公开(公告)号：US20200280160A1

公开(公告)日：2020-09-03

申请号：US16874367

申请日：2020-05-14

申请人： The Boeing Company

发明人： Mark Joseph Clemen, JR. ,  John R. Hull

IPC分类号： H01S3/032 ,  H01S3/07 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/0959

摘要： A system for generating an energy beam based laser includes an apparatus for receiving an energy beam and for generating an energy beam based laser. The apparatus is configurable or controllable for tuning an output wavelength of the laser generated by the apparatus using the energy beam. The apparatus includes a first component for producing a first magnetic field oriented in a first direction and a second component for producing a second magnetic field oriented in a second direction substantially opposite to the first direction. A channel through the apparatus is defined by the first component and the second component through which the energy beam passes to generate the laser at an output of the apparatus. The apparatus is configurable or controllable for modifying at least one of the first magnetic field and the second magnetic field for tuning the output wavelength of the laser.

公开(公告)号：US09706635B2

公开(公告)日：2017-07-11

申请号：US15287236

申请日：2016-10-06

申请人： Radom Corporation

发明人： Jovan Jevtic ,  Ashok Menon ,  Velibor Pikelja

IPC分类号： G01N21/73 ,  H05H1/46 ,  G01N22/00 ,  H01J49/10 ,  G21B1/05 ,  H01J37/32 ,  H05H1/30 ,  G01N21/71 ,  H01S3/0975

CPC分类号： H05H1/46 ,  G01N21/718 ,  G01N22/00 ,  G21B1/057 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32467 ,  H01J49/10 ,  H01J49/105 ,  H01J2237/002 ,  H01S3/0975 ,  H05H1/30 ,  H05H2001/4652 ,  H05H2001/4682

摘要： A dielectric resonator is excited at its natural resonant frequency to produce a highly uniform electric field for the generation of plasma. The plasma may be used in a optical or mass spectrometer.

公开(公告)号：US09645510B2

公开(公告)日：2017-05-09

申请号：US14787738

申请日：2014-04-16

申请人： ASML Netherlands B.V.

发明人： Wilhelmus Patrick Elisabeth Maria Op 'T Root ,  Adrianus Leonardus Gertrudus Bommer ,  Robert De Jong ,  Frank Everts ,  Herman Philip Godfried ,  Roland Pieter Stolk ,  Paul Van Der Veen

IPC分类号： G03B27/42 ,  G03F7/20 ,  H01S3/104 ,  H01S3/0975 ,  H01S3/225

CPC分类号： G03F7/70558 ,  G03F7/70025 ,  G03F7/70516 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/225

摘要： A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.

公开(公告)号：US20150204669A1

公开(公告)日：2015-07-23

申请号：US13962224

申请日：2013-08-08

申请人： Honeywell International Inc.

发明人： Rodney Harold Thorland ,  Bruce A. Seiber

IPC分类号： G01C19/66 ,  H01S3/083 ,  H01S3/0975

CPC分类号： G01C19/665 ,  G01C19/661 ,  H01S3/0835 ,  H01S3/0975 ,  Y10T29/49016

摘要： A ring laser gyroscope comprising: a ring laser gyroscope block comprising an optical cavity filled with a gain medium, the optical cavity having at least three legs that form an optical path; a radio frequency coupler positioned along the optical path, wherein the radio frequency coupler is configured to transmit radio frequency energy which causes two counter-propagating laser beams to form from the gain medium, the laser beams propagating around the optical cavity through the optical path formed by the at least three legs of the optical cavity; a gas flow bypass configured to connect at least one of the at least three legs to at least one other leg of the at least three legs.

摘要翻译： 一种环形激光陀螺仪，包括：环形激光陀螺仪块，包括填充有增益介质的光学腔，所述光学腔具有形成光路的至少三条腿; 射频耦合器，沿着光路定位，其中射频耦合器被配置为发射射频能量，其使得从增益介质形成两个反向传播的激光束，激光束通过形成的光路在光腔周围传播 通过光腔的至少三个腿; 气流旁路，其被配置为将至少三个腿中的至少一个腿连接到所述至少三个腿中的至少一个其他腿。

公开(公告)号：US09077141B2

公开(公告)日：2015-07-07

申请号：US14342508

申请日：2012-07-19

申请人： Kevin L. Armbruster ,  Brad D. Gilmartin ,  Peter J. Kueckendahl ,  Bernard J. Richard ,  Daniel J. Ryan

发明人： Kevin L. Armbruster ,  Brad D. Gilmartin ,  Peter J. Kueckendahl ,  Bernard J. Richard ,  Daniel J. Ryan

IPC分类号： H01S3/22 ,  H01S3/03 ,  H01S3/07 ,  H01S3/0975

CPC分类号： H01S3/03 ,  H01S3/076 ,  H01S3/0975

摘要： The invention refers to a laser device comprising a tubular space formed by at least two resonator tubes (12) for a gas to be excited, excitation means (50) for each of the at least two resonator tubes for exciting the gas in the resonator tube for generating laser light, a partially reflecting output coupler (42) for coupling out a laser beam, and at least one gas reservoir container (60) which forms a gas reservoir, the gas reservoir container being free of excitation means and in fluidic communication with the tubular space, wherein the gas reservoir container is arranged between the at least two resonator tubes and connected to the tubular space at two separate connecting portions (20).

摘要翻译： 本发明涉及一种激光装置，其包括由用于待激发的气体的至少两个谐振管（12）形成的管状空间，用于至少两个谐振管中的每一个用于激励谐振器管中的气体的激励装置（50） 用于产生激光的部件反射输出耦合器（42），用于耦合输出激光束;以及至少一个形成气体储存器的储气容器（60），所述储气容器没有激励装置并与 所述管状空间，其中所述储气容器布置在所述至少两个谐振器管之间并且在两个分离的连接部分（20）处连接到所述管状空间。

公开(公告)号：US06922428B2

公开(公告)日：2005-07-26

申请号：US10394473

申请日：2003-03-20

申请人： Satoshi Tanaka ,  Kouji Kakizaki ,  Youichi Sasaki

发明人： Satoshi Tanaka ,  Kouji Kakizaki ,  Youichi Sasaki

IPC分类号： G03F7/20 ,  H01S3/036 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/22 ,  H01S3/225 ,  H01S3/09

CPC分类号： G03F7/70025 ,  H01S3/036 ,  H01S3/08004 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/2207 ,  H01S3/225

摘要： The present invention relates to a long pulse gas laser apparatus for lithography further improved in the laser oscillation efficiency and stability increased by addition of xenon gas. A gas laser apparatus for lithography has a pair of discharge electrodes 2 provided in a laser chamber 1 and emits laser beam having a laser pulse width (Tis) of not less than 40 ns by exciting a laser gas sealed in the laser chamber 1 by electric discharge between the pair of discharge electrodes 2, the laser gas containing xenon in an amount not less than 2 ppm and not more than 100 ppm in partial pressure ratio. The laser gas has been heated at least when the laser beam is emitted.

摘要翻译： 本发明涉及一种用于光刻的长脉冲气体激光装置，其进一步提高了通过添加氙气的激光振荡效率和稳定性。 用于光刻的气体激光装置具有设置在激光室1中的一对放电电极2，通过激发激光气体发射具有不小于40ns的激光脉冲宽度（T SUB）的激光束 通过一对放电电极2之间的放电密封在激光室1中，含有氙的激光气体的分压比不小于2ppm且不大于100ppm。 激光气体至少在激光束发射时被加热。

公开(公告)号：US06914919B2

公开(公告)日：2005-07-05

申请号：US10187336

申请日：2002-06-28

申请人： Tom A. Watson ,  Richard C. Ujazdowski ,  Alex P. Ivaschenko ,  Richard L. Sandstrom ,  Robert A. Shannon ,  R. Kyle Webb ,  Frederick A. Palenschat ,  Thomas Hofmann ,  Curtis L. Rettig ,  Richard M. Ness ,  Paul C. Melcher ,  Alexander I. Ershov

发明人： Tom A. Watson ,  Richard C. Ujazdowski ,  Alex P. Ivaschenko ,  Richard L. Sandstrom ,  Robert A. Shannon ,  R. Kyle Webb ,  Frederick A. Palenschat ,  Thomas Hofmann ,  Curtis L. Rettig ,  Richard M. Ness ,  Paul C. Melcher ,  Alexander I. Ershov

IPC分类号： H01S3/134 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23 ,  H01S3/10

CPC分类号： H01S3/0385 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation. In other embodiments the gas flow between the electrodes is increased sufficiently to permit 10,000 Hz operation with a discharge region width of 3 mm. To provide these substantial increased gas flow rates, Applicants have disclosed preferred embodiments utilize tangential forms of the prior art but with improved and more powerful motors and novel bearing designs. New bearing designs include both ceramic bearings and magnetic bearings. In other embodiments, some or all of the gas circulation power is provided with a blower located outside the laser chamber. The outside blower can be located in the laser cabinet or in separate location.

摘要翻译： 本发明提供一种气体放电激光系统，其能够以6,000至1000000次脉冲功率秒的重复频率在生产线容量中可靠地长期运行。 优选的实施例被配置为用于集成电路光刻的光源的KrF，ArF和F 2 N 2激光器。 改进包括一种改进的高压电源，其能够将磁压缩脉冲电源系统的初始电容器充电至每秒精确的目标电压6,000至10,0000次，以及用于监视脉冲能量的反馈控制以及确定脉冲 - 逐脉冲基础。 公开了用于在放电间隔期间从激光电极之间的放电区域去除产生的碎屑的几种技术。 在一个实施例中，放电区域的宽度从约3mm减小至约1mm，使得设计用于4000Hz操作的气体循环系统可用于10,000Hz操作。 在其他实施例中，电极之间的气流充分增加，以允许10,000Hz的操作，放电区域宽度为3mm。 为了提供这些显着增加的气体流速，申请人已经公开了使用现有技术的切向形式的优选实施例，但是具有改进的和更强大的电动机和新颖的轴承设计。 新的轴承设计包括陶瓷轴承和磁性轴承。 在其他实施例中，一些或全部气体循环动力设置有位于激光室外部的鼓风机。 外部鼓风机可以位于激光柜内或分开的位置。

公开(公告)号：US06912052B2

公开(公告)日：2005-06-28

申请号：US10676175

申请日：2003-09-30

申请人： Rajasekhar M Rao ,  John T. Melchior ,  Holger K. Glatzel

发明人： Rajasekhar M Rao ,  John T. Melchior ,  Holger K. Glatzel

IPC分类号： G01B9/02 ,  G01J1/42 ,  G01J9/02 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： G01J1/4257 ,  G01J1/429 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/024 ,  G01J3/027 ,  G01J3/26 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0 [DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemember may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

公开(公告)号：US06904073B2

公开(公告)日：2005-06-07

申请号：US10384967

申请日：2003-03-08

申请人： Thomas A. Yager ,  William N. Partio ,  Richard L. Sandstrom ,  Xiaojiang Pan ,  John T. Melchior ,  John Martin Algots ,  Matthew Ball ,  Alexander I. Ershov ,  Vladimir Fleurov ,  Walter D. Gillespie ,  Holger K. Glatzel ,  Leonard Lublin ,  Elizabeth Marsh ,  Richard G. Morton ,  Richard C. Ujazdowski ,  David J. Warkentin ,  R. Kyle Webb

发明人： Thomas A. Yager ,  William N. Partio ,  Richard L. Sandstrom ,  Xiaojiang Pan ,  John T. Melchior ,  John Martin Algots ,  Matthew Ball ,  Alexander I. Ershov ,  Vladimir Fleurov ,  Walter D. Gillespie ,  Holger K. Glatzel ,  Leonard Lublin ,  Elizabeth Marsh ,  Richard G. Morton ,  Richard C. Ujazdowski ,  David J. Warkentin ,  R. Kyle Webb

IPC分类号： G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

摘要： The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10−6 J/cm3. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaF2 surface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.

摘要翻译： 本发明提供了用于产生高重复率高功率输出光束的模块化高重复率紫外线气体放电激光器系统的长寿命光学器件。 本发明包括由申请人发现的位于原型激光系统的输出光束的高脉冲强度部分中的CaF 2光学器件的表面损伤问题的解决方案。 实施例包括用于束传送数十亿个输出激光脉冲的光束指向控制的封闭和清除的光束路径。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲，平均输出脉冲强度大于1.75×6 /瓦/ cm 2，并且与 与在这些脉冲强度中仅仅几分钟之后失效的现有技术部件和模块相比，数十亿个脉冲的峰值强度或更大的3.5×10 6 / cm 2 / SUP。 公开了用于最小化光学损伤的可能性和将脉冲能量密度降低到小于100×10 -6 / cm 3的技术和部件。 本说明书中描述的重要改进已分为以下主题类别：（1）由申请人发现的CaF 2 2表面损伤的解决方案，（2）高功率ArF MOPA激光系统的描述（ 3）光束传输单元的描述，（4）偏振考虑（5）高速水冷自动快门能量检测器模块和（6）其他改进。

公开(公告)号：US20050088855A1

公开(公告)日：2005-04-28

申请号：US10868535

申请日：2004-06-15

申请人： Thomas Kirchmeier ,  Wolfgang Oestreicher

发明人： Thomas Kirchmeier ,  Wolfgang Oestreicher

IPC分类号： H01S3/097 ,  H01S3/0975 ,  H02M7/5387 ,  H02M3/335

CPC分类号： H02M7/53871 ,  H01S3/097 ,  H01S3/0975 ,  H02M2007/4815 ,  Y02B70/1441

摘要： A power module is adapted to be connected to a voltage source and to supply power to a load. The power module includes a switching bridge that includes a first power transistor and a second power transistor, a first gate controller for driving the first power transistor and a second gate controller for driving the second power transistor. The first gate controller includes a first gate transformer, and a leakage inductance of the first gate transformer forms a resonant circuit with an input capacitance of the first power transistor. The second gate controller includes a second gate transformer, and a leakage inductance of the second gate transformer forms a resonant circuit with an input capacitance of the second power transistor.

摘要翻译： 电源模块适于连接到电压源并向负载供电。 功率模块包括开关桥，其包括第一功率晶体管和第二功率晶体管，用于驱动第一功率晶体管的第一栅极控制器和用于驱动第二功率晶体管的第二栅极控制器。 第一栅极控制器包括第一栅极变压器，并且第一栅极互感器的漏电感形成具有第一功率晶体管的输入电容的谐振电路。 第二栅极控制器包括第二栅极变压器，并且第二栅极变压器的漏电感形成具有第二功率晶体管的输入电容的谐振电路。