公开(公告)号：US07161149B2

公开(公告)日：2007-01-09

申请号：US10603433

申请日：2003-06-25

Applicant: Hiroyoshi Kazumori

Inventor： Hiroyoshi Kazumori

IPC: G01N23/00

CPC classification number: H01J37/28 ,  G01N23/2251 ,  H01J37/145 ,  H01J2237/024 ,  H01J2237/026 ,  H01J2237/20207 ,  H01J2237/2809

Abstract: A scanning electron microscope has an electron gun producing the electron beam, an objective lens for sharply focusing the beam onto the specimen, a tilting mechanism for tilting the specimen relative to the beam, and a power supply for applying the negative voltage to the specimen. This microscope further includes a cylindrical shield electrode mounted to surround the electron beam path between the objective lens and specimen. A front-end electrode is insulatively mounted to the front-end portion of the shield electrode that is on the specimen side. An electric potential substantially identical to the electric potential at the polepieces of the objective lens is applied to the shield electrode. An electric potential substantially identical to the potential at the specimen is applied to the front-end electrode.

Abstract translation: 扫描电子显微镜具有产生电子束的电子枪，用于将光束聚焦到样本上的物镜，用于使样本相对于光束倾斜的倾斜机构，以及向样本施加负电压的电源。 该显微镜还包括安装成围绕物镜和样品之间的电子束路径的圆柱形屏蔽电极。 前端电极被绝缘地安装在屏蔽电极的在试样侧的前端部分。 将与物镜的极点处的电位基本相同的电位施加到屏蔽电极。 将与试样电位基本相同的电位施加到前端电极。

公开(公告)号：US5838006A

公开(公告)日：1998-11-17

申请号：US733673

申请日：1996-10-17

Applicant: Lee H. Veneklasen ,  Lydia J. Young

Inventor： Lee H. Veneklasen ,  Lydia J. Young

IPC: H01J37/09 ,  H01J37/147

CPC classification number: H01J37/09 ,  H01J2237/022 ,  H01J2237/026

Abstract: A conical shaped baffle aperture reduces beam position drift due to electrostatic charging of insulating contamination layers on beam tube walls of a charged particle beam system. The geometric cone angle, aperture size and apex location of the baffle with respect to the source of contamination and secondary radiation are selected so that the inner walls of the baffle and the beam itself are invisible from the source, and therefore remain free of the insulating contamination layers that would otherwise cause charging drift.

Abstract translation: 圆锥形挡板孔径由于静电充电带电粒子束系统的梁管壁上的绝缘污染层而减少了射束位置漂移。 选择挡板相对于污染源和次级辐射的几何锥角，孔径尺寸和顶点位置，使得挡板的内壁和梁本身从源不可见，因此保持绝缘 否则会导致充电漂移的污染层。

公开(公告)号：US5498290A

公开(公告)日：1996-03-12

申请号：US113552

申请日：1993-08-27

Applicant: Jesse N. Matossian ,  John D. Williams

Inventor： Jesse N. Matossian ,  John D. Williams

IPC: C23C14/48 ,  H01J27/04 ,  H01J37/08 ,  H01J37/317 ,  H01J37/32 ,  H01L21/265 ,  C23C16/00

CPC classification number: H01J37/32412 ,  C23C14/48 ,  H01J37/3233 ,  H01J2237/026

Abstract: A plasma ion implantation apparatus includes a vacuum chamber that receives the object within its walls. The object is supported upon an electrically conductive base that is electrically isolated from the wall of the vacuum chamber. An electrically conductive enclosure is positioned between the object and the wall of the vacuum chamber and supported upon the base. The enclosure is made of an electrically conductive material. A plasma source is positioned so as to create a plasma in the vicinity of the object to be implanted. A voltage source applies an electrical voltage to the base and thence the enclosure relative to the wall of the vacuum chamber. Secondary electrons emitted from the object during implantation are reflected back into the plasma by the enclosure, reducing X-ray production and improving plasma efficiency.

Abstract translation: 等离子体离子注入装置包括在其壁内接收物体的真空室。 该物体被支撑在与真空室的壁电绝缘的导电基底上。 导电外壳位于物体和真空室的壁之间，并被支撑在基座上。 外壳由导电材料制成。 等离子体源被定位成在待植入物体附近产生等离子体。 电压源将电压施加到基座，并且从而将外壳相对于真空室的壁施加电压。 在植入期间从物体发射的二次电子被外壳反射回等离子体，减少X射线产生并提高等离子体效率。

公开(公告)号：US20240029999A1

公开(公告)日：2024-01-25

申请号：US18343128

申请日：2023-06-28

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi YAMASHITA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/09

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/09 ,  H01J2237/0435 ,  H01J2237/026

Abstract: In one embodiment, a blanking aperture array system includes a blanking aperture array substrate including a plurality of beam passage holes through which beams in a multi charged particle beam pass and being provided with blankers to perform blanking deflection on the beams, and an X-ray shield disposed upstream of the blanking aperture array substrate. A cell section including the beam passage holes and the blankers is provided in a central portion of the blanking aperture array substrate, and a circuit section applying a voltage to each of the blankers is disposed in a periphery of the cell section. The circuit section is disposed such that a shortest distance between the circuit section and an outermost peripheral beam passage hole of the plurality of beam passage holes is greater than or equal to a distance based on an electron range in the blanking aperture array substrate.

公开(公告)号：US11837437B2

公开(公告)日：2023-12-05

申请号：US17832001

申请日：2022-06-03

Applicant: JEOL Ltd.

Inventor： Tatsuhito Kimura ,  Munehiro Kozuka ,  Tsutomu Negishi ,  Hisashi Kawahara

IPC: H01J37/304 ,  H01J37/08 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/304 ,  H01J37/08 ,  H01J37/20 ,  H01J37/222 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/20207 ,  H01J2237/30405 ,  H01J2237/30472

Abstract: A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, an information provision unit for providing information indicating an expected machining completion time, and a storage unit for storing past machining information. The information provision unit performs processing for calculating the expected machining completion time based on the past machining information, processing for acquiring an image photographed by the camera, processing for calculating a machining speed based on the acquired image, and processing for updating the expected machining completion time based on the machining speed.

公开(公告)号：US20230335380A1

公开(公告)日：2023-10-19

申请号：US18044648

申请日：2021-09-06

Applicant: Tokyo Electron Limited

Inventor： Takaaki KATO

IPC: H01J37/32

CPC classification number: H01J37/32568 ,  H01J37/32082 ,  H01J37/32577 ,  H01J37/3244 ,  H01J2237/026 ,  H01J2237/038 ,  H01J2237/332

Abstract: A plasma processing apparatus generating plasma by electromagnetic waves supplied into a processing container to process a substrate, includes an upper electrode disposed in an upper portion of the processing container, a power supply member connected to the upper electrode to supply electromagnetic waves to the upper electrode, a first shield member and a second shield member configured to electrically shield the upper electrode and the power supply member, a ring-shaped insulating member provided between the upper electrode and the first shield member and between the upper electrode and the second shield member, and having a plurality of gas through-holes penetrating inside thereof, and a conductive member covering a first end of the insulating member and electrically interconnecting the first shield member and the second shield member. The power supply member passes through an inner space in the insulating member and supplies electromagnetic waves to the upper electrode.

公开(公告)号：US20230245867A1

公开(公告)日：2023-08-03

申请号：US18160812

申请日：2023-01-27

Applicant: EUGENE TECHNOLOGY CO., LTD.

Inventor： Woo Duck JUNG ,  Jeong Hee JO ,  Ryong HWANG ,  Se Jong SUNG ,  Woong Joo JANG ,  Sang Soon JUNG

IPC: H01J37/32

CPC classification number: H01J37/32715 ,  H01J2237/026

Abstract: According to an embodiment of the present invention, an apparatus for processing substrate comprising: a susceptor; and a cover unit installed on an upper part of the susceptor, the substrate is placed on the cover unit, wherein the cover unit comprises: a cover frame having one or more air gaps; and one or more covers having a shape corresponding to each of the air gaps and mountable in each of the air gaps, wherein a depth of the air gap is at least three times the thickness of the substrate.

公开(公告)号：US20230238211A1

公开(公告)日：2023-07-27

申请号：US18011838

申请日：2021-07-05

Applicant: ASML NETHERLANDS B. V.

Inventor： Marco Jan-Jaco WIELAND ,  Stoyan NIHTIANOV ,  Roy Ramon VEENSTRA ,  Hui JIANG

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/244 ,  H01J37/3177 ,  H01J37/1475 ,  H01J37/1477 ,  H01J2237/0453 ,  H01J2237/026

Abstract: A detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for beam paths of respective charged particle beams of a multi-beam. The detector substrate includes a sensor unit array. A sensor unit of the sensor unit array is adjacent to a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array may include an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit may include a Trans Impedance Amplifier and/or an analogue to digital converter.

公开(公告)号：US10068746B2

公开(公告)日：2018-09-04

申请号：US15380366

申请日：2016-12-15

Applicant: Seron Technologies Inc.

Inventor： Jeonghoi Koo

IPC: H01J37/09 ,  H01J37/16 ,  H01J37/244 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/026 ,  H01J2237/141 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2608

Abstract: The present invention relates to a scanning electron microscope realized to observe a test sample by detecting back-scattered electrons scattered and emitted from a surface of the test sample in the air without a vacuum chamber which is allowed to observe the test sample in a vacuum state the scanning electron microscope can be useful in minimizing dispersion of electrons of the electron beam passing through the shielding film caused due to electron scattering by focusing the electron beam passing through the shielding film on a top surface of the first back-scattered electron detector disposed between the electron gun and the shielding film to pass an electron beam and configured to detect back-scattered electrons scattered from the test sample since the first back-scattered electron detector is provided with the first planar coil having a magnetic field formed thereon.

公开(公告)号：US20170250053A1

公开(公告)日：2017-08-31

申请号：US15594712

申请日：2017-05-15

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS

IPC: H01J37/09 ,  H01J37/302 ,  H01J37/147 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

Abstract: The invention relates to a charged particle beam generator. The generator may comprise a high voltage shielding arrangement (201) for shielding components outside the shielding arrangement from high voltages within the shielding arrangement, and a vacuum pump (220) located outside the shielding arrangement for regulating a pressure of a space within the shielding arrangement. The generator may comprise a collimator system with a cooling arrangement (405a/407a-407b/405b) comprising cooling channels inside electrodes of the collimator system.