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    SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION
    5.
    发明申请
    SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION 有权
    硫酸钠，光酸发生器和感光树脂组合物

    公开(公告)号：US20110300482A1

    公开(公告)日：2011-12-08

    申请号：US13202044

    申请日：2010-02-04

    申请人： Issei Suzuki ,  Hideki Kimura

    发明人： Issei Suzuki ,  Hideki Kimura

    IPC分类号： G03F7/004 ,  C07C317/10 ,  C07F9/92 ,  C07F5/02 ,  G03F7/20 ,  C07F9/06

    CPC分类号： C07C381/12 ,  B33Y70/00 ,  C08F2/50 ,  C08G59/687 ,  C08K5/375 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0397

    摘要： There is provided a sulfonium salt having high photosensitivity to the i-line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy(poly) alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m1 to m6 each represent the number of occurrences of each of R1 to R6, m1, m4, and m6 each represent an integer of 0 to 5, m2, m3, and m5 each represent an integer of 0 to 4, and X− represents a monovalent polyatomic anion].

    摘要翻译： 提供了对i线具有高光敏性的锍盐。 本发明涉及由下述式（1）表示的锍盐：[式（1）中，R 1至R 6各自独立地表示烷基，羟基，烷氧基，烷基羰基，芳基羰基， 烷氧基羰基，芳氧基羰基，芳硫基羰基，酰氧基，芳硫基，烷硫基，芳基，杂环烃基，芳氧基，烷基亚磺酰基，芳基亚磺酰基，烷基磺酰基，芳基磺酰基 基团，羟基（聚）亚烷基氧基，任选取代的氨基，氰基，硝基或卤素原子，m1至m6各自表示R1至R6，m1，m4和 m6各自表示0〜5的整数，m 2，m 3，m 5表示0〜4的整数，X表示1价多元阴离子]。

    Novel sulfur compounds and intermolecular compounds containing the same as the component compounds
    9.
    发明申请
    Novel sulfur compounds and intermolecular compounds containing the same as the component compounds 有权
    含有与组分化合物相同的新型硫化合物和分子间化合物

    公开(公告)号：US20030130358A1

    公开(公告)日：2003-07-10

    申请号：US10221757

    申请日：2002-09-12

    发明人： Ryu Sato ,  Hiroshi Suzuki

    IPC分类号： A61K031/095 ,  C07C317/10

    CPC分类号： A01N41/04 ,  A01N25/22 ,  A01N31/08 ,  A01N31/14 ,  A01N37/36 ,  A01N41/02 ,  A01N41/10 ,  C07C309/86 ,  C07C317/14 ,  C07C321/26 ,  C07C321/28 ,  C07C323/60 ,  C08G59/4064 ,  C11B9/0034

    摘要： The invention aims at providing novel sulfur compounds, molecular compounds containing the same as the component compound, and so on. The above aim is achieved by using sulfur compounds of the general formula (I) wherein Rs are each independently hydrogen, optionally substituted C1-6 alkyl, optionally substituted C2-6 alkenyl, optionally substituted aryl, chloro, or bromo; m is an integer of 0, 1, or 2; and Z is a group represented by any of the general formulae (II) to (V) (wherein R and m are each as defined above; W is hydrogen or C1-6 alkyl; and Y is a direct bond, C1-3 alkylene, or phenylene). 1

    摘要翻译： 本发明旨在提供新的硫化合物，含有与组分化合物相同的分子化合物等。 上述目的通过使用通式（I）的硫化合物，其中R 5各自独立地为氢，任选取代的C 1-6烷基，任选取代的C 2-6烯基，任选取代的芳基，氯或溴; m是0,1或2的整数; Z是由通式（II）〜（V）中的任一个表示的基团（其中R和m各自如上所定义; W是氢或C 1-6烷基; Y是直接键，C 1-3亚烷基 ，或亚苯基）。