公开(公告)号：US20240044710A1

公开(公告)日：2024-02-08

申请号：US18482411

申请日：2023-10-06

Applicant: GIGAPHOTON INC.

Inventor： Natsuhiko KOUNO ,  Masato MORIYA

IPC: G01J3/45 ,  G01J3/18

CPC classification number: G01J3/45 ,  G01J3/18

Abstract: A deterioration evaluation method of a line sensor includes detecting an interference fringe of pulse laser light using the line sensor; calculating, based on a signal value obtained from each of a plurality of sensor channels included in a sensor channel range being at least a part of the line sensor in accordance with light intensity of the interference fringe, an evaluation value which is an index of deterioration for each of the sensor channels or each group of the sensor channels, and storing the evaluation value in a storage device; and determining a deterioration state of the line sensor based on the evaluation value.

公开(公告)号：US20200274315A1

公开(公告)日：2020-08-27

申请号：US16871758

申请日：2020-05-11

Applicant: Gigaphoton Inc.

Inventor： Keisuke ISHIDA ,  Masato MORIYA ,  Natsuhiko KOUNO ,  Takeshi ASAYAMA ,  Takashi KUSAMA

IPC: H01S3/225 ,  G01J3/26 ,  H01S3/036 ,  G03F7/20 ,  H01S3/104

Abstract: An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.

公开(公告)号：US20230349762A1

公开(公告)日：2023-11-02

申请号：US18351712

申请日：2023-07-13

Applicant: Gigaphoton Inc.

Inventor： Natsuhiko KOUNO ,  Shunya OIWA ,  Masato MORIYA

IPC: G01J3/44 ,  H01S3/082 ,  H01S3/106 ,  B23K26/70

CPC classification number: G01J3/4406 ,  H01S3/0826 ,  H01S3/1067 ,  B23K26/705 ,  G01J2009/0238

Abstract: A laser system connectable to an exposure apparatus includes a spectrometer configured to acquire a measurement waveform from an interference pattern of laser light output from the laser system, and a processor configured to calculate a convolution spectrum waveform using the measurement waveform and a first intermediate function obtained through a process of deconvolution of an aerial image function of the exposure apparatus with an instrument function of the spectrometer.

公开(公告)号：US20220393422A1

公开(公告)日：2022-12-08

申请号：US17817820

申请日：2022-08-05

Applicant: Gigaphoton Inc.

Inventor： Natsuhiko KOUNO ,  Masato MORIYA

IPC: H01S3/13 ,  H01S3/08 ,  H01S3/11 ,  H01S3/23 ,  G03F7/20

Abstract: A laser apparatus according to an aspect of the present disclosure includes a laser oscillator that outputs pulsed laser light, a deformable mirror including a deformer that deforms a reflective surface, a first processor that drives the deformer during the period for which the reflective surface reflects the pulsed laser light, a homogenizer that homogenizes the pulsed laser light reflected off the deformable mirror, and a spectrum measuring instrument that measures the spectrum of the pulsed laser light homogenized by the homogenizer.

公开(公告)号：US20180323568A1

公开(公告)日：2018-11-08

申请号：US16033030

申请日：2018-07-11

Applicant: Gigaphoton Inc.

Inventor： Hiroshi FURUSATO ,  Takeshi OHTA ,  Natsuhiko KOUNO ,  Osamu WAKABAYASHI ,  Takahito KUMAZAKI

IPC: H01S3/11 ,  H01S3/134 ,  H01S3/08 ,  H01S3/22 ,  H01S3/038 ,  H01S3/034

CPC classification number: H01S3/11 ,  H01S3/034 ,  H01S3/038 ,  H01S3/08009 ,  H01S3/134 ,  H01S3/137 ,  H01S3/2207 ,  H01S3/2222

Abstract: The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply a pulsed voltage to the pair of electrodes, a wavelength-selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, a wavelength variable unit configured to change a selected wavelength selected by the wavelength-selecting element, and a controller. The controller is configured to control the wavelength variable unit based on an amount of control of the spectral width varying unit in a period from a time of ending the first burst oscillation to a time of starting the second burst oscillation.