公开(公告)号：US20160172157A1

公开(公告)日：2016-06-16

申请号：US14906254

申请日：2013-09-10

Applicant: SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY, CHINESE ACADEMY OF SCIENCES

Inventor： SHAN QIAO ,  WEISHI WAN ,  FUHAO JI

IPC: H01J37/29 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/29 ,  H01J37/147 ,  H01J37/244 ,  H01J37/252 ,  H01J2237/24557 ,  H01J2237/2544

Abstract: Provided is an image type electron spin polarimeter. It at least comprises a scattering target, a two-dimensional electron detector and an electron bending unit, wherein the electron bending unit is used for bending the orbit of the incident (scattered) electrons to a first (second) angle to arrive the scattering target (two-dimensional electron detector) with an optimal incident angle, and to transfer the image of the electron intensities from the entrance plane (scattering target) to the scattering target (two-dimensional electron detector) with small aberrations, and to separate the orbits of incident and scattered electrons to increase the degree of freedom of the geometric configuration of each component of the spin polarimeter. At least one of the first and second angles is not 0°, thereby achieving the first transfer of the two-dimensional image of electron intensities on the entrance plane to the scattering target and the second transfer from scattering target to the two-dimensional electron detector respectively with small aberrations, and then achieving multichannel measurements of the electron spin.

Abstract translation: 提供了一种图像型电子自旋旋光计。 它至少包括散射目标，二维电子检测器和电子弯曲单元，其中电子弯曲单元用于将入射（散射）电子的轨道弯曲到第一（第二）角度以到达散射目标 （二维电子检测器），并将电子强度的图像从入射面（散射靶）转移到具有小像差的散射目标（二维电子检测器），并将轨道分离 的入射和散射电子，以增加旋转偏振计的每个分量的几何构型的自由度。 第一角度和第二角度中的至少一个角度不是0°，从而实现了入射面上的电子强度的二维图像向散射目标的第一次传输，并且从散射靶子到二维电子检测器的第二次传输 分别具有小的像差，然后实现电子自旋的多通道测量。

公开(公告)号：US09336993B2

公开(公告)日：2016-05-10

申请号：US14191337

申请日：2014-02-26

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Tsung-Hsin Yu

IPC: H01J3/14 ,  H01J37/317 ,  H01J37/24 ,  H01J37/147 ,  H01J37/20

CPC classification number: H01J37/3174 ,  G03F7/203 ,  G03F7/70291 ,  G03F7/70508 ,  H01J37/147 ,  H01J37/20 ,  H01J37/24 ,  H01J2237/20221 ,  H01J2237/31766

Abstract: A method of lithography including providing a first mirror array and a second mirror array of a digital pattern generator (DPG); the second mirror array is offset from the first mirror array in a first direction. A first data piece and a second data piece associated with an IC device, are received by the DPG. The first and second data piece each defines a state of a pixel of the DPG. The first data piece is provided to a first pixel of the DPG. The second data piece is also provided to the first pixel of the DPG. A first point on a photosensitive layer on a target substrate is exposed. The first point is defined by the first data piece and the second data piece. The target substrate moved in a second direction, perpendicular to the first direction to expose a second point.

Abstract translation: 一种光刻方法，包括提供数字图案发生器（DPG）的第一反射镜阵列和第二反射镜阵列; 第二反射镜阵列在第一方向上偏离第一反射镜阵列。 与IC设备相关联的第一数据段和第二数据段由DPG接收。 第一和第二数据段各自定义DPG的像素的状态。 将第一数据片提供给DPG的第一像素。 第二数据段也被提供给DPG的第一个像素。 曝光目标基板上感光层上的第一点。 第一点由第一数据段和第二数据段定义。 目标衬底沿与第一方向垂直的第二方向移动以暴露第二点。

公开(公告)号：US09324540B2

公开(公告)日：2016-04-26

申请号：US14407117

申请日：2013-04-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Ichiro Tachibana ,  Naomasa Suzuki

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/21 ,  H01J37/28 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/147 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/04756 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/21 ,  H01J2237/244 ,  H01J2237/2602 ,  H01J2237/281

Abstract: When a signal electron is detected by energy selection by combining and controlling retarding and boosting for observation of a deep hole, etc., the only way for focus adjustment is to use a change in magnetic field of an objective lens. However, since responsiveness of the change in magnetic field is poor, throughput reduces. A charged particle beam device includes: an electron source configured to generate a primary electron beam; an objective lens configured to focus the primary electron beam; a deflector configured to deflect the primary electron beam; a detector configured to detect a secondary electron or a reflection electron generated from a sample by irradiation of the primary electron beam; an electrode having a hole through which the primary electron beam passes; a voltage control power supply configured to apply a negative voltage to the electrode; and a retarding voltage control power supply configured to generate an electric field, which decelerates the primary electron beam, on the sample by applying the negative voltage to the sample, wherein the charged particle beam device performs focus adjustment while an offset between the voltage applied to the electrode and the voltage applied to the sample is being kept constant.

Abstract translation: 当通过组合并控制用于观察深孔等的延迟和升压来进行能量选择来检测信号电子时，聚焦调整的唯一方式是使用物镜的磁场变化。 然而，由于磁场变化的响应性差，吞吐量降低。 带电粒子束装置包括：电子源，被配置为产生一次电子束; 配置成聚焦一次电子束的物镜; 偏转器，被配置为偏转所述一次电子束; 检测器，被配置为通过一次电子束的照射来检测从样品产生的二次电子或反射电子; 具有一次电子束通过的孔的电极; 电压控制电源，被配置为向所述电极施加负电压; 以及延迟电压控制电源，被配置为通过向样本施加负电压来产生使样品上的一次电子束减速的电场，其中带电粒子束装置执行焦点调整，同时施加到 施加到样品的电极和电压保持恒定。

公开(公告)号：US09293296B2

公开(公告)日：2016-03-22

申请号：US14759010

申请日：2013-03-14

Applicant: Ryusuke Aoki ,  Jun Obata

Inventor： Ryusuke Aoki ,  Jun Obata

IPC: H01F7/126 ,  H01J37/147 ,  F16M11/04 ,  H05H7/04

CPC classification number: H01J37/147 ,  A61B1/00158 ,  F16M11/045 ,  F16M11/046 ,  H01J2237/152 ,  H05H7/04 ,  H05H2007/048

Abstract: The electromagnet support frame is for supporting an electromagnet having a trunnion pair which comprises two trunnions that are formed on mutually opposite side-faces of the electromagnet and whose central axes are matched to each other, and is characterized by including support fixtures whose number is the same as that of the trunnions and in which engaging parts are formed that are engaged with the trunnions so as to cover outer faces thereof, and a mounting frame that holds the support fixtures through vertical adjustment parts that move the fixtures in a vertical direction.

Abstract translation: 电磁铁支撑框架用于支撑具有耳轴对的电磁体，其包括形成在电磁体的相互相对的侧面上并且其中心轴彼此匹配的两个耳轴，其特征在于包括支架，其数量为 与耳轴相同，并且其中形成有与耳轴接合以便覆盖其外表面的接合部件;以及安装框架，其通过沿垂直方向移动固定装置的垂直调节部件来保持支撑固定件。

公开(公告)号：US09257260B2

公开(公告)日：2016-02-09

申请号：US14260053

申请日：2014-04-23

Applicant: KLA-Tencor Corporation

Inventor： Gary Fan ,  David Chen ,  Vivekanand Kini ,  Hong Xiao

IPC: H01J37/28 ,  H01J37/21 ,  G01N23/225 ,  H01J37/147

CPC classification number: H01J37/28 ,  G01N23/2251 ,  H01J37/04 ,  H01J37/147 ,  H01J37/261 ,  H01J2237/04 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.

Abstract translation: 用于自适应电子束扫描的系统可以包括配置成扫描横跨样品表面的电子束的检查子系统。 检查子系统可以包括电子束源，样本台，一组电子元件，检测器组件和通信地耦合到检查子系统的一个或多个部分的控制器。 控制器可以评估样品区域的一个或多个部分的一个或多个特征以进行检查，并且响应于所评估的一个或多个特性来调整检查子系统的一个或多个扫描参数。

公开(公告)号：US09214314B1

公开(公告)日：2015-12-15

申请号：US14643666

申请日：2015-03-10

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Jordan B. Tye ,  Jeffrey D. Susser ,  Sergio Alonso Gonzalez-Palavicini

IPC: H01J37/317 ,  H01J37/147

CPC classification number: H01J37/147 ,  H01J27/024 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/065 ,  H01J2237/1502

Abstract: An ion beam manipulator including a suppression electrode, a ground electrode connected to the suppression electrode in a parallel, spaced-apart relationship therewith by three electrically insulating connectors, the connectors being spaced 120 degrees apart from one another around a circumference of the suppression electrode and the ground electrode, a plurality of linkages extending from the electrically insulating connectors, at least one of the linkages including a pair of parallel support arms connected at a first end to a corresponding one of the electrically insulating connecters by a first pair of universal joints and connected at a second end to a bracket by a second pair of universal joints, and a drive shaft extending from the bracket, the drive shaft coupled to an actuator configured to extend and retract the drive shaft along a longitudinal axis of the drive shaft.

Abstract translation: 一种离子束操纵器，包括抑制电极，接地电极，通过三个电绝缘连接器以平行的间隔关系连接到所述抑制电极，所述连接器围绕所述抑制电极的圆周彼此间隔开120度， 所述接地电极，从所述电绝缘连接器延伸的多个连接器，所述连杆中的至少一个包括一对平行的支撑臂，所述平行支撑臂通过第一对万向接头在第一端连接到相应的一个所述电绝缘连接器， 在第二端通过第二对万向接头连接到支架，以及驱动轴，其从支架延伸，所述驱动轴联接到致动器，所述致动器构造成沿着驱动轴的纵向轴线延伸和缩回驱动轴。

公开(公告)号：US20150357153A1

公开(公告)日：2015-12-10

申请号：US14410999

申请日：2013-06-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi MAKINO ,  Hideyuki KAZUMI ,  Minoru YAMAZAKI ,  Yuzuru MIZUHARA ,  Miki ISAWA

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2806 ,  H01J2237/281

Abstract: An objective of the present invention is to provide a charged particle beam device with which information based on a charged particle which is discharged from a bottom part of high-aspect structure is revealed more than with previous technology. To achieve the objective, proposed is a charged particle beam device comprising: a first orthogonal electromagnetic field generator which deflects charged particles which are discharged from a material; a second orthogonal electromagnetic field generator which further deflects the charged particles which are deflected by the first orthogonal electromagnetic field generator; an aperture forming member having a charged particle beam pass-through aperture; and a third orthogonal electromagnetic field generator which deflects the charged particles which have passed through the aperture forming member.

Abstract translation: 本发明的目的是提供一种带电粒子束装置，与先前的技术相比，显示出从高方面结构的底部排出的基于带电粒子的信息。 为了实现该目的，提出了一种带电粒子束装置，包括：第一正交电磁场发生器，其偏转从材料排出的带电粒子; 第二正交电磁场发生器，其进一步偏转由第一正交电磁场发生器偏转的带电粒子; 具有带电粒子束直通孔的孔形成构件; 以及第三正交电磁场发生器，其使穿过孔形成构件的带电粒子偏转。

公开(公告)号：US20150332888A1

公开(公告)日：2015-11-19

申请号：US14653138

申请日：2014-02-14

Applicant: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC

Inventor： Bryan W. REED ,  William J. DEHOPE ,  Glenn HUETE ,  Thomas B. LAGRANGE ,  Richard M. SHUTTLESWORTH

IPC: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21

CPC classification number: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21 ,  H01J37/22 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/06333 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/2626 ,  H01J2237/2802

Abstract: An electron microscope is disclosed which has a laser-driven photocathode and an arbitrary waveform generator (AWG) laser system (“laser”). The laser produces a train of temporally-shaped laser pulses each being of a programmable pulse duration, and directs the laser pulses to the laser-driven photocathode to produce a train of electron pulses. An image sensor is used along with a deflector subsystem. The deflector subsystem is arranged downstream of the target but upstream of the image sensor, and has a plurality of plates. A control system having a digital sequencer controls the laser and a plurality of switching components, synchronized with the laser, to independently control excitation of each one of the deflector plates. This allows each electron pulse to be directed to a different portion of the image sensor, as well as to enable programmable pulse durations and programmable inter-pulse spacings.

Abstract translation: 公开了一种具有激光驱动光电阴极和任意波形发生器（AWG）激光系统（“激光”）的电子显微镜。 激光器产生一系列时间成形的激光脉冲，每个激光脉冲具有可编程脉冲持续时间，并将激光脉冲引导到激光驱动的光电阴极以产生一系列电子脉冲。 图像传感器与偏转器子系统一起使用。 偏转器子系统布置在目标的下游，但是在图像传感器的上游，并且具有多个板。 具有数字定序器的控制系统控制激光器和与激光器同步的多个开关部件，以独立地控制每个偏转板的激励。 这允许每个电子脉冲被引导到图像传感器的不同部分，以及使能可编程脉冲持续时间和可编程脉冲间隔。

公开(公告)号：US20150243479A1

公开(公告)日：2015-08-27

申请号：US14191337

申请日：2014-02-26

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Tsung-Hsin Yu

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/20 ,  H01J37/24

CPC classification number: H01J37/3174 ,  G03F7/203 ,  G03F7/70291 ,  G03F7/70508 ,  H01J37/147 ,  H01J37/20 ,  H01J37/24 ,  H01J2237/20221 ,  H01J2237/31766

Abstract: A method of lithography including providing a first mirror array and a second mirror array of a digital pattern generator (DPG); the second mirror array is offset from the first mirror array in a first direction. A first data piece and a second data piece associated with an IC device, are received by the DPG. The first and second data piece each defines a state of a pixel of the DPG. The first data piece is provided to a first pixel of the DPG. The second data piece is also provided to the first pixel of the DPG. A first point on a photosensitive layer on a target substrate is exposed. The first point is defined by the first data piece and the second data piece. The target substrate moved in a second direction, perpendicular to the first direction to expose a second point.

Abstract translation: 一种光刻方法，包括提供数字图案发生器（DPG）的第一反射镜阵列和第二反射镜阵列; 第二反射镜阵列在第一方向上偏离第一反射镜阵列。 与IC设备相关联的第一数据段和第二数据段由DPG接收。 第一和第二数据段各自定义DPG的像素的状态。 将第一数据片提供给DPG的第一像素。 第二数据段也被提供给DPG的第一个像素。 曝光目标基板上感光层上的第一点。 第一点由第一数据段和第二数据段定义。 目标衬底沿与第一方向垂直的第二方向移动以暴露第二点。

公开(公告)号：US20150213996A1

公开(公告)日：2015-07-30

申请号：US14496412

申请日：2014-09-25

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

IPC: H01J37/05 ,  H01J37/317

CPC classification number: G03F1/80 ,  B24B37/04 ,  G03F1/82 ,  H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01L21/02115 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31105 ,  H01L21/31111 ,  H01L29/36 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.

Abstract translation: 其装置，方法和产品提供从用于加工材料的加速气体簇离子束衍生的加速中性束。