知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

11 records (took 0.014 seconds)

    Line narrowing module
    1.
    发明授权
    Line narrowing module 有权

    公开(公告)号：US07366219B2

    公开(公告)日：2008-04-29

    申请号：US11000684

    申请日：2004-11-30

    Applicant: J. Martin Algots ,  Robert A. Bergstedt ,  Walter D. Gillespie ,  Vladimir A. Kulgeyko ,  William N. Partlo ,  German E. Rylov ,  Richard L. Sandstrom ,  Brian Strate ,  Timothy S. Dyer

    Inventor： J. Martin Algots ,  Robert A. Bergstedt ,  Walter D. Gillespie ,  Vladimir A. Kulgeyko ,  William N. Partlo ,  German E. Rylov ,  Richard L. Sandstrom ,  Brian Strate ,  Timothy S. Dyer

    IPC: H01S3/22

    CPC classification number: H01S3/1055 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/036 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/106 ,  H01S3/2251

    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.

    Relax gas discharge laser lithography light source
    4.
    发明授权
    Relax gas discharge laser lithography light source 有权
    放气放电激光光刻光源

    公开(公告)号：US07088758B2

    公开(公告)日：2006-08-08

    申请号：US10956784

    申请日：2004-10-01

    Applicant: Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Thomas A. Yager ,  Alexander I. Ershov ,  Robert J. Rafac ,  German E. Rylov

    Inventor： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Thomas A. Yager ,  Alexander I. Ershov ,  Robert J. Rafac ,  German E. Rylov

    IPC: H01S3/22

    CPC classification number: G01J1/429 ,  B23K26/0622 ,  B23K2101/40 ,  G01J9/02 ,  G02B26/002 ,  G02B26/0875 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/1055 ,  H01S3/225

    Abstract: An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.

    Abstract translation: 公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择 用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在色散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置 脉冲光束在可变折射光学元件上。 可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。 脉冲参数测量和脉冲调制控制的其它方面包括响应来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

    Two chamber F2 laser system with F2 pressure based line selection
    7.
    发明授权
    Two chamber F2 laser system with F2 pressure based line selection 失效
    双室F2激光系统采用F2压力线选择

    公开(公告)号：US06798812B2

    公开(公告)日：2004-09-28

    申请号：US10243102

    申请日：2002-09-13

    Applicant: German E. Rylov ,  Thomas Hofmann ,  Richard L. Sandstrom

    Inventor： German E. Rylov ,  Thomas Hofmann ,  Richard L. Sandstrom

    IPC: H01S3223

    CPC classification number: H01S3/225 ,  H01S3/03 ,  H01S3/036 ,  H01S3/09702 ,  H01S3/1055 ,  H01S3/2258 ,  H01S3/2308

    Abstract: The present invention provides an injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The parameters chamber can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment is a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In this preferred embodiment, both of the chambers and the laser optics are mounted on a vertical optical table within a laser enclosure. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is operated with a fluorine partial pressure and total gas pressure within specified ranges in order to reduce the intensity of the weak line to less than 0.01% of the strong line. Therefore, the need for line selection optical equipment is avoided.

    Abstract translation: 本发明提供一种注射接种的模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率产生高质量的脉冲激光束，并且在约20至40瓦特的集成输出的脉冲能量为约5至10mJ或更大的脉冲能量 或更大。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以分别控制参数室，允许在主振荡器中优化波长参数并优化放大室中的脉冲能量参数。 优选实施例是被配置为MOPA并被专门设计用作集成电路光刻的光源的F2激光系统。 在该优选实施例中，腔室和激光光学器件都安装在激光外壳内的垂直光学平台上。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器以氟分压和总气体压力在指定范围内运行，以将弱线的强度降低到强线的0.01％以下。 因此，避免了线路选择光学设备的需要。

    Active bandwidth control for a laser
    10.
    发明授权
    Active bandwidth control for a laser 有权
    激光器的有源带宽控制

    公开(公告)号：US07653095B2

    公开(公告)日：2010-01-26

    申请号：US11173988

    申请日：2005-06-30

    Applicant: Daniel J. Reiley ,  German E. Rylov ,  Robert A. Bergstedt

    Inventor： Daniel J. Reiley ,  German E. Rylov ,  Robert A. Bergstedt

    IPC: H01S3/10

    CPC classification number: G03F7/70575 ,  G03F7/70025 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/225

    Abstract: In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.

    Abstract translation: 在第一方面，光刻设备可以包括使用光学邻近校正（OPC），脉冲激光源和有源带宽控制系统设计的掩模，该有源带宽控制系统被配置为响应于测量的脉冲带宽来增加后续脉冲的带宽， 低于预定带宽范围，并且响应于高于预定带宽范围的测量脉冲带宽增加随后脉冲的带宽。 在另一方面，有源带宽控制系统可以包括用于改变激光源的激光腔中的激光束的波前的光学器件，用于响应于控制信号选择性地调节输出激光器带宽。 在另一方面，具有穿过孔的波长变化的激光器的带宽可以由可移动以调节孔径的孔径阻挡元件主动地控制。

Patent Agency Ranking