公开(公告)号：US20180254596A1

公开(公告)日：2018-09-06

申请号：US15752976

申请日：2016-08-18

Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  Universite de Lille

Inventor： Jean-François Lampin ,  Antoine Pagies

IPC: H01S3/0943 ,  F21V8/00 ,  H01S3/22

CPC classification number: H01S3/0943 ,  G02B6/0006 ,  G02B6/0008 ,  H01S1/06 ,  H01S3/0941 ,  H01S3/22 ,  H01S3/223 ,  H01S5/005 ,  H01S5/3401 ,  H01S2302/02

Abstract: A terahertz laser suitable for emitting at least one first electromagnetic radiation, a first emission frequency of which is between 700 and 1200 GHz. The laser comprises an infrared laser source and a resonant cavity arranged to be optically pumped by the infrared laser source, the resonant cavity containing ammonia gas as an amplifier medium and having at least one configuration in which the resonant cavity is a resonant cavity at the first emission frequency. The infrared laser source is a continuous semiconductor laser source capable of exciting molecules of the amplifier medium from an initial energy level to at least one first excited energy level, the molecules of the amplifier medium placed in the first energy level being able to relax through a pure inversion transition for which the relaxation energy corresponds to the first emission frequency.

公开(公告)号：US20170077666A1

公开(公告)日：2017-03-16

申请号：US15264985

申请日：2016-09-14

Applicant: FANUC CORPORATION

Inventor： Risa Ito ,  Tetsuhisa Takazane ,  Yuji Nishikawa

IPC: H01S3/041 ,  H01S3/04 ,  H01S3/036

CPC classification number: H01S3/041 ,  H01S3/036 ,  H01S3/04 ,  H01S3/0405 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/22 ,  H01S3/2232

Abstract: A laser oscillator comprises a heat exchanger which cools a gas medium. The heat exchanger includes a cooling part which performs heat exchange between the gas medium and a cooling medium, a tubular member fixed to a frame body, and a foreign matter collection container. The tubular member is disposed so that the gas medium which flows out of the cooling part moves along an outer surface of the tubular member and then changes a proceeding direction to flow into an inlet portion. The foreign matter collection container collects foreign matters which are separated from a flow of the gas medium.

Abstract translation: 激光振荡器包括冷却气体介质的热交换器。 热交换器包括在气体介质和冷却介质之间进行热交换的冷却部件，固定到框体的管状部件和异物收集容器。 管状构件被设置成使得从冷却部分流出的气体介质沿管状构件的外表面移动，然后改变前进方向以流入入口部分。 异物收集容器收集与气体介质的流动分离的异物。

公开(公告)号：US08238392B2

公开(公告)日：2012-08-07

申请号：US12710722

申请日：2010-02-23

Applicant: Yukio Watanabe ,  Hideyuki Hayashi ,  Kouji Kakizaki ,  Michio Shinozaki ,  Hideo Hoshino

Inventor： Yukio Watanabe ,  Hideyuki Hayashi ,  Kouji Kakizaki ,  Michio Shinozaki ,  Hideo Hoshino

IPC: H01S3/00 ,  H01S3/04 ,  H01S3/22 ,  H01S3/223

CPC classification number: H01S3/0407 ,  F25B2400/06 ,  F25D17/02 ,  H01S3/03 ,  H01S3/041 ,  H01S3/22

Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.

Abstract translation: 一种用于气体激光器的温度控制器，其控制多个温度控制装置的温度，包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比，第一温度控制部分与低温或高温的温度控制相比，包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分，产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统， 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。

公开(公告)号：US20080304522A1

公开(公告)日：2008-12-11

申请号：US11730065

申请日：2007-03-29

Applicant: Randell L. Mills

Inventor： Randell L. Mills

IPC: H01S3/30

CPC classification number: H01S3/0959 ,  H01S3/22

Abstract: Provided is a laser based on the formation of an inverted population in an atom or ion of an element wherein at least one oxidation state of the element serves as a catalyst with atomic hydrogen to form states that are lower in energy than that of the n=1 state of having a binding energy of 13.6 eV. The catalytic reaction between atomic hydrogen and the catalyst pumps the exited states of catalyst or species caused by the ionization of the catalyst as the reaction releases energy with the formation of atomic-hydrogen states with binding energies lower than those of uncatalyzed atomic hydrogen. In an embodiment, the system comprises a source of catalyst and hydrogen gases and a means to cause a plasma of these gases. The plasma dissociates molecular hydrogen to atomic hydrogen and ionizes the source of catalyst to form the catalyst. The catalyst looses one or more electrons during the catalytic reaction, and the recombination of electrons with the ionized catalyst creates an inverted population.

Abstract translation: 提供了一种基于在元素的原子或离子中形成倒置群体的激光，其中元素的至少一种氧化态用作具有原子氢的催化剂，以形成能量低于n = 1状态具有13.6eV的结合能。 原子氢和催化剂之间的催化反应泵送由于催化剂离子化引起的催化剂或物质的退出状态，因为当结合能低于未催化的原子氢时，反应释放能量，形成原子氢状态。 在一个实施例中，该系统包括催化剂和氢气的源以及引起这些气体的等离子体的手段。 等离子体将分子氢解离成氢原子并离子化催化剂源，形成催化剂。 催化剂在催化反应期间失去一个或多个电子，并且电子与电离催化剂的复合产生反转的群体。

公开(公告)号：US07292343B2

公开(公告)日：2007-11-06

申请号：US11075973

申请日：2005-03-08

Applicant: Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

Inventor： Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

IPC: G01B9/02 ,  G01J3/45 ,  H01S3/13

CPC classification number: G01J1/4257 ,  G01J1/429 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/024 ,  G01J3/027 ,  G01J3/26 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0[DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemeter may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

公开(公告)号：US07149234B2

公开(公告)日：2006-12-12

申请号：US10650578

申请日：2003-08-27

Applicant: Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

Inventor： Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

IPC: H01S3/22

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80

Abstract: A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

Abstract translation: 高重复率，紧凑型，模块化气体放电，紫外线激光。 激光器可用作用于在集成电路制造工艺中非常快速地检查晶片的光源。 它也以非常快的速度对掩模版书写有用。 优选实施例以1000至4000Hz的脉冲重复率工作，并被设计用于全天候的生产线操作。 该优选实施例包括脉冲控制单元，其将脉冲的定时控制到小于4纳秒的精度。 该气体放电激光器的优选实施例可被配置为与KrF气体混合物，ArF气体混合物或F 2气体混合物一起操作，每个气体混合物具有近似的缓冲气体，产生248nm，197nm或 157 nm紫外光脉冲。

公开(公告)号：US07079556B2

公开(公告)日：2006-07-18

申请号：US10670406

申请日：2003-09-24

Applicant: Igor V. Fomenkov ,  Armen Kroyan ,  Jesse D. Buck ,  Palash P. Das ,  Richard L. Sandstrom ,  Frederick G. Erie ,  John Martin Algots ,  Gamaralalage G. Padmabandu

Inventor： Igor V. Fomenkov ,  Armen Kroyan ,  Jesse D. Buck ,  Palash P. Das ,  Richard L. Sandstrom ,  Frederick G. Erie ,  John Martin Algots ,  Gamaralalage G. Padmabandu

IPC: H01S3/09 ,  H01S3/10

CPC classification number: G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/134 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

Abstract: A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.

Abstract translation: 一种用于放电激光器带宽控制的技术。 提供线窄设备具有至少一个压电驱动器和快速带宽检测装置以及具有小于约1.0毫秒的时间响应的带宽控制。 在优选实施例中，波长调谐镜在非常窄的转角范围内以每秒超过500次抖动的抖动速率抖动，以使标称波长值的抖动产生期望的一系列激光脉冲的有效带宽。

公开(公告)号：US07061960B2

公开(公告)日：2006-06-13

申请号：US10658857

申请日：2003-09-09

Applicant: William F. Krupke

Inventor： William F. Krupke

IPC: H01S3/22 ,  H01S3/223

CPC classification number: H01S3/22 ,  H01S3/08 ,  H01S3/094057 ,  H01S3/094092 ,  H01S3/0941 ,  H01S3/2207

Abstract: Compact, high-power, near-diffraction-limited sources of radiation in the near infrared spectral region are provided by a new class of power amplifiers that can be pumped by conventional high-power, multimode, relatively-broadband 1-D and 2-D laser diode arrays, where the pumped amplifier gain medium is an atomic vapor of one of the alkali elements (Li, Na, K, Rb, Cs), buffered with a mixture of rare-gas (He, Ar, Kr, Ne, or Xe) and selected molecular gases. Given the central role of the alkali atomic vapor as the entity providing amplifier gain, this new type of amplifier is herein designated as the diode-pumped alkali amplifier (DPAA).

Abstract translation: 近红外光谱区域的紧凑，大功率，近衍射受限的辐射源由一类新的功率放大器提供，可以通过传统的大功率，多模，相对宽带的1-D和2- D激光二极管阵列，其中泵浦放大器增益介质是由稀有气体（He，Ar，Kr，Ne，Ar）的混合物缓冲的碱性元素（Li，Na，K，Rb，Cs）之一的原子蒸气， 或Xe）和选定的分子气体。 鉴于碱性原子蒸气作为提供放大器增益的实体的核心作用，这种新型放大器在此被称为二极管泵浦碱放大器（DPAA）。

公开(公告)号：US07058107B2

公开(公告)日：2006-06-06

申请号：US10804281

申请日：2004-03-18

Applicant: David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

Inventor： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

IPC: H01S3/22

CPC classification number: H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.

Abstract translation: 一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门设计用作集成电路光刻的光源的F 2 N 2激光系统中的优选实施例。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配备有用于选择最强的F 2/2谱线的线选择包。

公开(公告)号：US06985508B2

公开(公告)日：2006-01-10

申请号：US10627215

申请日：2003-07-24

Applicant: David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Meyers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

Inventor： David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Meyers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

IPC: H01S3/22

CPC classification number: G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

Abstract translation: 一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度小于0.2μm。