公开(公告)号：US08481984B2

公开(公告)日：2013-07-09

申请号：US12482796

申请日：2009-06-11

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

IPC分类号： G21K5/00

摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

公开(公告)号：US08445877B2

公开(公告)日：2013-05-21

申请号：US13081148

申请日：2011-04-06

申请人： Hiroshi Someya ,  Tamotsu Abe ,  Hideo Hoshino

发明人： Hiroshi Someya ,  Tamotsu Abe ,  Hideo Hoshino

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  H05G2/006

摘要： A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.

摘要翻译： 一种喷嘴保护装置，其能够保护目标喷嘴免受等离子体的热量的干扰，而不会在LPP型EUV光源装置中形成稳定的目标材料流。 该喷嘴保护装置包括冷却单元，该冷却单元形成有用于使目标材料通过的开口，并且其形成有用于使冷却介质在内部循环的流路;以及致动器，其改变冷却单元的位置或形状 在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间，同时确保所述目标材料在所述冷却单元中的路径。

公开(公告)号：US20120228527A1

公开(公告)日：2012-09-13

申请号：US13477940

申请日：2012-05-22

申请人： Tamotsu ABE ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu ABE ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： G21K5/02

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US20120217422A1

公开(公告)日：2012-08-30

申请号：US13396289

申请日：2012-02-14

申请人： Takayuki YABU ,  Kouji Kakizaki ,  Takanobu Ishihara ,  Tamotsu Abe ,  Osamu Wakabayashi

发明人： Takayuki YABU ,  Kouji Kakizaki ,  Takanobu Ishihara ,  Tamotsu Abe ,  Osamu Wakabayashi

IPC分类号： G01J3/10

CPC分类号： H05G2/006 ,  G03F7/70033 ,  H05G2/008

摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.

摘要翻译： 一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电 导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为 位于等离子体产生区域和至少电绝缘体之间。 目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。

公开(公告)号：US08212228B2

公开(公告)日：2012-07-03

申请号：US12382108

申请日：2009-03-09

申请人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： H05G2/00

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US20110226745A1

公开(公告)日：2011-09-22

申请号：US13048454

申请日：2011-03-15

申请人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC分类号： B23K26/04

CPC分类号： G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

摘要翻译： 极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外线发生系统可以包括：室 入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个 光学元件 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US08000361B2

公开(公告)日：2011-08-16

申请号：US12382109

申请日：2009-03-09

申请人： Tamotsu Abe ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Tamotsu Abe ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/00 ,  H01S3/22

CPC分类号： H01S3/2316 ,  H01S3/076 ,  H01S3/10007 ,  H01S3/2232

摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.

摘要翻译： 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。

公开(公告)号：US07999241B2

公开(公告)日：2011-08-16

申请号：US12605113

申请日：2009-10-23

申请人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Tamotsu Abe

发明人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Tamotsu Abe

IPC分类号： G21K5/02 ,  H01J17/26

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/006 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.

摘要翻译： 极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着 磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元 从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部 检索对等离子体的产生无贡献的残留目标。

公开(公告)号：US20100171049A1

公开(公告)日：2010-07-08

申请号：US12382964

申请日：2009-03-27

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： H05G2/00 ,  G01N21/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光生成室内的激光束聚焦光学元件中的光学元件的劣化。 该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器 一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

公开(公告)号：US07732794B2

公开(公告)日：2010-06-08

申请号：US12071250

申请日：2008-02-19

申请人： Tamotsu Abe ,  Yoshifumi Ueno ,  Takayuki Yabu

发明人： Tamotsu Abe ,  Yoshifumi Ueno ,  Takayuki Yabu

IPC分类号： H01J35/20

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus having a comparatively large output power for exposing, a solid target is supplied fast and continuously while heat dissipation for irradiation of a driver laser light is performed successfully. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target material supplying unit which coats a wire with target material, a wire supplying unit which supplies the wire coated with the target material to a predetermined position within the chamber, a driver laser which applies a laser beam onto the wire coated with the target material to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputting the extreme ultra violet light.

摘要翻译： 在具有相对较大的曝光输出功率的极紫外光源装置中，能够快速，连续地供给固体靶，成功地进行用于照射驱动激光的散热。 极紫外光源装置包括：产生极紫外光的室; 将目标材料供给单元涂敷到目标材料上的导线供给单元，将涂布有目标材料的线材供给到室内的预定位置的导线供给单元，将激光束施加到涂覆有目标材料的线材上的驱动器激光器 产生等离子体; 以及收集从等离子体辐射的极紫外光并输出极紫外光的收集镜。