公开(公告)号：US10037864B2

公开(公告)日：2018-07-31

申请号：US15594712

申请日：2017-05-15

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus

IPC: G03B27/52 ,  H01J37/09 ,  H01J37/30 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/302

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

Abstract: The invention relates to a charged particle beam generator. The generator may comprise a high voltage shielding arrangement (201) for shielding components outside the shielding arrangement from high voltages within the shielding arrangement, and a vacuum pump (220) located outside the shielding arrangement for regulating a pressure of a space within the shielding arrangement. The generator may comprise a collimator system with a cooling arrangement (405a/407a-407b/405b) comprising cooling channels inside electrodes of the collimator system.

公开(公告)号：US20180182593A1

公开(公告)日：2018-06-28

申请号：US15854303

申请日：2017-12-26

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Hiroshi YAMASHITA ,  Kenichi KATAOKA

IPC: H01J37/09 ,  H01J37/317

CPC classification number: H01J37/09 ,  H01J37/3177

Abstract: In one embodiment, an aperture set for a multi-beam includes a shaping aperture array in which a plurality of first openings are formed, a region including the plurality of first openings is irradiated with a charged particle beam discharged from a discharge unit, and portions of the charged particle beam pass through the plurality of respective first openings to form a multi-beam, a first shield plate in which a plurality of second openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings, passes, and a blanking aperture array in which a plurality of third openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings and the plurality of second openings, passes. The second openings are wider than the first openings.

公开(公告)号：US20180130634A1

公开(公告)日：2018-05-10

申请号：US15620144

申请日：2017-06-12

Applicant: JEOL Ltd.

Inventor： Yukihito Kondo ,  Ryusuke Sagawa

IPC: H01J37/22 ,  H01J37/147 ,  H01J37/28 ,  H01J37/09 ,  H01J37/04

CPC classification number: H01J37/22 ,  H01J37/045 ,  H01J37/09 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/24475 ,  H01J2237/2449 ,  H01J2237/28 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: There is provided an electron microscope capable of recording images in a shorter time. The electron microscope (100) includes: an illumination system (4) for illuminating a sample (S) with an electron beam; an imaging system (6) for focusing electrons transmitted through the sample (S); an electron deflector (24) for deflecting the electrons transmitted through the sample (S); an imager (28) having a photosensitive surface (29) for detecting the electrons transmitted through the sample (S), the imager (28) being operative to record focused images formed by the electrons transmitted through the sample (S); and a controller (30) for controlling the electron deflector (24) such that an active electron incident region (2) of the photosensitive surface (29) currently hit by the beam is varied in response to variations in illumination conditions of the illumination system (4).

公开(公告)号：US20180130632A1

公开(公告)日：2018-05-10

申请号：US15797588

申请日：2017-10-30

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA ,  Hirofumi MORITA

IPC: H01J37/09 ,  H01J37/317 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/09 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3174

Abstract: A multi-beam optical system adjustment method includes forming multi-beams by making a region including the whole of a plurality of openings in a shaping aperture array substrate irradiated by a charged particle beam, and making portions of the charged particle beam individually pass through a corresponding one of the plurality of openings, measuring a distortion of the multi-beams while variably changing the crossover height position of the multi-beams, measuring the crossover height position of the multi-beams where the distortion of the multi-beams is smaller than the others, and adjusting the height position of a limiting aperture substrate which limits passage of a beam deviated from the trajectory in the multi-beams to the crossover height position.

公开(公告)号：US09934943B2

公开(公告)日：2018-04-03

申请号：US14787775

申请日：2014-05-05

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Vincent Sylvester Kuiper ,  Erwin Slot

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/09 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.

公开(公告)号：US09922796B1

公开(公告)日：2018-03-20

申请号：US15366455

申请日：2016-12-01

Applicant: APPLIED MATERIALS ISRAEL LTD. ,  Technische Universiteit Delft

Inventor： Jürgen Frosien ,  Pieter Kruit

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/145 ,  H01J37/09 ,  H01J37/22

CPC classification number: H01J37/145 ,  H01J37/09 ,  H01J37/1474 ,  H01J37/153 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2817

Abstract: A method for inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device having an optical axis. The method includes generating a primary charged particle beam; illuminating a multi-aperture lens plate with the primary charged particle beam to generate the array of primary charged particle beamlets; and correcting a field curvature of the charged particle beam device with a first and a second field curvature correction electrode. The method further includes applying a voltage to the first and to the second field curvature correction electrode. At least one of the field strength provided by the first and the second field curvature correction electrode varies in a plane perpendicular to the optical axis of the charged particle beam device. The method further includes focusing the primary charged particle beamlets on separate locations on the specimen with an objective lens.

公开(公告)号：US20180040453A1

公开(公告)日：2018-02-08

申请号：US15665839

申请日：2017-08-01

Applicant: NuFlare Technology, Inc.

Inventor： Tsubasa NANAO ,  Yukitaka Shimizu

IPC: H01J37/09 ,  H01J37/304 ,  H01J37/20 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/09 ,  H01J37/045 ,  H01J37/20 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/153 ,  H01J2237/24475 ,  H01J2237/30472

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an emitter that emits a charged particle beam, an aperture plate in which a plurality of openings are formed and that forms multiple beams by allowing the charged particle beam to pass through the plurality of openings, a blanking plate provided with a plurality of blankers that each perform blanking deflection on a corresponding beam included in the multiple beams, a stage on which a substrate irradiated with the multiple beams, a detector that detects a reflection charged particle from the substrate, feature amount calculation circuitry that calculates a feature amount of an aperture image based on a detection value of the detector, and aberration correction circuitry that corrects aberration of the charged particle beam based on the feature amount.

公开(公告)号：US20170294288A1

公开(公告)日：2017-10-12

申请号：US15630199

申请日：2017-06-22

Applicant: Arcam AB

Inventor： Tomas Lock

IPC: H01J37/304 ,  H01J37/244 ,  H01J37/30 ,  B29C67/00 ,  H01J37/09 ,  B23K15/00 ,  B33Y40/00 ,  B28B1/00 ,  G01T1/29 ,  H01J37/305

Abstract: A device for detecting X-rays radiated out of a substrate surface, said device comprising at least one X-ray detector, a resolver grating and a modulator grating, said resolver grating with at least one opening facing towards said X-ray detector is arranged in front of said X-ray detector. Said modulator grating is provided between said resolver grating and said substrate at a predetermined distance from said resolver grating and said substrate, where said modulator grating having a plurality of openings in at least a first direction, wherein said x-rays from said surface is spatially modulated with said modulator grating and resolver grating.

公开(公告)号：US20170148608A1

公开(公告)日：2017-05-25

申请号：US14947723

申请日：2015-11-20

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Pavel Adamec

IPC: H01J37/09 ,  H01J37/28

CPC classification number: H01J37/09 ,  H01J2237/0264 ,  H01J2237/28

Abstract: A housing device for providing a magnetic shielding of a charged particle beam is described. The housing device includes a housing element configured to at least partially enclose a charged particle beam propagation path and comprising a magnetic shielding material, wherein the housing element includes an inner surface directed toward the charged particle beam propagation path, an outer surface directed away from the charged particle beam propagation path and at least one edge region with an edge surface connecting the inner surface with the outer surface; and a contacting element comprising a conductive material and fixed to the at least one edge region in at least one of a form-fit connection and a bonded connection. Further, a housing arrangement including two or more electrically contacting housing devices, a charged particle beam device with a housing device, and methods of manufacturing a housing device are described.

公开(公告)号：US20170084421A1

公开(公告)日：2017-03-23

申请号：US15245765

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Richard R. Simmons ,  Doug K. Masnaghetti ,  Rainer Knippelmeyer

IPC: H01J37/04 ,  H01J37/244 ,  H01J37/09 ,  H01J37/22

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/057 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2805

Abstract: Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.