摘要:
A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.
摘要:
A calibration method for radiometric imaging systems that relies on an absolute measurement of scene radiance (thereby requiring a baseline measurement of zero radiance), and a shutter assembly for taking the baseline measurement of zero radiance which is operable under cryogenic temperatures as low as 80.5K (−192.65° C.) in vacuums measuring
摘要:
A method and apparatus for laser light pulse stretching is disclosed which may comprise a beam splitter in the path of a laser output light pulse beam; selected to pass a first percent of the energy of a first input pulse of the laser output light pulse beam along a laser output light pulse beam output path as a first output pulse and to reflect a second percent of the energy of the laser output light pulse beam into a first delayed beam; an optical delay path receiving the first delayed beam and returning the first delayed beam to the beam splitter in an orientation such that a third percent of the first delayed beam is reflected into the output path as a second output pulse and a fourth percent is passed into the optical delay path as a second delayed beam; the optical delay path receiving the second delayed beam and returning the second delayed beam to the beam splitter in an orientation such that the third percent of the second delayed beam is reflected into the output path as a third output pulse and the fourth percent of the second delayed beam is passed into the optical delay path as a third delayed beam; the optical delay path receiving the third delayed beam and returning the third delayed beam to the beam splitter in an orientation such that the third percent of the third delayed beam is reflected into the output path as a fourth output pulse; the first input pulse being a first pulse in a plurality of pulses output from a prior pulse stretcher, each of a plurality of succeeding input pulses comprising the output of the prior pulse stretcher resulting from the stretching of a narrow band laser light output pulse, forming successive first, second, third and fourth output pulses, the combination of which forms a pulse stretcher having an output with TIS of at least 200 ns. The optical delay path may be formed of a plurality of at least eight reflecting mirrors and contained in an elongated enclosure having first and second end plates mounting a first group of at least four of the at least eight reflecting mirrors mounted on the first mounting surface symmetrically about a center axis of the optical delay path and a second group of at least four of the at least eight reflecting mirrors mounted on the second mounting surface symmetrically about the center axis. The mirrors may be staggered in a predefined pattern, e.g., a circular pattern. The delay path may lie in a plurality of planes. The apparatus may be part of a laser system, part of a beam delivery system or an interface between the two.
摘要:
A closed-loop focusing system and method positions a focusing assembly to a desired positioned. A feedback positioning device, such as a linear encoder, provides an actual or “read” value for the linear movement of the focusing assembly. The desired position is compared to the actual position of the focusing assembly. If the two values are outside of a predetermined tolerance or valid range, then an audible or visual warning will be given. Furthermore, when a laser source is utilized with the focusing system, then laser operation will be prevented where the two values are outside of tolerance.
摘要:
A blower assembly for circulating gases in a laser chamber. The blower assembly includes a driving assembly operatively engaged to a drive side shaft for rotating a fan assembly. A first bearing assembly supports the drive side shaft. The blower assembly may further include an idle side shaft for supporting the fan assembly and a second bearing assembly circumscribing the idle side shaft. The driving assembly includes a motor disposed over a rotor. The fan assembly includes a pair of hubs supporting a plurality of blades. The first and second bearing assemblies comprise a ceramic compound, such as silicon nitride (Si3N4), and are lubricated with a synthetic oil, such as perfluoropolyalkylether (PFPE).
摘要翻译:用于在激光室中循环气体的鼓风机组件。 鼓风机组件包括可操作地接合到驱动侧轴的驱动组件,用于旋转风扇组件。 第一轴承组件支撑驱动侧轴。 鼓风机组件还可以包括用于支撑风扇组件的空转侧轴和围绕空转侧轴的第二轴承组件。 驱动组件包括设置在转子上方的电动机。 风扇组件包括支撑多个叶片的一对轮毂。 第一和第二轴承组件包括诸如氮化硅(Si 3 N 4)的陶瓷化合物,并用合成油例如全氟聚烷基醚(PFPE)润滑。
摘要:
A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.
摘要:
A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery pat. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
摘要:
An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO2. The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.
摘要:
The present invention provides an electric discharge gas laser having a laser cavity in which is contained a laser gas and a fan for circulating the laser gas. The fan is supported by an active radial magnetic bearing system and driven by a brushless DC motor in which the rotor of the motor and the rotors of at least two radial bearings are sealed within the gas environment of the laser cavity and the motor stator and the coils of the bearing magnets are located outside the gas environment. No thrust bearing is provided. Axial positioning of the shaft is provided by reluctance centering produced by the at least two radial magnetic bearings and the brushless DC motor. In a preferred embodiment the motor stator is larger in the axial direction than the rotor to increase the magnetic centering effect.
摘要:
A method for applanating an anterior surface of a cornea and coupling the eye to a surgical laser is disclosed. A interface is provided which has a central orifice and top and bottom surfaces. A suction ring is removably coupled to the bottom surface of the interface. The interface is positioned over an operative area of an eye, such that the suction ring comes into proximate contact with the surface of the eye. A suction is applied to the suction ring to stabilize the position of the interface relative to the operative area of the eye. An applanation lens is positioned in proximate contact with the operative area of the eye. Finally, the applanation lens is coupled to the interface to stabilize the position of the lens relative to the operative area of the eye.