-
1.发明公开公开(公告)号：US20240272444A1
公开(公告)日：2024-08-15
申请号：US18636475
申请日：2024-04-16
申请人： Gigaphoton Inc.
IPC分类号： G02B27/09 , B23K26/06 , B23K26/0622 , B23K26/067 , B23K26/324 , B23K26/70 , B23K101/36 , B23K103/00 , H01L21/48 , H01L23/00
CPC分类号： G02B27/0988 , B23K26/0622 , B23K26/0648 , B23K26/0665 , B23K26/067 , B23K26/324 , B23K26/705 , G02B27/0944 , H01L21/486 , B23K2101/36 , B23K2103/42 , B23K2103/54 , H01L24/16 , H01L2224/16227
摘要： A laser processing system includes a laser apparatus configured to output a pulse laser beam, a divergence adjuster configured to adjust a first beam divergence in a first direction of the pulse laser beam and a second beam divergence in a second direction which intersects the first direction, a measuring instrument configured to measure the first and second beam divergences of the pulse laser beam having passed through the divergence adjuster, a diffractive optical element configured to branch the pulse laser beam having passed through the measuring instrument, and a processor configured to control the divergence adjuster such that the first and second beam divergences approach respective target values based on measurement results of the first and second beam divergences by the measuring instrument.
-
2.发明公开公开(公告)号：US20240049378A1
公开(公告)日：2024-02-08
申请号：US18351630
申请日：2023-07-13
申请人： Gigaphoton Inc.
发明人： Masaki NAKANO , Osamu WAKABAYASHI
CPC分类号： H05G2/006 , H05G2/008 , G03F7/70033 , G03F7/7065 , G03F7/70525
摘要： An extreme ultraviolet light generation apparatus includes a droplet target generation device and a solid target replenishment device. The droplet target generation device includes a tank configured to melt a solid target substance to generate a liquid target substance, and a nozzle configured to continuously generate a droplet target from the liquid target substance in the tank and output the droplet target toward a plasma generation region to which pulse laser light is concentrated, and is configured to apply a velocity difference between a plurality of droplet targets including the droplet target so that the plurality of droplet targets coalesce. The solid target replenishment device is configured to replenish the tank with a one-time replenishment amount of the solid target substance such that the coalescence of the plurality of droplet targets is completed before the plurality of droplet targets reach the plasma generation region.
-
公开(公告)号：US20230352900A1
公开(公告)日：2023-11-02
申请号：US18348518
申请日：2023-07-07
申请人： Gigaphoton Inc.
发明人： Koichi FUJII , Osamu WAKABAYASHI
IPC分类号： H01S3/1055 , G03F7/20 , H01S3/139
CPC分类号： H01S3/1055 , G03F7/20 , H01S3/139
摘要： A laser apparatus includes a grating system; an actuator system configured to adjust a first incident angle on the grating system and a second incident angle on the grating system, the first incident angle being an angle of a first part of an optical beam incident on the grating system, the second incident angle being an angle of a second part of the optical beam incident on the grating system; and a processor configured to control the actuator system to periodically vary the first and second incident angles so that the first and second incident angles are different from each other in at least one of phase and variation range.
-
公开(公告)号：US20230208094A1
公开(公告)日：2023-06-29
申请号：US18177088
申请日：2023-03-01
申请人： Gigaphoton Inc.
CPC分类号： H01S3/137 , H01S3/1305 , G03F7/70025
摘要： A laser device includes a first actuator configured to adjust an oscillation wavelength of pulse laser light; a second actuator configured to adjust a spectral line width of the pulse laser light; and a processor configured to determine a target spectral line width by reading data specifying a number of irradiation pulses of the pulse laser light with which one location of an irradiation receiving object is irradiated and a difference between a shortest wavelength and a longest wavelength, control the second actuator based on the target spectral line width, and control the first actuator so that the oscillation wavelength periodically changes every number of the irradiation pulses between the shortest wavelength and the longest wavelength.
-
公开(公告)号：US20220371121A1
公开(公告)日：2022-11-24
申请号：US17817197
申请日：2022-08-03
申请人： Gigaphoton Inc.
发明人： Koichi FUJII , Osamu WAKABAYASHI
IPC分类号： B23K26/046 , B23K26/082 , B23K26/0622 , B23K26/03 , B23K26/359
摘要： An exposure system that performs scanning exposure of a semiconductor substrate by irradiating a reticle with a pulse laser beam includes a laser apparatus configured to emit a pulse laser beam, an illumination optical system through which the pulse laser beam is guided to the reticle, a reticle stage, and a processor configured to control emission of the pulse laser beam from the laser apparatus and movement of the reticle by the reticle stage. The reticle includes a region in which multiple kinds of patterns are arranged in a mixed manner in a scanning width direction orthogonal to a scanning direction of the scanning exposure. The processor instructs the laser apparatus about a target wavelength such that the laser apparatus emits the pulse laser beam of a wavelength with which dispersion of best focus positions corresponding to respective patterns of the multiple kinds of patterns is minimum.
-
公开(公告)号：US20220350120A1
公开(公告)日：2022-11-03
申请号：US17858765
申请日：2022-07-06
申请人： Gigaphoton Inc.
IPC分类号： G02B17/02 , G02B27/28 , G02B5/30 , G02B26/08 , H01S3/00 , H01S3/23 , H01S3/225 , H01S3/08 , G03F7/20
摘要： A pulse width expansion apparatus according to an aspect of the present disclosure includes a polarization beam splitter and a transfer optical system. The transfer optical system includes ¼-wavelength and reflection mirror pairs. The ¼-wavelength mirror pair include first and second ¼-wavelength mirrors. The first ¼-wavelength mirror provides ¼-wavelength phase shift and reflects a pulse laser beam. The second ¼-wavelength mirror provides ¼-wavelength phase shift and reflects the pulse laser beam reflected by the first ¼-wavelength mirror. The reflection mirror pair are disposed on an optical path before and after or between the ¼-wavelength mirror pair. The transfer optical system transfers an image of an input pulse laser beam on the polarization beam splitter to the optical path between the ¼-wavelength mirror pair at one-to-one magnification as a first transfer image and transfers the first transfer image to the polarization beam splitter at one-to-one magnification as a second transfer image.
-
公开(公告)号：US20210366710A1
公开(公告)日：2021-11-25
申请号：US17392926
申请日：2021-08-03
摘要： A method for manufacturing a semiconductor crystalline thin film according to a viewpoint of the present disclosure includes radiating first pulsed laser light having a first pulse duration to an amorphous semiconductor to poly-crystallize the amorphous semiconductor and radiating second pulsed laser light having a second pulse duration shorter than the first pulse duration to an area of a semiconductor crystal having undergone the poly-crystallization to lower the height of ridges of the semiconductor crystal.
-
公开(公告)号：US20200067257A1
公开(公告)日：2020-02-27
申请号：US16674994
申请日：2019-11-05
申请人： Gigaphoton Inc.
发明人： Daisuke TEI , Osamu WAKABAYASHI
IPC分类号： H01S3/081 , G02B1/02 , G02B27/12 , H01S3/08 , H01S3/225 , H01S3/22 , H01S3/034 , H01S3/13 , C30B29/12 , G03F7/20
摘要： A laser apparatus including an optical element made of a CaF2 crystal and configured to transmit an ultraviolet laser beam obliquely incident on one surface of the optical element, the electric field axis of the P-polarized component of the laser beam propagating through the optical element coinciding with one axis contained in of the CaF2 crystal, with the P-polarized component defined with respect to the one surface. A method for manufacturing an optical element, the method including causing a seed CaF2 crystal to undergo crystal growth along one axis contained in to form an ingot, setting a cutting axis to be an axis inclining by an angle within 14.18±5° with respect to the crystal growth direction toward the direction of another axis contained in , which differs from the crystal growth direction, and cutting the ingot along a plane perpendicular to the cutting axis.
-
公开(公告)号：US20200025247A1
公开(公告)日：2020-01-23
申请号：US16568808
申请日：2019-09-12
申请人： Gigaphoton Inc.
发明人： Masaharu MIKI , Osamu WAKABAYASHI
摘要： A gas laser apparatus includes: a magnetic bearing including an electromagnet capable of controlling a magnetic force, and configured to rotatably support a rotary shaft of a fan in a magnetically levitated state by the magnetic force, the fan being configured to supply a laser gas; an electromagnet control unit configured to control the magnetic force of the electromagnet based on displacement of a levitated position of the rotary shaft and adjust the levitated position; a motor configured to generate torque for rotating the fan; a magnetic coupling configured to couple the rotary shaft and a drive shaft of a motor with a magnetic attractive force and transmit the torque of the motor to the rotary shaft; an attractive force estimating sensor configured to detect a parameter that enables an attractive force of the magnetic coupling to be estimated; an attractive force measuring unit configured to measure the attractive force of the magnetic coupling based on the detected parameter; and a correction unit configured to correct the magnetic force of the electromagnet according to a variation in the attractive force measured by the attractive force measuring unit.
-
公开(公告)号：US20190313519A1
公开(公告)日：2019-10-10
申请号：US16434196
申请日：2019-06-07
申请人： Gigaphoton Inc.
发明人： Takayuki YABU , Osamu WAKABAYASHI
摘要： An extreme ultraviolet light generation system includes: a target supply unit configured to output a target toward a predetermined region; a drive laser configured to output a drive laser beam in a first duration; a guide laser configured to output a guide laser beam; a beam combiner configured to substantially align the optical path axes of the drive and guide laser beams and output the laser beams; a laser beam focusing optical system configured to focus the laser beams output from the beam combiner to the predetermined region; an actuator configured to change the focusing positions of the laser beams through the laser beam focusing optical system; an optical sensor configured to detect reflected light of the guide laser beam from the target; and a control unit configured to control the actuator so that the light amount of the reflected light thus detected increases in a second duration.
-
-
-
-
-
-
-
-
-
搜索结果
205 条记录 (耗时 0.04 秒)
