Semiconductor memory device and method of manufacturing the same
    82.
    发明授权
    Semiconductor memory device and method of manufacturing the same 有权
    半导体存储器件及其制造方法

    公开(公告)号:US09455257B2

    公开(公告)日:2016-09-27

    申请号:US14593344

    申请日:2015-01-09

    发明人: Kenichi Murooka

    摘要: A connection unit is provided adjacently to the cell array unit and electrically connected to a peripheral circuit unit positioned downwardly of the cell array unit. The cell array unit has a configuration in which a variable resistance layer is provided at intersections of a plurality of word lines extending in a horizontal direction and a plurality of bit lines extending in a vertical direction. The connection unit includes a lower wiring line layer in which a base portion bundling a plurality of the word lines is formed, and a middle wiring line layer and upper wiring line layer formed upwardly thereof. The lower wiring line layer includes: a first penetrating electrode connecting the plurality of word lines and the peripheral circuit unit; and a second penetrating electrode connecting at least one of the middle wiring line layer and upper wiring line layer and the peripheral circuit unit.

    摘要翻译: 连接单元靠近单元阵列单元设置并电连接到位于单元阵列单元下方的外围电路单元。 电池阵列单元具有在水平方向上延伸的多个字线和在垂直方向上延伸的多个位线的交叉处设置可变电阻层的结构。 连接单元包括形成有多个字线的基部的下布线层,以及向上形成的中间布线线层和上​​布线线层。 下布线层包括:连接多条字线和外围电路单元的第一穿透电极; 以及连接中间布线层和上布线层和外围电路单元中的至少一个的第二贯穿电极。

    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    85.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 有权
    半导体器件及其制造方法

    公开(公告)号:US20160268263A1

    公开(公告)日:2016-09-15

    申请号:US14734140

    申请日:2015-06-09

    申请人: SK hynix Inc.

    IPC分类号: H01L27/115

    摘要: A semiconductor device includes a substrate in which a cell region and contact regions located at both sides of the cell region are defined, a first source layer formed over the substrate, a second source layer formed over the first source layer, a reinforcement pattern formed in the second source layer, a stacked structure including conductive layers and insulating layers alternately stacked over the second source layer and the reinforcement pattern, channel layers passing through the stacked structure and the second source layer and electrically coupled to the second source layer, and an isolation insulating pattern passing through at least one top conductive layer of the conductive layers.

    摘要翻译: 一种半导体器件包括其中限定了单元区域和位于单元区域两侧的接触区域的基板,形成在基板上的第一源极层,形成在第一源极层上的第二源极层,形成在第一源极层 第二源极层,包括交替层叠在第二源极层和加强图案上的导电层和绝缘层的堆叠结构,穿过堆叠结构的沟道层和第二源极层,并且电耦合到第二源极层,以及隔离层 绝缘图案通过导电层的至少一个顶部导电层。

    Three-dimensional resistive memory device with adjustable voltage biasing
    87.
    发明授权
    Three-dimensional resistive memory device with adjustable voltage biasing 有权
    具有可调电压偏置的三维电阻式存储器件

    公开(公告)号:US09437296B2

    公开(公告)日:2016-09-06

    申请号:US14305371

    申请日:2014-06-16

    IPC分类号: G11C13/00 H01L27/24

    摘要: A semiconductor memory device according to an embodiment includes a memory cell array and a control circuit. The memory cell array includes: a plurality of first conductive layers that are stacked; a memory layer provided on a side surface of the plurality of the first conductive layers; and a second conductive layer that contacts the side surface of the plurality of the first conductive layers via the memory layer. A thickness of the first conductive layer disposed at the first position is larger than a thickness of the first conductive layer disposed at the second position. The control circuit is configured to apply a first voltage to a selected first conductive layer. The control circuit changes a value of the first voltage based on a position of the selected first conductive layer.

    摘要翻译: 根据实施例的半导体存储器件包括存储单元阵列和控制电路。 存储单元阵列包括:堆叠的多个第一导电层; 存储层,设置在所述多个所述第一导电层的侧面上; 以及经由存储层与多个第一导电层的侧表面接触的第二导电层。 设置在第一位置处的第一导电层的厚度大于设置在第二位置的第一导电层的厚度。 控制电路被配置为对所选择的第一导电层施加第一电压。 控制电路基于所选择的第一导电层的位置来改变第一电压的值。

    Three-Dimensional Semiconductor Devices
    90.
    发明申请
    Three-Dimensional Semiconductor Devices 审中-公开
    三维半导体器件

    公开(公告)号:US20160163733A1

    公开(公告)日:2016-06-09

    申请号:US15009040

    申请日:2016-01-28

    IPC分类号: H01L27/115

    摘要: A three-dimensional semiconductor device includes bit lines provided on a substrate, a gate structure provided between the substrate and the bit lines, a common source line provided between the gate structure and the bit lines, and channel pipes connecting the bit lines to the common source line. Each of the channel pipes may include a pair of vertical portions extending through the gate structure and a horizontal portion connecting the vertical portions. The pair of vertical portions are provided under a pair of the bit lines arranged adjacent to each other, respectively.

    摘要翻译: 三维半导体器件包括设置在衬底上的位线,设置在衬底和位线之间的栅极结构,设置在栅极结构和位线之间的公共源极线,以及将位线连接到公共端 源线。 每个通道管可以包括延伸穿过栅极结构的一对垂直部分和连接垂直部分的水平部分。 一对垂直部分分别设置在彼此相邻布置的一对位线下方。