ENERGY MEASURING APPARATUS AND EXCIMER LASER APPARATUS

    公开(公告)号:US20210116294A1

    公开(公告)日:2021-04-22

    申请号:US17113759

    申请日:2020-12-07

    Abstract: An energy measuring apparatus according to one aspect of the present disclosure includes a first beam splitter, a second beam splitter, a third beam splitter, and a fourth beam splitter, which sequentially reflect part of a main beam and input the beam to an energy sensor. The first beam splitter, the second beam splitter, the third beam splitter, and the fourth beam splitter are each arranged to have such an incident angle and a folding direction of an optical path as to suppress a change in detection value of the energy sensor due to a change in incident angle and a change in polarization purity of the main beam.

    WAVELENGTH MEASURING DEVICE
    2.
    发明申请

    公开(公告)号:US20190033133A1

    公开(公告)日:2019-01-31

    申请号:US16150298

    申请日:2018-10-03

    Inventor: Masato MORIYA

    Abstract: A wavelength measuring device configured to detect a wavelength of ultraviolet laser light outputted from a laser resonator with at least one etalon, the wavelength measuring device includes: a first housing having an interior space being sealed and accommodating the etalon, an input window through which the ultraviolet laser light enters to the first housing, the input window being provided at a first opening of the first housing, a first sealing member configured to seal a gap between a rim part of the input window and a circumferential portion of the first opening, a shielding film provided between the rim part of the input window and the first sealing member and configured to shield the first sealing member from the ultraviolet laser light coming from the input window, and a diffusing element provided outside of the first housing and configured to diffuse the ultraviolet laser light before being incident on the input window.

    METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT AND DEVICE FOR GENERATING EXTREME ULTRAVIOLET LIGHT
    4.
    发明申请
    METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT AND DEVICE FOR GENERATING EXTREME ULTRAVIOLET LIGHT 有权
    用于产生极端超紫外线灯的方法和用于产生极端超紫外线灯的装置

    公开(公告)号:US20150189730A1

    公开(公告)日:2015-07-02

    申请号:US14643782

    申请日:2015-03-10

    Abstract: An extreme ultraviolet light generation device may comprise: a chamber provided with a through-hole; an introduction optical system configured to introduce the pulse laser beam into a first predetermined region inside the chamber through the through-hole; a target supply device configured to output the target toward the first predetermined region; a light source configured to irradiate a second predetermined region with light whose optical path in the second predetermined region has a transverse section that is longer along a direction perpendicular to a direction of movement of the target than along the direction of movement of the target, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region; and an optical sensor configured to detect light incident on the optical sensor from the second predetermined region to detect the target passing through the second predetermined region.

    Abstract translation: 极紫外线发生装置可以包括:设置有通孔的室; 导入光学系统,被配置为通过所述通孔将所述脉冲激光束引入所述腔室内的第一预定区域; 目标供给装置,被配置为朝向所述第一预定区域输出所述目标; 光源,被配置为用第二预定区域的光线照射第二预定区域中的光路,沿着与目标的移动方向垂直的方向的垂直于目标的移动方向的横向部分具有横向部分, 所述第二预定区域包括所述目标供给装置和所述第一预定区域之间的所述目标的轨迹的一部分; 以及光学传感器,被配置为从所述第二预定区域检测入射在所述光学传感器上的光,以检测通过所述第二预定区域的目标。

    LINE-NARROWED KrF EXCIMER LASER APPARATUS
    6.
    发明申请

    公开(公告)号:US20190107438A1

    公开(公告)日:2019-04-11

    申请号:US16210097

    申请日:2018-12-05

    Inventor: Masato MORIYA

    Abstract: A line-narrowed KrF excimer laser apparatus includes a laser chamber, a line narrow optical system, an actuator, an output coupling mirror, a wavelength detecting unit, and a wavelength controller. The actuator is capable of changing a wavelength of light selected by the line narrow optical system. The wavelength detecting unit includes a low-pressure mercury lamp accommodating mercury, a getter material that adsorbs at least a part of the mercury, and a hot cathode that excites at least a part of the mercury, an etalon provided at a position where reference light emitted from the low-pressure mercury lamp and detected light emitted from the output coupling mirror are incident on the etalon, and a light intensity distribution sensor configured to detect an intensity distribution profile of interference fringes of the reference light and an intensity distribution profile of interference fringes of the detected light.

    ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    8.
    发明申请
    ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
    对准系统和极端超紫外光发生系统

    公开(公告)号:US20160204567A1

    公开(公告)日:2016-07-14

    申请号:US15076977

    申请日:2016-03-22

    CPC classification number: H01S3/101 H01S3/005 H01S3/0078 H01S3/2391 H05G2/008

    Abstract: An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.

    Abstract translation: 用于激光装置的对准系统包括:输出导向激光束的导向激光装置,调整引导激光束的行进方向的调节机构和来自激光装置的激光束;光束组合器,控制激光束的行进方向; 所述引导激光束彼此基本一致,从所述光束组合器提供的检测所述激光和引导激光束的第一光学检测单元,基于第一光学检测单元检测结果控制所述调节机构的第一控制器, 控制光束路径组合器的下游,控制激光束和引导激光束的行进方向,第二光学检测单元,在检测引导激光束的光束转向单元的下游;以及第二控制器,其基于第二光学检测器控制光束转向单元 单位检测结果。

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