公开(公告)号：US09933709B2

公开(公告)日：2018-04-03

申请号：US15507237

申请日：2015-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Herman Philip Godfried ,  Hubertus Petrus Leonardus Henrica Van Bussel ,  Arij Jonathan Rijke ,  Wilhelmus Patrick Elisabeth Maria Op 'T Root

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/20 ,  G03F7/70008 ,  G03F7/70058 ,  G03F7/70358 ,  G03F7/709

Abstract: A lithographic apparatus including: a radiation system; a frame; a substrate table for holding a substrate; and a scanning mechanism. The radiation system is operable to produce a radiation beam. The substrate table is moveably mounted to the frame and arranged such that a target portion of the substrate is arranged to receive the radiation beam. The scanning mechanism is operable to move the substrate table relative to the frame so that different portions of the substrate may receive the radiation beam. A mechanism is operable to determine a quantity indicative of a velocity of the radiation system relative to the frame. An adjustment mechanism is operable to control a power or irradiance of the radiation beam so as to reduce a variation in a dose of radiation received by the substrate as a result of relative motion of the radiation system and the frame.

公开(公告)号：US10146133B2

公开(公告)日：2018-12-04

申请号：US15743273

申请日：2016-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root ,  Herman Philip Godfried ,  Hubertus Petrus Leonardus Henrica Van Bussel ,  Arij Jonathan Rijke ,  Marc Wilhelmus Maria Van Der Wijst ,  Mathijs Leonardus Johan Verhees

IPC: G03F7/20

Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.

公开(公告)号：US10146134B2

公开(公告)日：2018-12-04

申请号：US15511570

申请日：2015-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Herman Philip Godfried ,  Hubertus Petrus Leonardus Henrica Van Bussel ,  Wilhelmus Patrick Elisabeth Maria Op 'T Root

IPC: G03F7/20 ,  G02B26/08 ,  G02F1/1335

Abstract: An illumination system for a lithographic apparatus includes an array of lenses configured to receive a radiation beam and focus the beam into a plurality of sub-beams, an array of reflective elements configured to receive the sub-beams and reflect the sub-beams so as to form an illumination beam, a beam splitting device configured to split the illumination beam into a first portion and a second portion wherein the first portion is directed to be incident on a lithographic patterning device, a focusing unit configured to focus the second portion of the illumination beam onto a detection plane such that an image is formed at the detection plane and wherein the image is an image of the sub-beams in which the sub-beams do not overlap with each other and an array of detector elements configured to measure the intensity of radiation which is incident on the detection plane.

公开(公告)号：US10139735B2

公开(公告)日：2018-11-27

申请号：US15316036

申请日：2015-05-13

Applicant: ASML Netherlands B.V.

Inventor： Johannes Jacobus Matheus Baselmans ,  Hans Butler ,  Christiaan Alexander Hoogendam ,  Sander Kerssemakers ,  Bart Smeets ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Hubertus Petrus Leonardus Henrica Van Bussel

IPC: G02B27/52 ,  G03F7/20

Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.