SEMICONDUCTOR STRUCTURE AND FORMING METHOD THEREOF

    公开(公告)号:US20230223369A1

    公开(公告)日:2023-07-13

    申请号:US17661375

    申请日:2022-04-29

    Inventor: Zengyan FAN

    Abstract: The present application provides a semiconductor structure and a forming method thereof. The method of forming the semiconductor structure includes: providing a semiconductor chip and a substrate; forming, on the substrate, a first covering film covering a metal pad and a surface of the substrate, a plurality of up-narrow and down-wide openings being formed in the first covering film, and a bottom of each of the up-narrow and down-wide openings correspondingly exposing a surface of the metal pad; and flipping the semiconductor chip onto the substrate, such that a solder bump on a metal pillar is correspondingly located in the up-narrow and down-wide opening, and the solder bump fill the up-narrow and down-wide opening.

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