DISTRIBUTION OF CHARGED PARTICLE BEAMS 有权
    充电颗粒物空间分布的确定

    公开(公告)号:US20160180190A1

    公开(公告)日:2016-06-23

    申请号:US14978845

    申请日:2015-12-22

    Abstract: A point spread function (PSF) of a focused scanning particle beam of an observation instrument is ascertained by obtaining a first image (reference image) based on a reference instrument, the reference image being an image of an area of a reference standard, obtaining a second image (observed image) of the area of the reference standard, and the observed image obtained using the observation instrument configured with a set of operational parameters that define a probe size for the observation instrument, the probe size being larger than a pixel size of the reference image, and then determining, based on the reference image and the observed image, the PSF of the observation instrument as a component of a convolution of the reference image that provides the observed image.

    Abstract translation: 通过获得基于参考仪器的第一图像(参考图像),参考图像是参考标准的区域的图像来获得观察仪器的聚焦扫描粒子束的点扩散函数(PSF),获得 参考标准区域的第二图像(观察图像)和使用配置有一组限定观察仪器的探针尺寸的操作参数的观察仪器获得的观察图像,探头尺寸大于 参考图像,然后基于参考图像和观察图像将观察仪器的PSF确定为提供观察图像的参考图像的卷积的分量。

    Certified wafer inspection
    16.
    发明授权

    公开(公告)号:US09324541B1

    公开(公告)日:2016-04-26

    申请号:US14547111

    申请日:2014-11-18

    Abstract: A method for certifying an inspection system using a calibrated surface, comprising: acquiring a calibrated list from said calibrated surface, with said calibrated list comprising information about features located on said calibrated surface; inspecting said calibrated surface with said inspection system to generate an estimated list, with said estimated list comprising information about features located on said calibrated surface; generating a matched list by searching for the presence of one or more calibrated features in said estimated list, wherein said calibrated features are listed in said calibrated list; computing an estimated characteristic parameter from said matched list, wherein said estimated characteristic parameter quantifies features in said matched list having a unifying characteristic; and comparing said estimated characteristic parameter with a calibrated characteristic parameter, wherein said calibrated characteristic parameter quantifies features in said calibrated list having said unifying characteristic, whereby the ability of said inspection system to detect features with one or more characteristics is certified. A system and method for imaging a surface to generate an adaptive resolution image, comprising: determining a weakly scattering feature, wherein said weakly scattering feature produces a weak image response to be resolved by said adaptive resolution image; determining a coarse spot size such that said weakly scattering feature is detected in an image captured with said coarse spot size; capturing a coarse image of region with said coarse spot size, wherein said coarse image of region comprises one or more pixels corresponding to a predetermined region of said surface; classifying said coarse image of region into a coarse image of feature and a coarse image of surface, wherein a feature is detected in said coarse image of feature and a feature is not detected in said coarse image of surface; estimating a feature position from said coarse image of feature, wherein said feature position is the location of feature on said surface; capturing a fine image of feature at said feature position, wherein said fine image of feature is captured with a fine spot size having a smaller spot size than said coarse spot size; and combining said fine image of feature and said coarse image of surface to generate said adaptive resolution image, whereby feature regions are captured with finer resolution than featureless surface regions in said adaptive resolution image.

    Charged particle beam device
    17.
    发明授权
    Charged particle beam device 有权
    带电粒子束装置

    公开(公告)号:US09324540B2

    公开(公告)日:2016-04-26

    申请号:US14407117

    申请日:2013-04-12

    Abstract: When a signal electron is detected by energy selection by combining and controlling retarding and boosting for observation of a deep hole, etc., the only way for focus adjustment is to use a change in magnetic field of an objective lens. However, since responsiveness of the change in magnetic field is poor, throughput reduces. A charged particle beam device includes: an electron source configured to generate a primary electron beam; an objective lens configured to focus the primary electron beam; a deflector configured to deflect the primary electron beam; a detector configured to detect a secondary electron or a reflection electron generated from a sample by irradiation of the primary electron beam; an electrode having a hole through which the primary electron beam passes; a voltage control power supply configured to apply a negative voltage to the electrode; and a retarding voltage control power supply configured to generate an electric field, which decelerates the primary electron beam, on the sample by applying the negative voltage to the sample, wherein the charged particle beam device performs focus adjustment while an offset between the voltage applied to the electrode and the voltage applied to the sample is being kept constant.

    Abstract translation: 当通过组合并控制用于观察深孔等的延迟和升压来进行能量选择来检测信号电子时,聚焦调整的唯一方式是使用物镜的磁场变化。 然而,由于磁场变化的响应性差,吞吐量降低。 带电粒子束装置包括:电子源,被配置为产生一次电子束; 配置成聚焦一次电子束的物镜; 偏转器,被配置为偏转所述一次电子束; 检测器,被配置为通过一次电子束的照射来检测从样品产生的二次电子或反射电子; 具有一次电子束通过的孔的电极; 电压控制电源,被配置为向所述电极施加负电压; 以及延迟电压控制电源,被配置为通过向样本施加负电压来产生使样品上的一次电子束减速的电场,其中带电粒子束装置执行焦点调整,同时施加到 施加到样品的电极和电压保持恒定。

    CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE
    18.
    发明申请
    CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE 有权
    带特殊孔板的充电颗粒显微镜

    公开(公告)号:US20160111247A1

    公开(公告)日:2016-04-21

    申请号:US14884520

    申请日:2015-10-15

    Applicant: FEI Company

    Abstract: A Charged Particle Microscope, comprising: includes A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; and A detector, for detecting a flux of radiation emanating from the specimen in response to said irradiation. The illuminator includes: An aperture plate comprising an aperture region in a path of said beam, for defining a geometry of the beam prior to its impingement upon said specimen. The aperture region includes a distribution of multiple holes, each of which is smaller than a diameter of the beam incident on the aperture plate.

    Abstract translation: 带电粒子显微镜,包括:包括用于保持样本的样本保持器; 用于生产带电粒子束的源头; 用于引导所述光束以照射所述样本的照明器; 和A检测器,用于响应于所述照射来检测从样品发出的辐射通量。 照明器包括:孔板,其包括在所述梁的路径中的孔区域,用于在其撞击到所述样本之前限定所述梁的几何形状。 开口区域包括多个孔的分布,每个孔小于入射在孔板上的束的直径。

    Energy Filter for Charged Particle Beam Apparatus
    19.
    发明申请
    Energy Filter for Charged Particle Beam Apparatus 有权
    带电粒子束能量滤波器

    公开(公告)号:US20160035533A1

    公开(公告)日:2016-02-04

    申请号:US14800098

    申请日:2015-07-15

    Abstract: This invention provides two methods for improving performance of an energy-discrimination detection device with an energy filter of reflective type for a charged particle beam. The first method employs a beam-adjusting means to improve the energy-discrimination power, and the second method uses an electron-multiplication means to enhance the image signal without noise raise. A LVSEM with such an improved energy-discrimination detection device can provide variant high-contrast images of interested features on a specimen surface for multiple application purposes.

    Abstract translation: 本发明提供了两种用于利用带电粒子束的反射型能量滤波器来改善能量鉴别检测装置的性能的方法。 第一种方法采用光束调节装置来提高能量鉴别能力,第二种方法使用电子倍增装置来增强图像信号而没有噪声提高。 具有这种改进的能量鉴别检测装置的LVSEM可以在样本表面上提供用于多种应用目的的感兴趣特征的变体高对比度图像。

    Generation of charged particle vortex waves
    20.
    发明授权
    Generation of charged particle vortex waves 有权
    带电粒子涡流的产生

    公开(公告)号:US09153412B2

    公开(公告)日:2015-10-06

    申请号:US14367487

    申请日:2012-12-19

    Abstract: A device is arranged for imparting an orbital angular momentum to a charged particle wave propagating along an axis in a charged particle beam generating apparatus. The device includes a first conductive element comprising a plurality of angularly spaced electrical conductors arranged around the axis, and a second conductive element. The first and second conductive elements are spaced apart along the direction of the axis, and are adapted for transmitting a charged particle wave propagating along the axis. A connecting means is adapted for supplying an electrical potential to the plurality of angularly spaced electrical conductors for inducing an angular gradient of the phase of the charged particle wave when transmitted along the axis, in which the projection along the axis of the electrical potential varies as a function of an angular position with respect to the axis.

    Abstract translation: 一种装置被布置用于对带电粒子束产生装置中沿着轴传播的带电粒子波施加轨道角动量。 所述装置包括第一导电元件,所述第一导电元件包括​​绕所述轴线布置的多个角度间隔的电导体和第二导电元件。 第一和第二导电元件沿着轴线的方向间隔开,并且适于传输沿轴线传播的带电粒子波。 连接装置适于为多个角度间隔的电导体提供电势,用于当沿轴线传输时引起带电粒子波相位的角度梯度,其中沿电位轴的突起变化为 相对于轴的角度位置的函数。

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