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23 条记录 (耗时 0.019 秒)

    Gas optimization in a gas discharge light source
    3.
    发明授权
    Gas optimization in a gas discharge light source 有权

    公开(公告)号：US10218147B2

    公开(公告)日：2019-02-26

    申请号：US15457600

    申请日：2017-03-13

    申请人： Cymer, LLC

    发明人： Tanuj Aggarwal

    IPC分类号： H01S3/08 ,  H01S3/13 ,  H01S3/036 ,  H01S3/23 ,  H01S3/134 ,  H01S3/225 ,  H01S3/104 ,  H01S3/038 ,  H01S3/097 ,  H01S3/0971

    摘要： In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.

    Gas mixture control in a gas discharge light source
    4.
    发明授权
    Gas mixture control in a gas discharge light source 有权

    公开(公告)号：US10090629B2

    公开(公告)日：2018-10-02

    申请号：US15495455

    申请日：2017-04-24

    申请人： Cymer, LLC

    发明人： Rahul Ahlawat ,  Tanuj Aggarwal

    IPC分类号： H01S3/22 ,  H01S3/036 ,  H01S3/097 ,  H01S3/225

    摘要： A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.

    Estimating a gain relationship of an optical source
    5.
    发明授权
    Estimating a gain relationship of an optical source 有权

    公开(公告)号：US10036963B2

    公开(公告)日：2018-07-31

    申请号：US15262452

    申请日：2016-09-12

    申请人： Cymer, LLC

    发明人： Tanuj Aggarwal

    IPC分类号： G03B27/54 ,  G03F7/20

    CPC分类号： G03F7/70516 ,  G03F7/70041 ,  G03F7/705 ,  G03F7/70558

    摘要： An indication of an output of an optical source of a photolithography system is accessed; an indication of an input provided to the optical source is accessed, the provided input being associated with the accessed indication of the output of the optical source; an output error is determined from an expected amount of output and the accessed indication of the output of the optical source; a local gain associated with the accessed indication of the input provided to the optical source is estimated; a gain error is determined from the estimated local gain and an expected local gain; a current value of one or more operating metrics of the optical source is estimated based on one or more of the output error and the gain error; and a gain relationship for the optical source is updated based on the estimated current value of the one or more operating metrics.

    GAS MIXTURE CONTROL IN A GAS DISCHARGE LIGHT SOURCE
    8.
    发明申请
    GAS MIXTURE CONTROL IN A GAS DISCHARGE LIGHT SOURCE 审中-公开

    公开(公告)号：US20170229832A1

    公开(公告)日：2017-08-10

    申请号：US15495455

    申请日：2017-04-24

    申请人： Cymer, LLC

    发明人： Rahul Ahlawat ,  Tanuj Aggarwal

    IPC分类号： H01S3/036 ,  H01S3/225 ,  H01S3/097

    CPC分类号： H01S3/036 ,  H01S3/0014 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/10069 ,  H01S3/104 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2253 ,  H01S3/2255 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

    摘要： A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.

    Gas optimization in a gas discharge light source
    9.
    发明授权
    Gas optimization in a gas discharge light source 有权

    公开(公告)号：US09634455B1

    公开(公告)日：2017-04-25

    申请号：US15044677

    申请日：2016-02-16

    申请人： Cymer, LLC

    发明人： Tanuj Aggarwal

    IPC分类号： H01S3/036 ,  H01S3/225 ,  H01S3/23 ,  H01S3/11

    CPC分类号： H01S3/134 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2366

    摘要： One or more operating characteristics of a light source are adjusted by estimating a plurality of extreme values of operating parameters of the light source while operating the light source under a set of extreme test conditions. For each extreme test condition, a group of pulses of energy is supplied to a first gas discharge chamber of the light source while operating the first gas discharge chamber under the extreme test condition to produce a first pulsed amplified light beam; a group of pulses of energy is supplied to a second gas discharge chamber of the light source while operating the second gas discharge chamber under the extreme test condition to produce a second pulsed amplified light beam. An extreme value of an operating parameter for the extreme test condition is measured to thereby estimate the extreme value of the operating parameter.