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公开(公告)号：US10146133B2
公开(公告)日：2018-12-04
申请号：US15743273
申请日：2016-06-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root , Herman Philip Godfried , Hubertus Petrus Leonardus Henrica Van Bussel , Arij Jonathan Rijke , Marc Wilhelmus Maria Van Der Wijst , Mathijs Leonardus Johan Verhees
IPC: G03F7/20
Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.
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公开(公告)号：US10103508B2
公开(公告)日：2018-10-16
申请号：US15600149
申请日：2017-05-19
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op 'T Root
Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
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公开(公告)号：US09933709B2
公开(公告)日：2018-04-03
申请号：US15507237
申请日：2015-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Herman Philip Godfried , Hubertus Petrus Leonardus Henrica Van Bussel , Arij Jonathan Rijke , Wilhelmus Patrick Elisabeth Maria Op 'T Root
IPC: G03F7/20
CPC classification number: G03F7/70558 , G03F7/20 , G03F7/70008 , G03F7/70058 , G03F7/70358 , G03F7/709
Abstract: A lithographic apparatus including: a radiation system; a frame; a substrate table for holding a substrate; and a scanning mechanism. The radiation system is operable to produce a radiation beam. The substrate table is moveably mounted to the frame and arranged such that a target portion of the substrate is arranged to receive the radiation beam. The scanning mechanism is operable to move the substrate table relative to the frame so that different portions of the substrate may receive the radiation beam. A mechanism is operable to determine a quantity indicative of a velocity of the radiation system relative to the frame. An adjustment mechanism is operable to control a power or irradiance of the radiation beam so as to reduce a variation in a dose of radiation received by the substrate as a result of relative motion of the radiation system and the frame.
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Patent Agency Ranking
公开(公告)号：US20170264071A1
公开(公告)日：2017-09-14
申请号：US15600149
申请日：2017-05-19
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op 'T Root
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
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5.发明授权公开(公告)号：US09645510B2
公开(公告)日：2017-05-09
申请号：US14787738
申请日：2014-04-16
Applicant: ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root , Adrianus Leonardus Gertrudus Bommer , Robert De Jong , Frank Everts , Herman Philip Godfried , Roland Pieter Stolk , Paul Van Der Veen
IPC: G03B27/42 , G03F7/20 , H01S3/104 , H01S3/0975 , H01S3/225
CPC classification number: G03F7/70558 , G03F7/70025 , G03F7/70516 , H01S3/0975 , H01S3/104 , H01S3/225
Abstract: A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.
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公开(公告)号：US11774867B2
公开(公告)日：2023-10-03
申请号：US17433494
申请日：2020-01-27
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/7085 , G01J3/45 , G03F7/70558 , G03F7/70575 , G03F7/7085 , G01J3/45
Abstract: A radiation measurement system (200) comprising an optical apparatus (205) configured to receive a radiation beam (210) and change an intensity distribution of the radiation beam to output a conditioned radiation beam (215), and a spectrometer (220) operable to receive the conditioned radiation beam and determine spectral content of the conditioned radiation beam. The radiation measurement system may form part of a lithographic apparatus.
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公开(公告)号：US11287743B2
公开(公告)日：2022-03-29
申请号：US16977667
申请日：2019-02-21
Applicant: ASML Netherlands B.V.
Abstract: A control system for controlling a laser, comprising a sensor for sensing a physical value indicative of a characteristic of a laser beam emitted by the laser, a switch, a first controller and a second controller. Each controller is configured, to receive a further sensor value from the sensor, adjust a received setpoint value based on the received further sensor value to give an output value and cause the laser to operate in accordance with the output value. The switch is configured to switch between the controllers such that output values are provided from each controller in a cyclic fashion.
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公开(公告)号：US10146134B2
公开(公告)日：2018-12-04
申请号：US15511570
申请日：2015-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Herman Philip Godfried , Hubertus Petrus Leonardus Henrica Van Bussel , Wilhelmus Patrick Elisabeth Maria Op 'T Root
IPC: G03F7/20 , G02B26/08 , G02F1/1335
Abstract: An illumination system for a lithographic apparatus includes an array of lenses configured to receive a radiation beam and focus the beam into a plurality of sub-beams, an array of reflective elements configured to receive the sub-beams and reflect the sub-beams so as to form an illumination beam, a beam splitting device configured to split the illumination beam into a first portion and a second portion wherein the first portion is directed to be incident on a lithographic patterning device, a focusing unit configured to focus the second portion of the illumination beam onto a detection plane such that an image is formed at the detection plane and wherein the image is an image of the sub-beams in which the sub-beams do not overlap with each other and an array of detector elements configured to measure the intensity of radiation which is incident on the detection plane.
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