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355 条记录 (耗时 0.019 秒)

    Laser apparatus
    2.
    发明授权
    Laser apparatus 有权

    公开(公告)号：US10971886B2

    公开(公告)日：2021-04-06

    申请号：US16266189

    申请日：2019-02-04

    申请人： Gigaphoton Inc.

    发明人： Takeshi Asayama ,  Hiroyuki Masuda

    IPC分类号： H01S3/097 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/104 ,  H01S3/038 ,  H01S3/0971 ,  H01S3/10 ,  H01S3/08 ,  H01S3/23 ,  H01S3/00

    摘要： A laser apparatus includes a chamber accommodating a pair of discharge electrodes, a gas supply and exhaust device configured to supply laser gas to an interior of the chamber and exhaust laser gas from the interior of the chamber, and a controller. The controller performs first control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber at every first number of pulses or first elapsed time, and second control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber before the first control at every second number of pulses less than the first number of pulses or second elapsed time less than the first elapsed time.

    Wavelength stabilization for an optical source
    3.
    发明授权
    Wavelength stabilization for an optical source 有权

    公开(公告)号：US10816905B2

    公开(公告)日：2020-10-27

    申请号：US14681675

    申请日：2015-04-08

    申请人： Cymer, LLC

    发明人： Rahul Ahlawat

    IPC分类号： H01S3/137 ,  H01S3/13 ,  G03F7/20 ,  H01S3/0971

    摘要： A wavelength error for each pulse in a first subset of pulses emitted from an optical source is determined, the wavelength error being the difference between a wavelength for a particular pulse and a target wavelength; a pulse-by-pulse correction signal is determined based on the determined wavelength error, the pulse-by-pulse correction signal including a correction signal associated with each pulse in the first subset of pulses; and a correction based on the determined pulse-by-pulse correction signal is applied to each pulse in a second subset of pulses emitted from the optical source, where applying a correction to a pulse in the second subset of pulses reduces the wavelength error of the pulse in the second subset of pulses.

    Laser unit
    6.
    发明授权
    Laser unit 有权

    公开(公告)号：US10447001B2

    公开(公告)日：2019-10-15

    申请号：US15858219

    申请日：2017-12-29

    申请人： GIGAPHOTON INC.

    发明人： Minoru Taniyama ,  Hakaru Mizoguchi ,  Osamu Wakabayashi

    IPC分类号： H01S3/038 ,  H01S3/086 ,  H01S3/104 ,  H01S3/134 ,  H01S3/08 ,  H01S3/136 ,  H01S3/0971 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23 ,  H01S3/00

    摘要： A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0

    SYSTEMS AND METHODS FOR SPATIOTEMPORAL CONTROL OF A LASER AND APPLICATIONS OF SAME
    7.
    发明申请
    SYSTEMS AND METHODS FOR SPATIOTEMPORAL CONTROL OF A LASER AND APPLICATIONS OF SAME 审中-公开

    公开(公告)号：US20190103720A1

    公开(公告)日：2019-04-04

    申请号：US15721900

    申请日：2017-09-30

    申请人： University of Rochester

    发明人： Dustin H. Froula ,  Terry Kessler

    IPC分类号： H01S3/00 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/104

    摘要： Methods and systems are disclosed for using a chromatic lens system to provide a “flying focus”—i.e., an advanced focusing scheme enabling spatiotemporal control of a focal location. In a method, a photon beam is emitted from a source at a wavelength. The photon beam may have more than one wavelength. The photon beam is focused to a focal location using a chromatic lens system. The focal location is at a first longitudinal distance along an optical axis from the chromatic lens system. The wavelength of the photon beam is changed as a function of time to change the focal location as a function of time. The wavelength may be changed such that the focal location changes with a focal velocity.

    Gas optimization in a gas discharge light source
    9.
    发明授权
    Gas optimization in a gas discharge light source 有权

    公开(公告)号：US10218147B2

    公开(公告)日：2019-02-26

    申请号：US15457600

    申请日：2017-03-13

    申请人： Cymer, LLC

    发明人： Tanuj Aggarwal

    IPC分类号： H01S3/08 ,  H01S3/13 ,  H01S3/036 ,  H01S3/23 ,  H01S3/134 ,  H01S3/225 ,  H01S3/104 ,  H01S3/038 ,  H01S3/097 ,  H01S3/0971

    摘要： In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.

    GENERATING PLASMA OR LASER PULSES BY RADIOFREQUENCY EXCITATION PULSES
    10.
    发明申请
    GENERATING PLASMA OR LASER PULSES BY RADIOFREQUENCY EXCITATION PULSES 审中-公开

    公开(公告)号：US20180233876A1

    公开(公告)日：2018-08-16

    申请号：US15950267

    申请日：2018-04-11

    申请人： TRUMPF Laser- und Systemtechnik GmbH

    发明人： Robert Schulz ,  Torsten Beck

    IPC分类号： H01S3/097 ,  H05H1/46 ,  H01S3/10 ,  H01S3/223 ,  H01S3/0971 ,  H01S3/134

    摘要： Methods, devices, and apparatus for generating plasma or laser pulses by radio frequency (RF) excitation pulses are provided. In one aspect, a method includes specifying radio frequency (RF) excitation pulses at least partially as a function of a preceding RF excitation of a medium and outputting a signal to a RF pulse generator, the signal configured to cause the RF pulse generator to generate the specified RF excitation pulses for exciting the medium to generate plasma or laser pulses. The RF excitation pulses is specified to become more strongly reduced in energy when a remaining excitation of the medium by the preceding RF excitation is higher.