发明授权
US06208674B1 Laser chamber with fully integrated electrode feedthrough main insulator
有权
具有完全集成电极馈通主绝缘体的激光室
- 专利标题: Laser chamber with fully integrated electrode feedthrough main insulator
- 专利标题(中): 具有完全集成电极馈通主绝缘体的激光室
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申请号: US09386938申请日: 1999-08-31
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公开(公告)号: US06208674B1公开(公告)日: 2001-03-27
- 发明人: R. Kyle Webb , William N. Partlo
- 申请人: R. Kyle Webb , William N. Partlo
- 主分类号: H01S322
- IPC分类号: H01S322
摘要:
A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.
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