公开(公告)号：US11942753B2

公开(公告)日：2024-03-26

申请号：US17025439

申请日：2020-09-18

申请人： KERN TECHNOLOGIES, LLC

发明人： Paul E Jackson ,  Gerald L Kern ,  Jacob D Colby ,  Aaron M Kern ,  Tyler P Schmidt ,  Keith L Weiher

IPC分类号： H01S3/03 ,  H01S3/034 ,  H01S3/07 ,  H01S3/08 ,  H01S3/08045 ,  H01S3/081 ,  H01S3/097 ,  H01S3/223

CPC分类号： H01S3/08095 ,  H01S3/0315 ,  H01S3/034 ,  H01S3/076 ,  H01S3/08045 ,  H01S3/08059 ,  H01S3/0813 ,  H01S3/09702 ,  H01S3/08063 ,  H01S3/0816 ,  H01S3/0818 ,  H01S3/2232

摘要： A folded slab waveguide laser having a hybrid waveguide-unstable resonator cavity. Multiple slab waveguides of thickness ‘t’ supporting vertical waveguide modes are physically arranged above one another in a stack and optically arranged in series through one or more cavity folding assemblies with curved mirrors. A gain medium such as a gas is arranged in each slab. Each cavity folding assembly is designed to redirect the radiation beam emitted from one slab waveguide into the next waveguide and also at the same time to provide a focus for the radiation beam so that a selected vertical waveguide mode (or modes) is (or are) coupled efficiently into the next slab.

公开(公告)号：US11349273B2

公开(公告)日：2022-05-31

申请号：US16962434

申请日：2018-12-17

申请人： Cymer, LLC

发明人： Edward Siqi Luo ,  Richard Carl Ujazdowski ,  Shuang Xu

IPC分类号： H01S3/22 ,  H01S3/038 ,  H01S3/032 ,  H01S3/097 ,  H01S3/106 ,  H01S3/225 ,  H01S3/08

摘要： Disclosed is a laser discharge chamber in which useful lifetime is extended by local electrical tuning using one or a combination of design of the chamber internal geometry, placement and distribution of components within the chamber such as electrodes, current returns, and capacitors, and selective electrical isolation of portions of the components.

公开(公告)号：US11271361B2

公开(公告)日：2022-03-08

申请号：US16849618

申请日：2020-04-15

申请人： Gigaphoton Inc.

发明人： Keisuke Ishida ,  Satoshi Komuro ,  Hiroshi Furusato

IPC分类号： G03F7/20 ,  H01S3/134 ,  H01S3/036 ,  H01S3/097 ,  H01S3/13 ,  H01S3/038 ,  H01S3/225

摘要： An excimer laser apparatus according to the present disclosure includes a chamber configured to accommodate a laser gas and a pair of electrodes and generate pulse-oscillating laser light when the gas pressure of the laser gas is controlled in accordance with voltage applied between the pair of electrodes, a power supply configured to apply the voltage between the pair of electrodes, and a controller to which a target value of the spectral linewidth of the laser light is inputted, the controller configured to correct the voltage used to control the gas pressure, when the target value changes from a first target value to a second target value, based on a first function having the second target value as a parameter and control the gas pressure in accordance with the corrected voltage.

公开(公告)号：US10971886B2

公开(公告)日：2021-04-06

申请号：US16266189

申请日：2019-02-04

申请人： Gigaphoton Inc.

发明人： Takeshi Asayama ,  Hiroyuki Masuda

IPC分类号： H01S3/097 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/104 ,  H01S3/038 ,  H01S3/0971 ,  H01S3/10 ,  H01S3/08 ,  H01S3/23 ,  H01S3/00

摘要： A laser apparatus includes a chamber accommodating a pair of discharge electrodes, a gas supply and exhaust device configured to supply laser gas to an interior of the chamber and exhaust laser gas from the interior of the chamber, and a controller. The controller performs first control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber at every first number of pulses or first elapsed time, and second control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber before the first control at every second number of pulses less than the first number of pulses or second elapsed time less than the first elapsed time.

公开(公告)号：US20190252846A1

公开(公告)日：2019-08-15

申请号：US16396072

申请日：2019-04-26

申请人： National University Corporation Nagaoka University of Technology ,  Gigaphoton Inc.

发明人： Weihua JIANG ,  Hiroshi UMEDA ,  Hakaru MIZOGUCHI ,  Takashi MATSUNAGA ,  Hiroaki TSUSHIMA ,  Tomoyuki OHKUBO

IPC分类号： H01S3/097 ,  H01S3/041 ,  H01S3/225 ,  H01S3/134 ,  H01S3/038

CPC分类号： H01S3/09702 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/0971 ,  H01S3/10069 ,  H01S3/134 ,  H01S3/225

摘要： A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively. The secondary electric circuit may include a number “n” of secondary coils connected in series to one another, and a number “n” of diodes each connected to opposite ends of each of the “n” secondary coils, to prevent a reverse current flowing from the pair of discharge electrodes toward the secondary coils.

公开(公告)号：US20190103720A1

公开(公告)日：2019-04-04

申请号：US15721900

申请日：2017-09-30

申请人： University of Rochester

发明人： Dustin H. Froula ,  Terry Kessler

IPC分类号： H01S3/00 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/104

摘要： Methods and systems are disclosed for using a chromatic lens system to provide a “flying focus”—i.e., an advanced focusing scheme enabling spatiotemporal control of a focal location. In a method, a photon beam is emitted from a source at a wavelength. The photon beam may have more than one wavelength. The photon beam is focused to a focal location using a chromatic lens system. The focal location is at a first longitudinal distance along an optical axis from the chromatic lens system. The wavelength of the photon beam is changed as a function of time to change the focal location as a function of time. The wavelength may be changed such that the focal location changes with a focal velocity.

公开(公告)号：US20190081451A1

公开(公告)日：2019-03-14

申请号：US16185542

申请日：2018-11-09

申请人： GIGAPHOTON INC.

发明人： Akihiko KUROSU ,  Takashi MATSUNAGA ,  Hiroyuki MASUDA ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO ,  Takeshi OHTA

IPC分类号： H01S3/036 ,  H01S3/04 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/097 ,  H01S3/225 ,  H01S3/041 ,  H01S3/134 ,  H01S3/13 ,  H01S3/08 ,  H01S3/03

摘要： There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

公开(公告)号：US10218147B2

公开(公告)日：2019-02-26

申请号：US15457600

申请日：2017-03-13

申请人： Cymer, LLC

发明人： Tanuj Aggarwal

IPC分类号： H01S3/08 ,  H01S3/13 ,  H01S3/036 ,  H01S3/23 ,  H01S3/134 ,  H01S3/225 ,  H01S3/104 ,  H01S3/038 ,  H01S3/097 ,  H01S3/0971

摘要： In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.

公开(公告)号：US10122145B2

公开(公告)日：2018-11-06

申请号：US15651253

申请日：2017-07-17

申请人： GIGAPHOTON INC.

发明人： Yoshiaki Kurosawa ,  Hideo Hoshino

IPC分类号： H01S3/10 ,  H01S3/00 ,  H01S3/034 ,  H01S3/08 ,  H01S3/095 ,  H01S3/23 ,  H05G2/00 ,  H01S3/097

摘要： A laser apparatus may include a master oscillator, a plurality of amplifiers, a photodetector device configured to detect a light beam traveling back along a laser beam path, and a controller. The photodetector device may include a first photodetector configured to detect energy of a light beam traveling back along the laser beam path and a second photodetector configured to detect power of the light beam traveling back along the laser beam path. The controller may be configured to determine that a return beam is generated when the intensity of the energy detection signal exceeds a first threshold. The controller may be configured to determine that a self-oscillation beam is generated when the intensity of the power detection signal exceeds a second threshold.

公开(公告)号：US10090629B2

公开(公告)日：2018-10-02

申请号：US15495455

申请日：2017-04-24

申请人： Cymer, LLC

发明人： Rahul Ahlawat ,  Tanuj Aggarwal

IPC分类号： H01S3/22 ,  H01S3/036 ,  H01S3/097 ,  H01S3/225

摘要： A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.