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    LINE NARROWED LASER APPARATUS
    1.
    发明申请
    LINE NARROWED LASER APPARATUS 审中-公开

    公开(公告)号：US20180323568A1

    公开(公告)日：2018-11-08

    申请号：US16033030

    申请日：2018-07-11

    申请人： Gigaphoton Inc.

    发明人： Hiroshi FURUSATO ,  Takeshi OHTA ,  Natsuhiko KOUNO ,  Osamu WAKABAYASHI ,  Takahito KUMAZAKI

    IPC分类号： H01S3/11 ,  H01S3/134 ,  H01S3/08 ,  H01S3/22 ,  H01S3/038 ,  H01S3/034

    CPC分类号： H01S3/11 ,  H01S3/034 ,  H01S3/038 ,  H01S3/08009 ,  H01S3/134 ,  H01S3/137 ,  H01S3/2207 ,  H01S3/2222

    摘要： The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply a pulsed voltage to the pair of electrodes, a wavelength-selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, a wavelength variable unit configured to change a selected wavelength selected by the wavelength-selecting element, and a controller. The controller is configured to control the wavelength variable unit based on an amount of control of the spectral width varying unit in a period from a time of ending the first burst oscillation to a time of starting the second burst oscillation.

    Gas laser oscillator capable of controlling gas pressure and gas consumption amount
    2.
    发明授权
    Gas laser oscillator capable of controlling gas pressure and gas consumption amount 有权
    气体激光振荡器能够控制气体压力和气体消耗量

    公开(公告)号：US09331449B2

    公开(公告)日：2016-05-03

    申请号：US14797735

    申请日：2015-07-13

    申请人： FANUC CORPORATION

    发明人： Munekazu Matsuda ,  Hiroyuki Yoshida

    IPC分类号： H01S3/22 ,  H01S3/036 ,  H01S3/223 ,  H01S3/225

    CPC分类号： H01S3/036 ,  H01S3/10069 ,  H01S3/104 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/2215 ,  H01S3/2222 ,  H01S3/2232 ,  H01S3/2237 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

    摘要： A gas laser oscillator includes a first control valve for controlling an amount of laser gas supplied into a gas container, a second control valve for controlling an amount of laser gas exhausted from the gas container, and a controller for controlling openings of the first and second control valves. The controller includes a storage unit for storing data indicating a relationship between the laser gas pressure in the gas container, the opening of the second control valve, and the exhaust amount of laser gas, a gas pressure control unit for controlling the openings of the first and second control valves, respectively, such that the laser gas pressure becomes closer to a reference gas pressure, and a gas consumption amount control unit for controlling the openings of the first and second control valves, respectively, such that the exhaust amount of laser gas becomes closer to a target consumption amount.

    摘要翻译： 气体激光振荡器包括用于控制供给到气体容器中的激光气体的量的第一控制阀，用于控制从气体容器排出的激光气体的量的第二控制阀，以及用于控制第一和第二 控制阀。 控制器包括存储单元，用于存储表示气体容器中的激光气体压力，第二控制阀的开度与激光气体的排出量之间的关系的数据;气体压力控制单元，用于控制第一 和第二控制阀，使得激光气体压力变得更接近参考气体压力;以及气体消耗量控制单元，用于分别控制第一和第二控制阀的开口，使得激光气体的排气量 变得更接近目标消费量。

    SUB 200NM LASER PUMPED HOMONUCLEAR EXCIMER LASERS
    3.
    发明申请
    SUB 200NM LASER PUMPED HOMONUCLEAR EXCIMER LASERS 有权
    SUB 200NM激光泵浦红外激光激光器

    公开(公告)号：US20150168847A1

    公开(公告)日：2015-06-18

    申请号：US14571100

    申请日：2014-12-15

    申请人： KLA-Tencor Corporation

    发明人： Richard W. Solarz ,  llya Bezel ,  Anatoly Shchemelinin

    IPC分类号： G03F7/20 ,  H01S3/094

    CPC分类号： H01S3/094 ,  H01S3/036 ,  H01S3/094042 ,  H01S3/094053 ,  H01S3/0941 ,  H01S3/2207 ,  H01S3/225

    摘要： Disclosed are methods and apparatus for generating a sub-200 nm continuous wave (cw) laser. A laser apparatus includes a chamber for receiving at least a rare gas or rare gas mixtures and a pump laser source for generating at least one cw pump laser focused in the chamber for generating at least one laser-sustained plasma in the chamber. The laser apparatus further includes a system for forming an optical cavity in which the at least one laser-sustained plasma serves as an excitation source for producing at least one cw laser having a wavelength that is below about 200 nm. In one aspect, the at least one laser-sustained plasma has a shape that substantially matches a shape of the optical cavity.

    摘要翻译： 公开了用于产生亚200nm连续波（cw）激光的方法和装置。 激光装置包括用于至少接收稀有气体或稀有气体混合物的腔室和用于产生聚集在腔室中的至少一个cw泵激光器的泵激光源，用于在腔室中产生至少一个激光持续等离子体。 激光装置还包括用于形成光腔的系统，其中所述至少一个激光持续等离子体用作用于产生至少一个具有低于约200nm的波长的cw激光的激发源。 在一个方面，所述至少一个激光维持等离子体具有基本上与所述光腔的形状相匹配的形状。

    Gas discharge laser light source beam delivery unit
    7.
    发明授权
    Gas discharge laser light source beam delivery unit 有权
    气体放电激光光源射束单元

    公开(公告)号：US07190707B2

    公开(公告)日：2007-03-13

    申请号：US10739961

    申请日：2003-12-17

    申请人： Palash P. Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Kyle Webb

    发明人： Palash P. Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Kyle Webb

    IPC分类号： H01S3/22

    CPC分类号： B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/04 ,  G01J1/0418 ,  G01J1/4257 ,  G01J2001/0285 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

    摘要： A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery pat. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.

    摘要翻译： 公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光光脉冲束传送 从气体放电激光器的输出拍摄到使用包含在输出激光脉冲光束中的光的工作装置的输入; 可操作地连接到射束输送罩的清洗机构; 外壳内的原位波束参数监视和调节机构，包括可伸缩的豆重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在外壳内的光束衰减器单元，其可调节地安装在外壳内用于定位在光束输送光点内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块 每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。 可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。 可以提供外部运动学对准工具。 公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

    Discharge laser with porous layer covering anode discharge surface
    9.
    发明授权
    Discharge laser with porous layer covering anode discharge surface 有权
    放电激光与多孔层覆盖阳极放电表面

    公开(公告)号：US07046713B2

    公开(公告)日：2006-05-16

    申请号：US10684089

    申请日：2003-10-10

    申请人： Richard G. Morton

    发明人： Richard G. Morton

    IPC分类号： H01S3/97 ,  H01S3/22

    CPC分类号： H01S3/225 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0388 ,  H01S3/041 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0979 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223

    摘要： A gas discharge laser having an elongated cathode and an elongated anode with a porous insulating layer covering the anode discharge surface. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges. In preferred embodiments at least a portion of the anode is comprised of lead, and fluorine ion sputtering of the anode surface creates the insulating layer (over the discharge surface of the anode) comprised in large part of lead fluoride. In a particular preferred embodiment the anode is fabricated in two parts, a first part having the general shape of a prior art anode with a trench shaped cavity at the top and a second part comprised of lead rich brass and disposed in the trench shape cavity.

    摘要翻译： 一种气体放电激光器，其具有细长阴极和具有覆盖阳极放电表面的多孔绝缘层的细长阳极。 脉冲功率系统以至少1KHz的速率提供电脉冲。 鼓风机以至少5m / s的速度在电极之间循环激光气体，并且提供热交换器以去除由鼓风机和排出物产生的热量。 在优选实施例中，阳极的至少一部分由铅构成，并且阳极表面的氟离子溅射产生大部分氟化铅所包含的绝缘层（在阳极的排放表面上）。 在特别优选的实施例中，阳极制造成两部分，第一部分具有现有技术阳极的一般形状，在顶部具有沟槽形空腔，第二部分由富含铅的黄铜组成并设置在沟槽形腔中。