Extreme ultraviolet light generation apparatus
    1.
    发明授权
    Extreme ultraviolet light generation apparatus 有权
    极紫外光发生装置

    公开(公告)号:US09301379B2

    公开(公告)日:2016-03-29

    申请号:US13809582

    申请日:2012-03-23

    CPC classification number: H05G2/008 G03F7/70033 H05G2/003

    Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

    Abstract translation: 用于产生极紫外光的装置可以包括:具有开口的腔室,激光束通过该开口引入腔室; 安装所述室的参考构件; 目标供应单元,用于将由激光束照射的目标材料供应到室内的预定区域; 激光束聚焦光学系统,用于将激光束聚焦在室内的预定区域中,以将靶材料转化为等离子体; 以及用于收集从等离子体发射的极紫外光的收集器反射镜。

    Temperature controller for gas laser
    3.
    发明授权
    Temperature controller for gas laser 有权
    气体激光器温度控制器

    公开(公告)号:US08498317B2

    公开(公告)日:2013-07-30

    申请号:US13543510

    申请日:2012-07-06

    Abstract: A temperature controller for a gas laser which controls temperatures of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.

    Abstract translation: 一种气体激光器的温度控制器,其控制包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分的温度控制装置的温度, 与第一温度控制部分相比,具有低或高温度的控制包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂,第二温度控制部分产生 冷却剂或用于调节每个第二温度控制部分的温度的加热剂,将第一温度控制部分和第一温度控制部分并联连接的第一管道系统和将第二温度控制部分和 第二个温度受控部分 平行

    Chamber apparatus and method of maintaining target supply unit
    4.
    发明授权
    Chamber apparatus and method of maintaining target supply unit 有权
    维护目标供应单位的室内设备和方法

    公开(公告)号:US08497489B2

    公开(公告)日:2013-07-30

    申请号:US13051649

    申请日:2011-03-18

    CPC classification number: G03F7/70033 H05G2/005 H05G2/006 H05G2/008

    Abstract: A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.

    Abstract translation: 与激光装置一起使用的室装置可以包括:设置有至少一个入口的室,用于将从激光装置输出的激光束引入其中; 目标供给单元,其设置在所述室中,用于将目标材料供应到所述室中的预定区域; 恢复控制单元,用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元,用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元,用于测量从目标供应单元供应到室中的目标材料的位置。

    Differential evacuation system
    5.
    发明授权
    Differential evacuation system 有权
    差分疏散系统

    公开(公告)号:US08258492B2

    公开(公告)日:2012-09-04

    申请号:US12631258

    申请日:2009-12-04

    Abstract: [Technical Problem] To provide a differential evacuation system capable of easily maintaining, at a low cost, a large differential pressure between a light generation chamber and an illumination optical chamber in which optical processing, e.g. exposure, is performed by using extreme ultraviolet (EUV) light generated in the light generation chamber, and yet capable of sufficiently ensuring a desired optical path.[Solution to Problem] The differential evacuation system has a light generation chamber 10 that generates EUV light, an illumination optical chamber 100 in which optical processing is performed by using the EUV light generated in the light generation chamber 10, and a chamber connecting passage 150 that connects together the light generation chamber 10 and the illumination optical chamber 100 to guide the EUV light generated in the light generation chamber 10 into the illumination optical chamber 100. The chamber connecting passage 150 has a flow path constricting portion 151 and is increased in inner diameter in a conical tube shape at portions thereof that are at opposite sides, respectively, of the flow path constricting portion 151. An enlarged-diameter part 160 is provided at a position of the chamber connecting passage 150 that is closer to the light generation chamber 10, which is the higher in pressure of the two chambers 10 and 100, than the flow path constricting portion 151, and vacuum pumps 170 are attached to the enlarged-diameter part 160.

    Abstract translation: 技术问题提供一种能够以低成本容易地维持光生成室和照明光学室之间的大的压差的差分抽空系统,其中光学处理,例如, 曝光是通过使用在光产生室中产生的极紫外(EUV)光进行的,并且能够充分确保期望的光路。 [问题的解决方案]差分抽空系统具有产生EUV光的光生成室10,通过使用在光生成室10中产生的EUV光进行光学处理的照明光学室100和室连接通路150 将光生成室10和照明光学室100连接在一起,将发光室10内产生的EUV光引导到照明光学室100中。室连通路150具有流路收缩部151,内部增大 直径在分别位于流路收缩部151的相对侧的部分处的锥形管形状。扩径部160设置在室连接通道150的靠近光生成室的位置 如图10所示,两个腔室10和100的压力比流路收缩部分151高, 并且真空泵170附接到扩径部160。

    Differential evacuation system
    7.
    发明申请
    Differential evacuation system 有权
    差分疏散系统

    公开(公告)号:US20100181498A1

    公开(公告)日:2010-07-22

    申请号:US12631258

    申请日:2009-12-04

    Abstract: [Technical Problem] To provide a differential evacuation system capable of easily maintaining, at a low cost, a large differential pressure between a light generation chamber and an illumination optical chamber in which optical processing, e.g. exposure, is performed by using extreme ultraviolet (EUV) light generated in the light generation chamber, and yet capable of sufficiently ensuring a desired optical path.[Solution to Problem] The differential evacuation system has a light generation chamber 10 that generates EUV light, an illumination optical chamber 100 in which optical processing is performed by using the EUV light generated in the light generation chamber 10, and a chamber connecting passage 150 that connects together the light generation chamber 10 and the illumination optical chamber 100 to guide the EUV light generated in the light generation chamber 10 into the illumination optical chamber 100. The chamber connecting passage 150 has a flow path constricting portion 151 and is increased in inner diameter in a conical tube shape at portions thereof that are at opposite sides, respectively, of the flow path constricting portion 151. An enlarged-diameter part 160 is provided at a position of the chamber connecting passage 150 that is closer to the light generation chamber 10, which is the higher in pressure of the two chambers 10 and 100, than the flow path constricting portion 151, and vacuum pumps 170 are attached to the enlarged-diameter part 160.

    Abstract translation: 技术问题提供一种能够以低成本容易地维持光生成室和照明光学室之间的大的压差的差分抽空系统,其中光学处理,例如, 曝光是通过使用在光产生室中产生的极紫外(EUV)光进行的,并且能够充分确保期望的光路。 [问题的解决方案]差分抽空系统具有产生EUV光的光生成室10,通过使用在光生成室10中产生的EUV光进行光学处理的照明光学室100和室连接通路150 将光生成室10和照明光学室100连接在一起,将发光室10内产生的EUV光引导到照明光学室100中。室连通路150具有流路收缩部151,内部增大 直径在分别位于流路收缩部151的相对侧的部分处的锥形管形状。扩径部160设置在室连接通道150的靠近光生成室的位置 如图10所示,两个腔室10和100的压力比流路收缩部分151高, 并且真空泵170附接到扩径部160。

    Optical pickup apparatus
    8.
    发明授权
    Optical pickup apparatus 失效
    光拾取装置

    公开(公告)号:US07684306B2

    公开(公告)日:2010-03-23

    申请号:US11496814

    申请日:2006-07-31

    CPC classification number: G11B7/1353

    Abstract: There is provided an optical pickup apparatus that can obtain a stable servo signal by reducing stray light generated by diffraction in a recording layer other than a recording layer on which light is condensed. A hologram element provided in an optical pickup apparatus for recording information onto a recording medium and/or reproducing information on the recording medium by use of light includes fourth and fifth divisions where at least first-order diffracted light among diffracted light beams obtained by reflection and diffraction on a recording layer other than a light-condensed recording layer on which light is condensed by an objective lens so as not to be directed toward first and second light-receiving elements for detecting focus position information and third to eighth light-receiving elements for detecting track position information.

    Abstract translation: 提供了一种光拾取装置,其可以通过减少除了聚光的记录层之外的记录层中的衍射产生的杂散光,从而获得稳定的伺服信号。 提供在用于通过使用光将信息记录在记录介质上和/或在记录介质上再现信息的光学拾取装置中的全息元件包括第四和第五分割,其中至少一级衍射光通过反射和 除了聚光记录层之外的记录层上的衍射,其中光被物镜聚光,以便不被指向用于检测聚焦位置信息的第一和第二光接收元件和用于检测聚焦位置信息的第三至第八光接收元件 检测轨迹位置信息。

Patent Agency Ranking