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公开(公告)号：US11698582B2
公开(公告)日：2023-07-11
申请号：US16239272
申请日：2019-01-03
IPC分类号： H01J37/05 , H01J37/317 , H01L21/265 , H01L21/311 , H01L21/02 , H05H3/02 , G03F1/80 , G03F1/82 , H01J37/147 , H01L29/36 , B24B37/04
CPC分类号： G03F1/80 , G03F1/82 , H01J37/05 , H01J37/147 , H01J37/317 , H01J37/3171 , H01L21/02115 , H01L21/02274 , H01L21/26506 , H01L21/26513 , H01L21/26566 , H01L21/31105 , H01L21/31111 , H05H3/02 , B24B37/04 , H01J2237/0041 , H01J2237/0812 , H01J2237/15 , H01L29/36 , Y10T428/24355 , Y10T428/24479 , Y10T428/30
摘要： A method for preparing a biological material for implanting provides irradiating at least a portion of the surface of the material with an accelerated Neutral Beam.
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2.发明授权公开(公告)号：US11048162B2
公开(公告)日：2021-06-29
申请号：US16564743
申请日：2019-09-09
IPC分类号： G03F1/80 , H05H3/02 , H01J37/317 , H01L21/02 , H01L21/265 , H01L21/311 , H01J37/05 , H01J37/147 , G03F1/82 , H01L29/36 , B24B37/04
摘要： An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.
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公开(公告)号：US10971324B2
公开(公告)日：2021-04-06
申请号：US15909482
申请日：2018-03-01
发明人： Joseph Khoury , Sean R. Kirkpatrick , Michael J. Walsh , James G. Bachand , Allen R. Kirkpatrick
IPC分类号： H01J37/05 , H05H3/02 , H01J37/317 , H01J37/147 , H05H5/04
摘要： A device such as a medical device and a method for making same provides a surface modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets.
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4.发明申请公开(公告)号：US20200249565A1
公开(公告)日：2020-08-06
申请号：US16564743
申请日：2019-09-09
IPC分类号： G03F1/80 , H05H3/02 , H01J37/317 , H01L21/02 , H01L21/265 , H01L21/311 , H01J37/05 , H01J37/147 , G03F1/82
摘要： An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.
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公开(公告)号：US10539867B2
公开(公告)日：2020-01-21
申请号：US14892284
申请日：2014-05-21
发明人： Sean R. Kirkpatrick , Son T. Chau
摘要： A film and method of forming a film provides an unmodified starting layer of a starting material, the starting layer having opposed first and second surfaces and an initial thickness, T1, and a modified surface layer of thickness T2 which is less than T1, formed in at least a portion of the second surface, wherein a portion of the modified surface layer is not supported by unmodified starting material removed from the first surface opposite the modified surface layer.
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公开(公告)号：US20190336657A1
公开(公告)日：2019-11-07
申请号：US16502696
申请日：2019-07-03
IPC分类号： A61L31/16 , A61K31/436 , A61L27/54
摘要： A method of modifying the surface of a medical device to release a drug in a controlled way by providing a barrier layer on the surface of one or more drug coatings. The barrier layer consists of modified drug material converted to a barrier layer by irradiation by an accelerated neutral beam derived from an accelerated gas cluster ion beam. Also medical devices formed thereby.
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7.发明授权公开(公告)号：US11199769B2
公开(公告)日：2021-12-14
申请号：US16008585
申请日：2018-06-14
IPC分类号： G03F1/80 , H01L21/311 , H01L21/265 , H01L21/02 , G03F1/82 , H05H3/02 , H01J37/317 , H01J37/147 , H01J37/05 , H01L21/321 , H01J37/31 , H01L29/36 , B24B37/04
摘要： A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.
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公开(公告)号：US20190171098A1
公开(公告)日：2019-06-06
申请号：US16273013
申请日：2019-02-11
IPC分类号： G03F1/80 , H01L21/265 , H01J37/05 , H01J37/317 , H01L21/311 , H01L21/02 , G03F1/82 , H05H3/02 , H01J37/147
摘要： An apparatus and method provides a drug layer formed on a surface region of a medical device, the drug layer comprised of a drug deposition and a carbonized or densified layer formed from the drug deposition by irradiation on an outer surface of the drug deposition, wherein the carbonized or densified layer does not penetrate through the drug deposition and is adapted to release drug from the drug deposition at a predetermined rate.
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9.发明申请公开(公告)号：US20180292745A1
公开(公告)日：2018-10-11
申请号：US16008573
申请日：2018-06-14
发明人： Sean R. Kirkpatrick , Kiet A. Chau , Son T. Chau
IPC分类号： G03F1/80 , H01L21/265 , G03F1/82 , H01J37/05 , H01J37/147 , H01J37/317 , H01L21/02 , H05H3/02 , H01L21/311 , B24B37/04 , H01L29/36
摘要： A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening with high aspect ratio (into depth from opening to base or bottom divided by minimum space of the trench therebetween) by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.
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公开(公告)号：US20170123309A1
公开(公告)日：2017-05-04
申请号：US15403964
申请日：2017-01-11
发明人： Sean R. Kirkpatrick
CPC分类号： G03F1/80 , B24B37/04 , G03F1/82 , H01J37/05 , H01J37/147 , H01J37/317 , H01J37/3171 , H01J2237/0041 , H01J2237/0812 , H01J2237/15 , H01L21/02115 , H01L21/02274 , H01L21/26506 , H01L21/26513 , H01L21/26566 , H01L21/31105 , H01L21/31111 , H01L29/36 , H05H3/02 , Y10T428/24355 , Y10T428/24479 , Y10T428/30
摘要： A method for treating a substrate surface uses Neutral Beam irradiation derived from a gas-cluster ion-beam and articles produced thereby including lithography photomask substrates.
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